Particle Interrogation Devices and Methods
    211.
    发明申请
    Particle Interrogation Devices and Methods 失效
    粒子询问设备和方法

    公开(公告)号:US20110186436A1

    公开(公告)日:2011-08-04

    申请号:US13078999

    申请日:2011-04-03

    Abstract: Devices, apparatus and methods are disclosed for non-contact pneumatic sampling and sampling of surfaces, persons, articles of clothing, buildings, furnishings, vehicles, baggage, packages, mail, and the like, for contaminating aerosols indicative of a hazard or a benefit, where the contaminating aerosols are chemical, radiological, biological, toxic, or infectious in character. In a first device, a central orifice for pulling a suction gas stream is surrounded by a peripheral array of convergingly-directed gas jets, forming a virtual sampling chamber. The gas jets are configured to deliver millisecond pneumatic pulses that erode particles from solid surfaces at a distance. In another aspect of the invention, a suction gas stream is split using an air-to-air concentrator so that a particle-enriched gas flow is directed to a particle trap and any particles immobilized in the particle trap (including any adsorbed vapors associated with the particles) are selectively analyzed to detect trace residues associated with explosives.

    Abstract translation: 公开的装置,装置和方法用于表面,人员,衣物,建筑物,家具,车辆,行李,包装,邮件等的非接触式气体取样和取样,用于污染指示危险或益处的气溶胶 污染气溶胶在化学,放射学,生物学,毒性或传染性方面。 在第一装置中,用于拉动吸入气流的中心孔被收敛的气体射流的外围阵列包围,形成虚拟取样室。 气体喷射器被配置为传送毫秒的气动脉冲,其从一定距离的实体表面侵蚀颗粒。 在本发明的另一方面,使用空气 - 空气浓缩器分离吸入气体流,使得富含颗粒的气体流被引导到颗粒捕获器,并且固定在颗粒捕获器中的任何颗粒(包括与 颗粒)被选择性分析以检测与爆炸物相关的痕量残留物。

    PHOTOSPECTROMETER
    212.
    发明申请
    PHOTOSPECTROMETER 有权
    光电测光仪

    公开(公告)号:US20110063614A1

    公开(公告)日:2011-03-17

    申请号:US12812853

    申请日:2009-01-19

    CPC classification number: G01J3/00 G01J3/28 H01L27/14643 H01L31/1013

    Abstract: Impinging electromagnetic radiation generates pairs of majority and minority carriers in a substrate. A spectrometer device for detection of electromagnetic radiation impinging on a substrate comprises means for generating, in the substrate, a majority carrier current; at least one detection region for collecting generated minority carriers, the minority carriers being directed under influence of the majority carrier current; and means for determining spectral information based on minority carriers collected at the at least one detection region.

    Abstract translation: 发射电磁辐射在衬底中产生成对的多数和少数载流子。 用于检测照射在衬底上的电磁辐射的光谱仪装置包括用于在衬底中产生多数载流子电流的装置; 用于收集所生成的少数载体的至少一个检测区域,所述少数载体受多数载波电流的影响; 以及用于基于在所述至少一个检测区域收集的少数载波来确定频谱信息的装置。

    Spectrometer
    214.
    发明授权
    Spectrometer 失效
    光谱仪

    公开(公告)号:US06862092B1

    公开(公告)日:2005-03-01

    申请号:US09889010

    申请日:2000-01-07

    Abstract: A method and apparatus for measuring spectral information of light from at least one object includes at least one light detector and at least one transparent body. The transparent body has a front side that has an entrance aperture and at least one reflecting surface. The transparent body also has a back side that includes at least one reflecting surface and an exit surface. The detector is positioned near the exit surface. At least one of the front reflecting surface and the back reflecting surface includes a diffractive optical element arranged to receive diverging light from the aperture. A focusing element focuses diffracted light to the exit surface. The apparatus may comprise multiple channels and may also include a device for measuring a distance to the object.

    Abstract translation: 用于测量来自至少一个物体的光的光谱信息的方法和装置包括至少一个光检测器和至少一个透明体。 透明体具有前侧,具有入口孔和至少一个反射面。 透明体还具有包括至少一个反射表面和出射表面的背面。 检测器位于出口表面附近。 前反射表面和后反射表面中的至少一个包括衍射光学元件,其被布置成接收来自孔的发散光。 聚焦元件将衍射光聚焦到出射表面。 该装置可以包括多个通道,并且还可以包括用于测量到物体的距离的装置。

    System and method of broad band optical end point detection for film change indication
    215.
    发明授权
    System and method of broad band optical end point detection for film change indication 失效
    用于胶片变化指示的宽带光端点检测系统和方法

    公开(公告)号:US06806948B2

    公开(公告)日:2004-10-19

    申请号:US10112425

    申请日:2002-03-29

    Abstract: A system and method for detecting an endpoint during a chemical mechanical polishing process is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.

    Abstract translation: 公开了一种用于在化学机械抛光工艺期间检测端点的系统和方法,其包括用第一宽光束照射晶片表面的第一部分。 接收到第一反射光谱数据。 数据的第一反射光谱对应于从晶片表面的第一照射部分反射的光的第一光谱。 具有第二宽光束的晶片表面的第二部分。 接收第二反射光谱数据。 数据的第二反射光谱对应于从晶片的表面的第二照射部分反射的光的第二光谱。 将第一反射光谱数据归一化,并将第二反射光谱数据归一化。 基于归一化的第一光谱数据和归一化的第二光谱数据之间的差来确定端点。

    System and method of broad band optical end point detection for film change indication
    216.
    发明申请
    System and method of broad band optical end point detection for film change indication 有权
    用于胶片变化指示的宽带光端点检测系统和方法

    公开(公告)号:US20040165177A1

    公开(公告)日:2004-08-26

    申请号:US10721136

    申请日:2003-11-24

    Applicant: LAM RESEARCH

    Abstract: A system and method for detecting an endpoint is disclosed that includes illuminating a first portion of a surface of a wafer with a first broad beam of light. A first reflected spectrum data is received. The first reflected spectrum of data corresponds to a first spectra of light reflected from the first illuminated portion of the surface of the wafer. A second portion of the surface of the wafer with a second broad beam of light. A second reflected spectrum data is received. The second reflected spectrum of data corresponds to a second spectra of light reflected from the second illuminated portion of the surface of the wafer. The first reflected spectrum data is normalized and the second reflected spectrum data is normalized. An endpoint is determined based on a difference between the normalized first spectrum data and the normalized second spectrum data.

    Abstract translation: 公开了一种用于检测端点的系统和方法,其包括用第一宽光束照射晶片表面的第一部分。 接收到第一反射光谱数据。 数据的第一反射光谱对应于从晶片表面的第一照射部分反射的光的第一光谱。 具有第二宽光束的晶片表面的第二部分。 接收第二反射光谱数据。 数据的第二反射光谱对应于从晶片的表面的第二照射部分反射的光的第二光谱。 将第一反射光谱数据归一化,并将第二反射光谱数据归一化。 基于归一化的第一光谱数据和归一化的第二光谱数据之间的差来确定端点。

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