公开(公告)号：EP0905098B1

公开(公告)日：2001-12-12

申请号：EP98307668.8

申请日：1998-09-22

Applicant: LUCENT TECHNOLOGIES INC.

Inventor： Fleming, James William, Jr. ,  Pafchek, Robert M.

IPC: C03B37/012 ,  C03B29/02 ,  C03B32/00 ,  C03C23/00 ,  C04B41/00

CPC classification number: C03C25/6293 ,  C03B29/02 ,  C03B37/01237 ,  C03B37/0148 ,  C03B37/01493 ,  C03B2201/03 ,  C03B2201/04 ,  C03C23/006

公开(公告)号：EP1006087A1

公开(公告)日：2000-06-07

申请号：EP99123835.3

申请日：1999-12-01

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Schultheis, Andreas

IPC: C03C1/02 ,  C03B32/00

CPC classification number: C03C1/022 ,  C03B19/095 ,  C03B19/102 ,  C03B19/1095 ,  C03B2201/03 ,  C03C1/026

Abstract: Es ist ein Verfahren für die Reinigung von SiO 2 -Körnung bekannt, bei dem eine Verunreinigungen enthaltende SiO 2 -Körnung auf eine Temperatur erhitzt wird, bei der die Verunreinigungen erweichen oder mit SiO 2 -Körnung Schmelzagglomerate bilden, wodurch die Verunreinigungen und die SiO 2 -Körnung voneinander separiert werden. Um hiervon ausgehend ein Verfahren anzugeben, mit dem bei vergleichsweise geringem Zeit-, Material- und Kostenaufwand hohe Reinheiten der Körnung erreicht werden, und eine für die Durchführung des Verfahrens geeignete, einfache Vorrichtung bereitzustellen, wird erfindungsgemäß vorgeschlagen, daß die SiO 2 -Körnung einem auf eine Prallfläche gerichteten Gasstrom zugeführt, darin erhitzt und in Richtung auf die Prallfläche beschleunigt wird, derart, daß erweichte Verunreinigungen oder Schmelzagglomerate an der Prallfläche haften und gereinigte SiO 2 -Körnung von der Prallfläche entfernt wird. Eine für die Durchführung des Verfahrens geeignete, einfache Vorrichtung, weist einen Brenner auf, in den ein Brenngas für eine Brenngasflamme eingespeist wird, und eine Zuführvorrichtung, mittels der Verunreinigungen enthaltende SiO 2 -Körnung dem Brenngas oder der Brenngasflamme zugeführt wird, sowie eine Prallfläche, auf die die Brenngasflamme gerichtet ist.

Abstract translation: 二氧化硅颗粒的纯化，涉及在热气体流（8）夹带走上冲击表面（10）仅保留了杂质（9）。 （8）涉及的二氧化硅颗粒（7）通过在气体流加热和夹带纯化走上冲击表面（10），所以没软化的污染物（9）或附聚物熔融粘附到表面上，而纯化的硅石颗粒（13）被除去 从表面。 因此独立claimsoft被包括为设备用于进行上述处理。 优选的特点：该气流包含卤素气体处理。

公开(公告)号：EP0976687A1

公开(公告)日：2000-02-02

申请号：EP99113547.6

申请日：1999-07-06

Applicant: Shin-Etsu Chemical Co., Ltd.

Inventor： Ohtsuka, Hisatoshi, Specialty Research Center

IPC: C03B19/14 ,  C03C1/02 ,  C03C3/06 ,  C07F7/20

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B2201/03 ,  C03B2207/85 ,  C03B2207/87 ,  C03C1/02 ,  C03C2201/02 ,  C03C2203/40 ,  C03C2203/42

Abstract: Disclosed is a method for producing a synthetic fused silica member comprising vaporizing a raw material silane compound, hydrolyzing or oxidizing by combustion the vaporized silane compound in oxyhydrogen flame to form silica microparticles so that the silica microparticles deposit on a rotating refractory carrier, and melting the silica microparticles during the deposition to form the synthetic fused silica member, characterized in that sulfur impurities are preliminarily removed from the raw material. Also provided is a synthetic fused silica member produced by the method that does not emit yellow fluorescence at a wavelength of 560-580 nm even when it is irradiated with an ultraviolet ray by an excimer laser or the like, and hence can suitably be used for optical applications using as a light source high energy ultraviolet rays such as those from excimer lasers, typically KrF and ArF excimer lasers, for example, use as a lens material for steppers and the like as well as an optical member such as lenses and photomasks for excimer laser produced from the synthetic fused silica material.

