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    Beam conditioning system with sequential optic
    211.
    发明申请
    Beam conditioning system with sequential optic 有权
    光束调节系统

    公开(公告)号：US20060239405A1

    公开(公告)日：2006-10-26

    申请号：US11449208

    申请日：2006-06-08

    Applicant: Boris Verman ,  Jimpei Harada

    Inventor： Boris Verman ,  Jimpei Harada

    IPC: G21K1/06

    CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

    Abstract: An x-ray beam conditioning system with a first diffractive element and a second diffractive element. The two diffractive elements are arranged in a sequential configuration, and one of the diffractive elements is a crystal. The other diffractive element may be a multilayer optic.

    Abstract translation: 一种具有第一衍射元件和第二衍射元件的X射线束调节系统。 两个衍射元件按顺序配置，其中一个衍射元件是晶体。 另一个衍射元件可以是多层光学元件。

    Apparatus and method for the analysis of atomic and molecular elements by wavelength dispersive x-ray spectrometric devices
    214.
    发明申请
    Apparatus and method for the analysis of atomic and molecular elements by wavelength dispersive x-ray spectrometric devices 有权
    用于通过波长色散X射线光谱仪分析原子和分子元素的装置和方法

    公开(公告)号：US20040013227A1

    公开(公告)日：2004-01-22

    申请号：US10196805

    申请日：2002-07-17

    Inventor： Carsten Michaelsen ,  Rudiger Bormann ,  Jorg Wiesmann

    IPC: G01T001/36

    CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

    Abstract: In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair comprises carbon or scandium and the other comprises a metal oxide or a metal nitride and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.

    Abstract translation: 在通过波长色散X射线光谱法分析样品中原子或分子元素的装置和方法中，其中初级x射线或电子辐射被引导到样品上，从而从样品发射荧光辐射，荧光辐射 被引导到由多层结构构成的反射镜或聚焦装置，该多层结构包括一对层，其中一层包括碳或钪，另一层包含金属氧化物或金属氮化物，并且荧光辐射从反射镜反射 或聚焦装置到分析检测器上，以分析样品中包含的原子或分子元素。

    Magnetron sputtered boron films for increasing hardness of a metal surface
    215.
    发明授权
    Magnetron sputtered boron films for increasing hardness of a metal surface 失效
    磁控溅射硼膜以增加金属表面的硬度

    公开(公告)号：US06569293B1

    公开(公告)日：2003-05-27

    申请号：US08871705

    申请日：1997-06-09

    Applicant: Daniel M. Makowiecki ,  Alan F. Jankowski

    Inventor： Daniel M. Makowiecki ,  Alan F. Jankowski

    IPC: C23C1435

    CPC classification number: B82Y10/00 ,  C23C14/0635 ,  C23C14/0647 ,  C23C14/18 ,  C23C14/185 ,  C23C14/3414 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067 ,  Y10T428/265 ,  Y10T428/31678

    Abstract: A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.

    Abstract translation: 描述了通过磁控溅射沉积生产薄硼和钛/硼膜的方法。 不同于当通过各种物理气相沉积工艺制备薄膜时，无定形硼膜不含形态生长特征。 磁控溅射沉积法需要使用通过热等静压制备的高密度结晶硼溅射靶。 通过该方法制备的薄硼膜可用于生产硬化表面，表面机床等，以及用于超薄带通滤光器以及低Z /高Z光学部件中的低Z元件，例如增强反射率的反射镜 从放牧到正常发病。

    Multilayer extreme ultraviolet mirrors with enhanced reflectivity
    216.
    发明授权
    Multilayer extreme ultraviolet mirrors with enhanced reflectivity 有权
    具有增强反射率的多层极紫外镜

    公开(公告)号：US06449086B1

    公开(公告)日：2002-09-10

    申请号：US09605651

    申请日：2000-06-28

    Applicant: Mandeep Singh

    Inventor： Mandeep Singh

    IPC: F21V906

    CPC classification number: B82Y10/00 ,  G02B5/0891 ,  G03F1/24 ,  G03F7/70058 ,  G03F7/70233 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/061 ,  Y10S359/90 ,  Y10T428/24355

    Abstract: The reflectivity of multilayered EUV mirrors tuned for 11-16 nm, for which the two-component Mo/Be and Mo/Si multilayered systems are commonly used, is enhanced by incorporating additional elements and their compounds mainly from period 5 of the periodic table. In addition, the reflectivity performance of the multilayer stacks is further enhanced by a numerical global optimization procedure by which the layer thicknesses are varied for optimum performance in, contradistinction to the constant layer thickness—i.e. constant partition ration—multilayer stacks commonly designed and fabricated hitherto. By incorporating additional materials with differing complex refractive indices in various regions of the stack, or by wholly replacing one of the components (typically Mo), peak reflectivity enhancements of up to 5% for a single reflector are achieved, compared to a standard unoptimized stack. The additional materials used are: Rb, RbCl, Sr, Y, Zr, Ru, Rh, Tc, Pd, Nb and Be. Protective capping layers of B, Ru, Rh, C, Si3N4, SiC, are disclosed.

