中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

869 records (took 0.03 seconds)

    Method of manufacturing micro-optic device
    242.
    发明申请
    Method of manufacturing micro-optic device 失效
    微光器件制造方法

    公开(公告)号：US20090004765A1

    公开(公告)日：2009-01-01

    申请号：US12070931

    申请日：2008-02-22

    Applicant: Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

    Inventor： Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

    IPC: H01L21/02

    CPC classification number: G02B6/3584 ,  B81B3/0083 ,  B81B2201/045 ,  B81C1/00182 ,  G02B6/122 ,  G02B6/136 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3546 ,  G02B6/357 ,  G02B6/3596 ,  G02B26/0841

    Abstract: A micro-optic device including a complicate structure and a movable mirror is made to be manufactured in a reduced length of time. A silicon substrate and a single crystal silicon device layer with an intermediate layer of silicon dioxide interposed therebetween defines a substrate on which a layer of mask material is formed and is patterned to form a mask having the same pattern as the configuration of the intended optical device as viewed in plan view. A surface which is to be constricted as a mirror surface is chosen to be in a plane of the silicon crystal. Using the mask, the device layer is vertically etched by a reactive ion dry etching until the intermediate layer is exposed. Subsequently, using KOH solution, a wet etching which is anisotropic to the crystallographic orientation is performed with an etching rate which is on the order of 0.1 μm/min for a time interval on the order of ten minutes is performed to convert the sidewall surface of the mirror into a smooth crystallographic surface. Subsequently, the intermediate layer is selectively subject to a wet etching to remove the intermediate layer only in an area located below the movable part of the optical device.

    Abstract translation: 制造包括复杂结构的微光学装置和可移动反射镜以缩短的时间来制造。 硅衬底和介于其间的二氧化硅中间层的单晶硅器件层限定了其上形成有掩模材料层的衬底并且被图案化以形成具有与所需光学器件的配置相同的图案的掩模 如平面图所示。 要被收缩成为镜面的表面被选择在硅晶体的平面内。 使用掩模，通过反应离子干蚀刻垂直蚀刻器件层，直到中间层露出。 随后，使用KOH溶液，对晶体取向进行各向异性的湿式蚀刻，以10分钟左右的时间间隔进行蚀刻速度为0.1μm/分钟左右的蚀刻速度， 镜子变成光滑的结晶表面。 随后，中间层选择性地进行湿式蚀刻，仅在位于光学器件的可移动部分下方的区域中除去中间层。

    Micro-electro-mechanical systems device
    244.
    发明申请
    Micro-electro-mechanical systems device 审中-公开
    微机电系统装置

    公开(公告)号：US20080211044A1

    公开(公告)日：2008-09-04

    申请号：US12071513

    申请日：2008-02-21

    Applicant: Tamotsu Akashi ,  Tsuyoshi Yamamoto

    Inventor： Tamotsu Akashi ,  Tsuyoshi Yamamoto

    IPC: H01L29/84

    CPC classification number: B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0109 ,  G02B26/0833

    Abstract: According to an aspect of an embodiment, a micro-electro-mechanical systems (MEMS) device comprises a substrate, a MEMS and a movable absorber.The MEMS has a movable part having a resonance frequency on the substrate. The movable absorber absorbs a vibration in accordance with the resonance frequency so as to vibrate itself.

    Abstract translation: 根据实施例的一个方面，微电子机械系统（MEMS）装置包括衬底，MEMS和可移动吸收体。 MEMS具有在基板上具有共振频率的可移动部分。 可移动吸收体根据谐振频率吸收振动，以便自身振动。

    Energy storage structures using electromechanically active materials for micro electromechanical systems
    245.
    发明授权
    Energy storage structures using electromechanically active materials for micro electromechanical systems 有权
    使用微机电系统的机电活性材料的储能结构

    公开(公告)号：US07355777B2

    公开(公告)日：2008-04-08

    申请号：US11430651

    申请日：2006-05-09

    Applicant: Patrick Ian Oden ,  William Craig McDonald

    Inventor： Patrick Ian Oden ,  William Craig McDonald

    IPC: G02F1/03 ,  G02B26/00

    CPC classification number: G02B26/0841 ,  B81B3/0054 ,  B81B2201/045 ,  B81B2203/0118

