公开(公告)号：KR1020010027837A

公开(公告)日：2001-04-06

申请号：KR1019990039787

申请日：1999-09-16

Applicant: 전자부품연구원

Inventor： 박광범 ,  문현찬 ,  김인회

IPC: H01L33/20

Abstract: PURPOSE: A method of fabricating a high-density LED array is to realize the LED array having a hetero-junction structure, thereby improving luminous efficiency and luminance of the LED array. CONSTITUTION: The second layer having the second lattice constant is formed on the first layer having the first lattice constant. The third layer having the third lattice constant is formed on the second layer to form a hetero-junction structure. A part of the third layer is etched to form the first insulating groove(4) for exposing an upper face of the first layer. The first insulating groove is filled with an insulating material. The hetero-junction structure is divided into an electrode portion and a luminous portion based on the first insulating groove. An insulating layer(7) is formed on the third layer and the first insulating groove. Then, the insulating layer on the third layer is partially removed corresponding to the luminous portion to form the second insulating groove(9). An etching process is performed to expose an upper face of the first layer to form the plurality of insulating grooves, thereby dividing the luminous portion into a plurality of unit illuminant sources.

Abstract translation: 目的：制造高密度LED阵列的方法是实现具有异质结结构的LED阵列，从而提高LED阵列的发光效率和亮度。 构成：具有第二晶格常数的第二层形成在具有第一晶格常数的第一层上。 具有第三晶格常数的第三层形成在第二层上以形成异质结结构。 蚀刻第三层的一部分以形成用于暴露第一层的上表面的第一绝缘槽（4）。 第一绝缘槽填充绝缘材料。 基于第一绝缘槽将异质结结构分为电极部分和发光部分。 绝缘层（7）形成在第三层和第一绝缘槽上。 然后，对应于发光部分，部分去除第三层上的绝缘层，形成第二绝缘槽（9）。 进行蚀刻处理以暴露第一层的上表面以形成多个绝缘槽，从而将发光部分分成多个单元光源。

公开(公告)号：KR1020010009173A

公开(公告)日：2001-02-05

申请号：KR1019990027428

申请日：1999-07-08

Applicant: 전자부품연구원

Inventor： 정석원 ,  박광범 ,  김인회 ,  박효덕 ,  문현찬 ,  이보나 ,  김건년 ,  박순섭

IPC: B29D11/00

Abstract: PURPOSE: Provided are a process for producing a high accurate microlens of various shapes by using X-ray lithography and a process for producing a die for injecting the microlens. CONSTITUTION: The process for producing the microlens(40) comprises the steps of: forming PMMA or a photosensitive film on a substrate(11); arraying an X-ray mask(20) and the substrate(11); exposing the substrate(11) by using the X-ray mask(20); eliminating the exposed PMMA or photosensitive film by using a developer; arraying the X-ray mask(20) and the rotary shaft(30) of the substrate(11); fixing the X-ray mask(20) and rotating the substrate(11) and exposing the substrate(11) in order to form the geometric shapes according to the shapes of absorbed bodies(21) on the X-ray mask and the position of the rotary shaft(30); eliminating the exposed PMMA or photosensitive film by using the developer to develop the geometric shapes.

Abstract translation: 目的：提供通过使用X射线光刻制造各种形状的高精度微透镜的方法以及用于制造用于注射微透镜的模具的方法。 构成：微透镜（40）的制造方法包括以下步骤：在基板（11）上形成PMMA或感光膜; 排列X射线掩模（20）和衬底（11）; 通过使用X射线掩模（20）使衬底（11）暴露; 通过使用显影剂消除曝光的PMMA或感光膜; 排列基板（11）的X射线掩模（20）和旋转轴（30）; 固定X射线掩模（20）并旋转衬底（11）并暴露衬底（11），以便根据X射线掩模上的吸收体（21）的形状和位置来形成几何形状 旋转轴（30）; 通过使用显影剂来除去暴露的PMMA或感光膜以形成几何形状。

公开(公告)号：KR1020000031172A

公开(公告)日：2000-06-05

申请号：KR1019980047080

申请日：1998-11-04

Applicant: 전자부품연구원

Inventor： 박광범 ,  황학인

IPC: G01B11/16

Abstract: PURPOSE: A device for measuring a displacement using a Michaelson optical interference is provided to solve a problem of an optical axis arrangement by embodying an optical system using an integrated optical element and to slim the size of a displacement measuring device. CONSTITUTION: A measuring device of displacement comprises of a substrate(200), a first optical wave guide(300), a second optical wave guide(500), an optical thin film layer(600), a lens(700) and a reflecting body of displacement measurement(800). The first optical wave guide(300) is an optical wave guide of a single mode having a regular radius and bent in a right-angle shape and is formed in a method such as ion exchanging method or a dopant diffusion inside the substrate(200) such as a glass or a LiNbO3. A light is projected from an optical fiber of single mode(100) in one end of the first optical wave guide(300) and the light is reflected to the opposite direction by a bragg lattice formed in the other end. The optical thin film layer(600) having a smaller refractivity than the first optical wave guide and to be able to optically penetrate is formed on the first optical wave guide(300) and the second optical wave guide(500) is formed on the optical thin film layer(600).

Abstract translation: 目的：提供一种使用迈克尔森光学干涉测量位移的装置，以通过体现使用集成光学元件的光学系统和减小位移测量装置的尺寸来解决光轴布置的问题。 构成：位移测量装置包括基板（200），第一光波导（300），第二光波导（500），光学薄膜层（600），透镜（700）和反射 位移测量体（800）。 第一光波导（300）是具有规则半径并以直角形弯曲的单模的光波导，以基板（200）内的离子交换法或掺杂剂扩散等方法形成， 例如玻璃或LiNbO 3。 从第一光波导（300）的一端的单模（100）的光纤投射光，并且通过在另一端形成的布拉格晶格将光反射到相反的方向。 在第一光波导（300）上形成具有比第一光波导更小的折射率并能够光学透过的光学薄膜层（600），第二光波导（500）形成在光学 薄膜层（600）。