    Abstract translation: 通常使用双组分Mo / Be和Mo / Si多层体系的11-16nm的多层EUV反射镜的反射率通过主要从周期表的第5周引入附加元素及其化合物来增强。 此外，通过数值全局优化程序进一步增强了多层堆叠的反射性能，通过该数值全局优化程序，层厚度随着恒定层厚度的变化而达到最佳性能。 迄今为止通常设计和制造的恒定分配配给多层堆叠。 通过在堆叠的各个区域中引入具有不同复合折射率的附加材料，或通过完全替代其中一个部件（通常为Mo）），与标准未优化的堆叠相比，实​​现单个反射器的高达5％的峰值反射率增强 。 使用的附加材料有：Rb，RbCl，Sr，Y，Zr，Ru，Rh，Tc，Pd，Nb和Be。 公开了B，Ru，Rh，C，Si 3 N 4，SiC的保护性覆盖层。

    Optical element of multilayered thin film for X-rays and neutrons
    218.
    发明授权
    Optical element of multilayered thin film for X-rays and neutrons 失效
    用于X射线和中子的多层薄膜的光学元件

    公开(公告)号：US5646976A

    公开(公告)日：1997-07-08

    申请号：US487936

    申请日：1995-06-07

    Applicant: George Gutman

    Inventor： George Gutman

    IPC: G21K1/06

    CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2201/068

    Abstract: This invention relates to novel methods of producing flat and curved optical elements with laterally and depth graded multilayer thin films, in particular multilayers of extremely high precision, for use with soft and hard x-rays and neutrons and the optical elements achieved by these methods. In order to improve the performance of an optical element, errors in d spacing and curvature are isolated and subsequently compensated.

    Abstract translation: 本发明涉及生产具有横向和深度梯度多层薄膜的平面和弯曲光学元件的新方法，特别是具有极高精度的多层，用于软和硬x射线和中子以及通过这些方法实现的光学元件。 为了提高光学元件的性能，分离出d间隔和曲率的误差并随后进行补偿。

    X-ray wave diffraction optics constructed by atomic layer epitaxy
    219.
    发明授权
    X-ray wave diffraction optics constructed by atomic layer epitaxy 失效
    由原子层外延构成的X射线衍射光学元件

    公开(公告)号：US5458084A

    公开(公告)日：1995-10-17

    申请号：US164362

    申请日：1993-12-09

    Applicant: James M. Thorne ,  James K. Shurtleff ,  David D. Allred ,  Raymond T. Perkins

    Inventor： James M. Thorne ,  James K. Shurtleff ,  David D. Allred ,  Raymond T. Perkins

    IPC: G03F1/24 ,  G21K1/06 ,  C30B25/16

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G21K1/062 ,  G21K2201/061

    Abstract: X-ray wave diffraction devices are constructed using atomic layer epetaxy. A crystalline substrate is prepared with one or more surface areas on which multiple pairs of layers of material are to be deposited. These layers are then formed by atomic layer epetaxy on the surface areas of the substrate, one on top of another, with the material of each layer of each pair being selected to have a different index of refraction from that of the material of the other layer of each pair. The layers are formed so that the thickness of each layer of a pair is substantially the same as that of the corresponding layer of every other pair and so that x-ray waves impinging on the layers may be reflected therefrom. Layer pairs having a thickness of about 20 angstroms or less are formed on the substrate.

    Abstract translation: 使用原子层epetaxy构造X射线波衍射装置。 制备具有一个或多个表面区域的晶体衬底，在多个表面区域上沉积多对材料层。 这些层然后通过原子层外延在衬底的表面区域上形成，一个在另一个的顶部上，每对的每个层的材料被选择为具有与另一层的材料的折射率不同的折射率 的每一对。 这些层被形成为使得每一层的每个层的厚度与每隔一对的相应层的厚度基本相同，并且使得撞击在层上的X射线波可能被反射。 在基板上形成具有约20埃或更小厚度的层对。

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