    Abstract: System and method for storing energy using electromechanically active materials in micro electromechanical systems. A preferred embodiment comprises a movable element, an intermediate layer formed under the movable element, and electrical addressing circuitry formed under the intermediate layer. The intermediate layer contains a hinge and at least one flexible member associated with the movable element, with the flexible member comprising a layer made from an electromechanically active material. The electromechanically active material contracts or deforms when an electric field is applied, helping the movable element move from a first position to a second position. The use of the electromechanically active material enables the flexible member to apply a greater force on the movable element to help the movable element overcome stiction.

    Abstract translation: 在微机电系统中使用机电活性材料储存能量的系统和方法。 优选实施例包括可移动元件，形成在可移动元件下方的中间层以及形成在中间层下面的电寻址电路。 中间层包含铰链和与可移动元件相关联的至少一个柔性构件，柔性构件包括由机电活性材料制成的层。 当施加电场时，机电活性材料收缩或变形，帮助可移动元件从第一位置移动到第二位置。 使用机电活性材料使得柔性构件能够在可移动元件上施加更大的力以帮助可移动元件克服粘性。

    Buckling actuator
    246.
    发明授权
    Buckling actuator 有权
    弯曲执行器

    公开(公告)号：US07304556B2

    公开(公告)日：2007-12-04

    申请号：US10527731

    申请日：2004-06-25

    Applicant: Masaya Tamura ,  Shinji Kobayashi

    Inventor： Masaya Tamura ,  Shinji Kobayashi

    IPC: H01H51/22

    CPC classification number: G02B6/358 ,  B81B3/0051 ,  B81B2201/033 ,  B81B2201/045 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3544 ,  G02B6/357 ,  G02B6/3572 ,  G02B6/3584 ,  G02B26/0833 ,  H02N1/008

    Abstract: A buckling actuator has a connecting section of a supporting beam that is provided with a rotatable supporter for allowing a movable member to be stably maintained at one of two switch positions. A substrate, stationary members, rotatable supporters, and supporting beams support a movable member in a shiftable manner in a y-axis direction, such that the movable member can be shifted between first and second switch positions. Moreover, the rotatable supporters are each provided with arm portions which extend in a radial fashion and support the corresponding supporting beam in a rotatable manner. When the movable member is being shifted, each supporting beam can be rotated without having to bend a corresponding end by a significant amount. Thus, a large barrier ΔE of potential energy of the movable member is set between the first and second switch positions. The movable member can therefore be stably maintained at each of the switch positions even when electric power is not supplied to electrodes. Furthermore, each arm portion prevents the movable member from being displaced in an x-axis direction.

    Abstract translation: 弯曲致动器具有支撑梁的连接部分，该连接部分设置有用于允许可动构件稳定地保持在两个开关位置之一的可旋转支撑件。 基板，固定构件，旋转支撑件和支撑梁在y轴方向上以可移动的方式支撑可移动构件，使得可移动构件能够在第一和第二开关位置之间移动。 此外，旋转的支撑件各自设置有以径向方式延伸并以可旋转方式支撑相应的支撑梁的臂部分。 当可移动部件移动时，可以使每个支撑梁旋转，而不必使相应的端部弯曲大量。 因此，在第一和第二开关位置之间设置可动构件的势能的大阻挡DeltaE。 因此，即使不向电极供电，也可以将可动构件稳定地维持在开关位置的各个位置。 此外，每个臂部防止可动构件在x轴方向上移位。

    Electrostatic bimorph actuator
    248.
    发明授权
    Electrostatic bimorph actuator 有权
    静电双压电晶片致动器

