Abstract:
The present patent is about a multi user UV-VIS/NIR array spectrophotometer using a Fiber Optic Probe/Sphere and Photonic Switches based on the principle of computers client server architecture, where a spectrophotometer acts as a server and the fiber optic probe/sphere acts as a client. Any number of users can operate at the same time to use the instrument for their respective analyses through simultaneous wavelength sensing with appropriate software installed in the PC connected to the Spectrophotometer through regular computer network.
Abstract:
System, method, and apparatus for determining the composition of a sample of material. In one embodiment, the method pertains to the counting of photons that were inelastically scattered by the sample, and for minimizing the effects of fluorescent or phosphorescent photons. In yet another embodiment of the invention, a sample is illuminated by a repetitive pulse of monochromatic light, and the resultant scattered photons from the samples are collected and counted during a predetermined integration period. Yet other embodiments pertain to a low-cost, computer-controlled system for repetitively counting inelastically scattered photons so as to create a Raman histogram and a Raman spectrogram of the photons.
Abstract:
Application of digital light processor (DLP) systems in monochromotor, spectrophotometer or the like systems to mediate selection of individual wavelengths, and/or to image elected regions of a sample in an imaging ellipsometer, imaging polar imeter, imaging ref lectometer, imaging spectrophotometer r and/or to provide chopped beams.
Abstract:
The disclosure relates to a portable and/or handheld bioagent detector and methodology described herein that is based in part on advanced Raman Chemical Imaging ("RCI") technology. According to one embodiment of the present disclosure, the detection system may include a fiber array spectral translator ("FAST") and may also include a probe which may include a complementary metal oxide semiconductor (CMOS) camera. The probe alleviates the need to place the main instrument close to an unconfined release of a potentially hazardous material and facilitates analysis of a sample that is situated in a hard-to-reach location while minimizing contamination of the detector and operator.
Abstract:
A method and apparatus are disclosed for measuring a characteristic, e.g. spectral bandwidth, of a light beam. The apparatus may comprise an etalon for generating an interference pattern having at least one light cone, an arrangement of detector elements, the arrangement receiving a portion of the light cone and producing a signal indicative of the characteristic; and an auxiliary detector positioned to receive a portion of the light cone and produce a signal indicative of an alignment between the etalon and the linear arrangement.
Abstract:
A method for monitoring a process output with a highly abridged spectrophotometer. The method includes securing spectral data for each spectral primary used in a process, measuring spectral data with a highly abridged spectrophotometer for a sample produced by the process, determining an estimated weight for each spectral primary in the sample, and computing spectral data representative of the sample based on the secured spectral data and the determined estimated weight for each spectral primary in the sample.
Abstract:
A method for monitoring a process output with a highly abridged spectrophotometer. The method includes securing spectral data for each spectral primary used in a process, measuring spectral data with a highly abridged spectrophotometer for a sample produced by the process, determining an estimated weight for each spectral primary in the sample, and computing spectral data representative of the sample based on the secured spectral data and the determined estimated weight for each spectral primary in the sample.
Abstract:
A spectral analysis module for a high repetition rate gas discharge laser having a pulsed output beam with energy greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at repetition rates of 4000 Hz and above, comprising a beam-splitter in said laser's output path, said beam-splitter oriented at an angle to reduce incident fluence and creating overlapping fresnel reflections in the first portion of the laser output beam; a secondary beam-splitter tolerating the fluence created by said reflections in said first portion, the secondary beam-splitter reflecting most of said first portion and passing a second portion of the output beam; a telescoping optic (204, 220) that demagnifies said second portion onto a first diffuser (22), the demagnification selected to keep the fluence in the overlapping fresnel reflections in said second portion below the damage threshold of said first diffuser.
Abstract:
The present invention provides a wavemeter for an ultraviolet laser capable of long life beam quality monitoring in a pulsed ultraviolet laser system at pulse rates greater that 2000 Hz at pulse energies at 5 mJ or greater. In a preferred embodiment an enhanced illumination configuration reduces per pulse illumination of an etalon by a factor of 28 compared to a popular prior art configuration. Optics are provided in this embodiment which reduce light entering the etalon to only that amount needed to illuminate a linear photo diode array positioned to measure interference patterns produced by the etalon. In this preferred embodiment tow sample beams produced by reflections from two surfaces of a beam splitter are diffused by a defractive diffuser and the output of the defractive diffuser is focused on tow separate secondary diffusers effectively combining both beams in two separate secondary diffusers effectively combining both beams in two separate spectrally equivalent diffuse beams. One beam is used for wavelength and bandwidth measurement and the other beam is used for calibration. In preferred embodiments an etalon chamber contains nitrogen with an oxygen concentration of between 1.6 and 2.4 percent.