Abstract translation: 公开了一种合成石英玻璃的制造方法，其包括使原料硅烷化合物蒸发，通过在氢氧焰中燃烧汽化硅烷化合物进行水解或氧化，形成二氧化硅微粒，使得二氧化硅微粒沉积在旋转的耐火载体上， 二氧化硅微粒在沉积期间形成合成的熔融二氧化硅构件，其特征在于硫原子从原料中预先除去。 还提供了一种通过不使560-580nm的波长发出黄色荧光的方法制造的合成熔凝硅石，即使用准分子激光等照射紫外线，也可适用于 使用诸如来自准分子激光器（通常是KrF和ArF准分子激光器）的高能紫外线的光学应用例如用作步进器等的透镜材料以及诸如透镜和光掩模的光学部件 由合成熔融二氧化硅材料制备的准分子激光。

公开(公告)号：EP0430685A3

公开(公告)日：1992-05-20

申请号：EP90312973.2

申请日：1990-11-29

Applicant: E.I. DU PONT DE NEMOURS AND COMPANY

Inventor： Sasaki, Shigeo, Mitsubishi Monsanto Chemical Co. ,  Kojima, Miho, Mitsubishi Monsanto Chemical Co.

IPC: C01B33/148 ,  C01B33/18

CPC classification number: C01B33/18 ,  C01B33/1485 ,  C01P2006/80 ,  C03B2201/03

Abstract: A process is disclosed for removing non-alkali metals from an acidic silicate solution or suspension, the process comprising subjecting the solution or suspension to an electrochemical process in the presence of a strong acid and an oxidising agent such that non-alkali metals present form water-soluble salts, and ion-exchanging the solution. The acidic silicate solution or suspension may be generated by ion-exchanging an aqueous alkali silicate solution to remove alkali metals. The invention therefore enables a silicic acid aqueous solution having a low content of metal impurities, for example 1 ppm or less, to be prepared from an alkali metal silicate of low purity.

公开(公告)号：EP3390309A1

公开(公告)日：2018-10-24

申请号：EP16822951.6

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： OTTER, Matthias ,  LEHMANN, Walter ,  HÜNERMANN, Michael ,  NIELSEN, Nils Christian ,  WHIPPEY, Nigel Robert ,  GROMANN, Boris ,  KPEBANE, Abdoul-Gafar ,  KAYSER, Thomas

IPC: C03B20/00 ,  C03C12/00 ,  C03B19/10 ,  C03B37/012 ,  C03C3/06 ,  C03B19/06

CPC classification number: C03B19/108 ,  C03B17/04 ,  C03B19/066 ,  C03B19/106 ,  C03B19/1095 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/44 ,  C03C2203/54

Abstract: The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate, ii.) forming a glass melt from the silica granulate, and iii.) forming a silica glass article from at least some of the glass melt, step i.) consisting of steps I. producing a silica powder using at least two particles made from a silicon-chlorine compound, II. bringing the silica powder into contact with steam so as to obtain a treated silica powder, and III. granulating the treated silica powder so as to obtain a silica granulate, the chlorine content of the silica powder being higher than the chlorine content of the silica granulate. The invention further relates to a silica glass article that can be obtained by said method. The invention also relates to a method for producing a silica granulate. The invention finally relates to an optical waveguide, an illuminant and a molded article, each of which can be obtained by further processing the silica glass article.

公开(公告)号：EP2070883B2

公开(公告)日：2017-04-19

申请号：EP07807048.9

申请日：2007-09-11

Applicant: Tosoh Corporation ,  Tosoh Sgm Corporation

Inventor： ARAI, Kazuyoshi ,  TAKAHATA, Tsutomu ,  HASIMOTO, Shinkichi ,  UCHIDA, Masato ,  YAMADA, Nobusuke ,  HARADA, Yoshinori ,  HORIKOSHI, Hideharu

IPC: C03B20/00 ,  C03C3/06 ,  C03C4/00 ,  C03B19/06 ,  C03C4/10

CPC classification number: C03C4/0085 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C4/10 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2201/54 ,  Y02P40/57

公开(公告)号：EP1411032B1

公开(公告)日：2016-12-28

申请号：EP02747689.4

申请日：2002-07-18

Applicant: Mitsubishi Chemical Corporation

Inventor： KATSURO, Yoshio, c/o Mitsubishi Chemical Corp. ,  YAMAHARA, Keiji, c/o Mitsubishi Chemical Corp. ,  YAMAGUCHI, Takashi, c/o Mitsubishi Chemical Corp. ,  MORI, Yutaka, c/o Mitsubishi Chemical Corporation