    公开(公告)号：US07249856B2

    公开(公告)日：2007-07-31

    申请号：US10868603

    申请日：2004-06-14

    Applicant: Michael J. Sinclair

    Inventor： Michael J. Sinclair

    IPC: G03B21/28 ,  G03B21/00 ,  G02F1/00 ,  G02B26/00

    CPC classification number: B81B3/0054 ,  B81B2201/032 ,  B81B2201/038 ,  B81B2201/045 ,  B81B2201/047

    Abstract: An electrostatic bimorph actuator includes a cantilevered flexible bimorph arm that is secured and insulated at one end to a planar substrate. In an electrostatically activated state the bimorph arm is generally parallel to the planar substrate. In a relaxed state, residual stress in the bimorph arm causes its free end to extend out-of-plane from the planar substrate. The actuator includes a substrate electrode that is secured to and insulated from the substrate and positioned under and in alignment with the bimorph arm. An electrical potential difference applied between the bimorph arm and the substrate electrode imparts electrostatic attraction between the bimorph arm and the substrate electrode to activate the actuator. As an exemplary application in which such actuators could be used, a microelectrical mechanical optical display system is described.

    Abstract translation: 静电双压电晶片致动器包括悬臂式柔性双压电晶臂，其在一端固定并绝缘到平面衬底。 在静电激活状态下，双压电晶片臂通常平行于平面衬底。 在松弛状态下，双压电晶片臂中的残余应力使其自由端从平面基板向外延伸。 致动器包括固定到基板并与基板绝缘并位于双压电晶片臂下方并与之对准的基板电极。 施加在双压电晶片臂和衬底电极之间的电势差使得双压电晶片臂和衬底电极之间的静电吸引力激活致动器。 作为可以使用这种致动器的示例性应用，描述了一种微电子机械光学显示系统。

    Optical microelectromechantical structure
    249.
    发明申请
    Optical microelectromechantical structure 失效

    公开(公告)号：US20060228066A1

    公开(公告)日：2006-10-12

    申请号：US10559310

    申请日：2003-06-06

    Applicant: Jan Ravnkilde ,  Henning Henningsen

    Inventor： Jan Ravnkilde ,  Henning Henningsen

    IPC: G02B6/12

    CPC classification number: B81C3/008 ,  B81B2201/045 ,  B81C2203/0109 ,  G02B26/02

    Abstract: The invention relates to an optical microelectromechanical structure (MEMS) comprising—an (at least one) optically transmissive layer (UTL)—an (at least one) intermediate layer structure (IL)—a (at least one) device layer (DL) said intermediate layer structure (IL) defining one or more optical paths (OP) between said substantially optically transmissive layer (UTL) and said device layer (DL), said intermediate structure layer (IL) defining the distance (d) between said optically transmissive layer (UTL) and said device layer (DL).

    MEMS device made of transition metal-dielectric oxide materials
    250.
    发明授权
    MEMS device made of transition metal-dielectric oxide materials 有权

    公开(公告)号：US07057251B2

    公开(公告)日：2006-06-06

    申请号：US10198389

    申请日：2002-07-17

    Applicant: Jason S. Reid

    Inventor： Jason S. Reid

    IPC: H01L31/0232

    CPC classification number: B81B3/0078 ,  B81B2201/045 ,  B81B2203/0118

    Abstract: Micromechanical devices are provided that are capable of movement due to a flexible portion. The micromechanical device can have a flexible portion formed of an oxide of preferably an element from groups 3A to 6A of the periodic table (preferably from the first two rows of these groups) and a late transition metal (preferably from groups 8B or 1B of the periodic table). The micromechanical devices can be any device, particularly MEMS sensors or actuators preferably having a flexible portion such as an accelerometer, DC relay or RF switch, optical cross connect or optical switch, or a micromirror part of an array for direct view and projection displays. The flexible portion is preferably formed by sputtering a target having a group 8B or 1B element and a selected group 3A to 6A element, namely B, Al, In, Si, Ge, Sn, or Pb. The target can have other major constituents or impurities (e.g. additional group 3A to 6A element(s)). The target is reactively sputtered in a oxygen ambient so as to result in a sputtered hinge. It is possible to form both stiff and/or flexible portions of the micromechanical device in this way.

Patent Agency Ranking