Abstract:
A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. Certain of these components, most notably the beam source subsystem, the beam scanning subsystem and the optical collection and detection subsystem are modular for ready field replacement and/or maintenance. The optical collection and detection system features wing collectors in the front quartersphere and back collectors in the back quartersphere for collected light scattered from the surface of the workpiece. This can greatly improve the measurement capabilities of the system. Also included is a method for detecting asymmetric defects using the wing collectors and back collectors.
Abstract:
A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The system features a variable polarization a polarizing relay assembly arranged to selectively permit the scattered light having a selected polarization orientation to pass along a detector optical axis to a light detection unit in the detection subsystem. They system also features a collector output width varying subsystem for varying the width of an output slit in response to changes in the location of the location scanned on the workpiece.
Abstract:
In case of irradiating a sample with laser beam, dispersing light emitted from the sample to a spectrum, and fetching and detecting from a wavelength band extraction portion light in at least one band area from the dispersed spectrum, when at least one of a plurality of optical elements arranged between the sample and the dispersive element is switched, a positional relationship between the wavelength band extraction portion and a spectrum image formation position which is displaced in a dispersion direction due to a change in angle of light entering the dispersive element.
Abstract:
Bei einem Verfahren zur Erfassung der Oberflächenstruktur und Beschaffenheit einer Probe mittels einer Abtasteinrichtung (2), insbesondere zur Erfassung von durch Berührung der Haut des menschlichen Körpers auf der Oberfläche eines Gegenstands hervorgerufene oder mittels eines Spurenträgers aufgenommene Spuren, wobei die Probe (P) und die Abtasteinrichtung (2) relativ zueinander bewegt werden, wird die Probenoberfläche mit einem von der Abtasteinrichtung (2) abgegebenen Licht- oder Laserstrahl (L) zeilenweise bestrahlt, der von der Probenoberfläche reflektierte Licht- oder Laserstrahl (R) erfasst und aus Abweichungen des reflektierten Licht- oder Laserstrahls (R) vom abgegebenen Licht- oder Laserstrahl (L) ein digitales Bild der Topographie der Probenoberfläche und der Intensität des reflektierten Licht- oder Laserstrahls (R) zur Darstellung der Beschaffenheit der Probenoberfläche erzeugt.
Abstract:
Analyzers and analyzer systems that include an analyzer for determining multiple label species, methods of using the analyzer and analyzer systems to analyze samples, are disclosed herein. The analyzer includes one or more sources of electromagnetic radiation to provide electromagnetic radiation at wavelengths within the excitation bands of one or more fluorophore species to an interrogation space that is translated through the sample to detect the presence or absence of molecules of different target analytes. The analyzer may also include one or more detectors configured to detect electromagnetic radiation emitted from the one or more fluorophore species. The analyzer for determining multiple target molecule species provided herein is useful for diagnostics because the concentration of multiple species of target molecules may be determined in a single sample and with a single system.
Abstract:
Methods and systems for determining one or more parameters of a wafer inspection process are provided. One method includes acquiring metrology data for a wafer generated by a wafer metrology system. The method also includes determining one or more parameters of a wafer inspection process for the wafer or another wafer based on the metrology data.
Abstract:
The present invention relates to an apparatus (10) for detecting matter, the apparatus comprising: a first light source (14a) adapted to emit a first light beam (16a); a second light source (14b) adapted to emit a second light beam (16b), wherein the apparatus is arranged such that the first and second light beams converge towards a scanning element (20), e.g. a rotating polygon mirror; the scanning element adapted to redirect the converging first and second light beams towards the matter to be detected; and a detector (26) adapted to receive light (38) reflected by the matter via the scanning element.
Abstract:
A device for optically scanning and measuring an environment is designed as a laser scanner (10), with a base (14), a measuring head (12) which is rotatable relative to the base (14), a mirror (16) which is rotatably relative to the measuring head (12), wherein, in at least one operating mode, the laser scanner (10) is mounted on a cart (W) by means of a mounting device (40), the cart (W) moves the base (14) which is fixedly connected with the mounting device (40), the measuring head (12) rests relative to the base (14), the mirror (16) rotates, and the measuring head (12) is locked with the mounting device (40) by means of locking means (34k, 40k).
Abstract:
This invention relates to illumination device for providing near isotropic illumination, and particularly to an illumination system for detecting the defect in a transparent substrate and a detection system comprising the same. According to an embodiment of the invention, an illumination system is provided, which comprises: an illumination system for detecting the defect in a transparent substrate, comprising light source receptacle in bar shape; a plurality of first spot light sources, each emitting a respective first light, the respective first lights being substantially parallel to each other and the first spot light sources being arranged to a first line of spot light sources along the longitudinal direction of the receptacle; and a plurality of second spot light sources, each emitting a respective second light, the respective second lights being substantially parallel to each other and the second spot light sources being arranged to a second line of spot light sources along the longitudinal direction of the receptacle, wherein the first line of spot light sources and the second line of spot light sources are substantially arranged in a line, the first line of spot light sources and the second line of spot light sources locate in difference half of the receptacle in the longitudinal direction, the first light and the second light converge to a scan line, and the projections of the first and the second lights, which are converged at each point on the scan line, in a plane P passing the scan line and perpendicular to the transparent substrate are located at different sides of a line in the plane P, which passes the point and is perpendicular to the scan line.