IPC: C03B20/00 ,  C03B8/02 ,  C03C1/00 ,  C03C12/00 ,  C03B19/10 ,  C01B33/18 ,  C03C3/06 ,  C03B19/01 ,  C03B19/09

CPC classification number: C03C1/006 ,  C03B19/01 ,  C03B19/09 ,  C03B19/1065 ,  C03B19/1095 ,  C03B2201/03 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2203/26

公开(公告)号：EP3102173A1

公开(公告)日：2016-12-14

申请号：EP15746976.8

申请日：2015-02-03

Applicant: Momentive Performance Materials Inc.

Inventor： XU, Guangjun ,  KOCH, Robert

IPC: A61J1/00

CPC classification number: C03B20/00 ,  C03B17/04 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/03 ,  C03B2201/30 ,  C03C3/06 ,  C03C23/0075 ,  C03C2201/02 ,  C03C2201/30 ,  C03C2203/10 ,  C03C2203/52

Abstract: A method for forming high purity silica articles. The high purity silica articles can be particularly suitable for forming packaging such as packaging for pharmaceutical applications. The method for forming high purity silica articles can comprise, in one embodiment, (a) forming a fused quartz melt from a SiO2 raw material; (b) forming a quartz tube from the fused quartz melt; (c) treating the quartz tube with an acid composition; (d) heat treating the quartz tube subsequent to treating with the acid composition; and (e) optionally treating the quartz article with an acid composition subsequent to the heat treating operation. The method can enhance the purity of silica glass articles and products made therefrom.

公开(公告)号：EP2495220A1

公开(公告)日：2012-09-05

申请号：EP10826742.8

申请日：2010-10-26

Applicant: Asahi Glass Company, Limited

Inventor： MORITA Ryusuke ,  NAKAGAWA Takuya ,  IWATA Kei ,  TAKATA Masaaki

IPC: C03B20/00 ,  C03B8/04 ,  C03C3/06 ,  G02B1/02 ,  G03F7/20 ,  H01L21/027

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  G03F1/50 ,  G03F7/70958 ,  Y02P40/57

Abstract: The present invention relates to an optical member for deep ultraviolet having a wavelength of 250 nm or shorter, containing a synthetic silica glass which does not substantially contain a halogen element, has a maximum OH group content of less than 10 ppm by weight, has contents of ODC (oxygen deficient centers) and E-prime center of each less than 1×10 14 cm -3 , does not substantially contain SiH and peroxy linkage, and has a fictive temperature of 1,050°C or lower.

Abstract translation: 本发明涉及一种波长为250nm以下的深紫外线用光学构件，其含有基本上不含卤素元素的合成石英玻璃，其OH基含量的最大值在10ppm以下，具有含量 的ODC（缺氧中心）和E-prime中心各自小于1×10 14 cm -3，基本上不含有SiH和过氧键，并且具有1050℃或更低的假想温度。

公开(公告)号：EP1942081A2

公开(公告)日：2008-07-09

申请号：EP08000008.6

申请日：2008-01-02

Applicant: Draka Comteq B.V. ,  Flammer, Ivo ,  Momentive ,  Gonnet, Cédric ,  Xu, Guangjun ,  Zeng, Larry ,  Simons, Dennis, Robert ,  Deckers, Rob, Hubertus, Matheus

Inventor： Gonnet, Cédric ,  Xu, Guangjun ,  Zeng, Larry ,  Simons, Dennis, Robert ,  Deckers, Rob, Hubertus, Matheus ,  Flammer, Ivo

IPC: C03B32/00 ,  C03B37/018 ,  C03C23/00

CPC classification number: C03B37/01876 ,  C03B32/00 ,  C03B37/01892 ,  C03B2201/03 ,  C03C3/06 ,  C03C2203/52 ,  Y02P40/57

Abstract: Disclosed is an optical fiber having attenuation of less than 0.25 dB/km at wavelength of 1550 nanometers. The optical fiber is formed from quartz deposition tubes that have been heat treated at between 900°C and 1200°C for at least 115 hours.

Abstract translation: 公开了一种在1550纳米波长处具有小于0.25dB / km的衰减的光纤。 光纤由石英沉积管形成，其在900℃和1200℃之间经过热处理至少115小时。