USE OF CONTROLLED ATMOSPHERE PLASMA SPRAY COMBINED WITH ELECTRODEPOSITION TO FABRICATE A ROCKET ENGINE CHAMBER
    241.
    发明申请
    USE OF CONTROLLED ATMOSPHERE PLASMA SPRAY COMBINED WITH ELECTRODEPOSITION TO FABRICATE A ROCKET ENGINE CHAMBER 审中-公开
    使用与电沉积相结合的控制大气等离子体喷雾来制造摇篮发动机室

    公开(公告)号:WO2006110178A3

    公开(公告)日:2007-09-27

    申请号:PCT/US2005038613

    申请日:2005-10-26

    CPC classification number: C23C4/02 C23C4/18 C25D1/02 C25D7/00 F02K9/62 F02K9/974

    Abstract: An electrodeposition process is used to manufacture a thin layer of iridium (212) on a mandrel. A Controlled Atmosphere Plasma Spray (CAPS) process is used to fabricate a rhenium, rhenium containing alloy, or refractory alloy layer (210) on the electrodeposited iridium layer (212). After deposition of rhenium, rhenium containing alloy, or refractory alloy, the process uses a second CAPS process to apply a transition refractory material (214, 216), such as niobium, at each end of a rocket engine chamber (200). The electrodeposited iridium layer (212) provides a highly purified, highly ductile, uniform iridium layer (212).

    Abstract translation: 电沉积工艺用于在心轴上制造铱(212)的薄层。 控制气氛等离子体喷涂(CAPS)工艺用于在电沉积的铱层(212)上制造含铼,含铼的合金或​​耐火合金层(210)。 在沉积铼,含铼合金或耐火合金之后,该方法使用第二CAPS工艺在火箭发动机室(200)的每个端部施加诸如铌的过渡耐火材料(214,216)。 电沉积铱层(212)提供高度纯化,高度延展的均匀的铱层(212)。

    USE OF CONTROLLED ATMOSPHERE PLASMA SPRAY COMBINED WITH ELECTRODEPOSITION TO FABRICATE A ROCKET ENGINE CHAMBER
    244.
    发明申请
    USE OF CONTROLLED ATMOSPHERE PLASMA SPRAY COMBINED WITH ELECTRODEPOSITION TO FABRICATE A ROCKET ENGINE CHAMBER 审中-公开
    使用与电沉积相结合的控制大气等离子体喷雾来制造摇篮发动机室

    公开(公告)号:WO2006110178A2

    公开(公告)日:2006-10-19

    申请号:PCT/US2005/038613

    申请日:2005-10-26

    CPC classification number: C23C4/02 C23C4/18 C25D1/02 C25D7/00 F02K9/62 F02K9/974

    Abstract: An electrodeposition process is used to manufacture a thin layer of iridium (212) on a mandrel. A Controlled Atmosphere Plasma Spray (CAPS) process is used to fabricate a rhenium, rhenium containing alloy, or refractory alloy layer (210) on the electrodeposited iridium layer (212). After deposition of rhenium, rhenium containing alloy, or refractory alloy, the process uses a second CAPS process to apply a transition refractory material (214, 216), such as niobium, at each end of a rocket engine chamber (200). The electrodeposited iridium layer (212) provides a highly purified, highly ductile, uniform iridium layer (212).

    Abstract translation: 电沉积工艺用于在心轴上制造铱(212)的薄层。 控制气氛等离子体喷涂(CAPS)工艺用于在电沉积的铱层(212)上制造含铼,含铼的合金或​​耐火合金层(210)。 在沉积铼,含铼合金或耐火合金之后,该方法使用第二CAPS工艺在火箭发动机室(200)的每个端部施加诸如铌的过渡耐火材料(214,216)。 电沉积铱层(212)提供高度纯化,高度延展的均匀的铱层(212)。

    A CHEMICAL REACTOR AND METHOD FOR CHEMICALLY CONVERTING A FIRST MATERIAL INTO A SECOND MATERIAL
    245.
    发明申请
    A CHEMICAL REACTOR AND METHOD FOR CHEMICALLY CONVERTING A FIRST MATERIAL INTO A SECOND MATERIAL 审中-公开
    一种化学反应器和将第一种材料转化为第二种材料的方法

    公开(公告)号:WO2006055263A2

    公开(公告)日:2006-05-26

    申请号:PCT/US2005/039814

    申请日:2005-11-02

    Inventor: KONG, Peter, C.

    Abstract: A chemical reactor and method for converting a first material into a second material is disclosed and wherein the chemical reactor is provided with a feed stream of a first material which is to be converted into a second material; and wherein the first material is combusted in the chemical reactor to produce a combustion flame, and a resulting gas; and an electrical arc is provided which is passed through or superimposed upon the combustion flame and the resulting gas to facilitate the production of the second material.

    Abstract translation: 公开了用于将第一材料转化为第二材料的化学反应器和方法,其中所述化学反应器具有要转化成第二材料的第一材料的进料流; 并且其中所述第一材料在所述化学反应器中燃烧以产生燃烧火焰,以及产生的气体; 并且提供电弧,其通过或叠加在燃烧火焰和所产生的气体上以便于生产第二材料。

    LOW PRESSURE STAGNATION FLOW REACTORS WITH A FLOW BARRIER
    247.
    发明申请
    LOW PRESSURE STAGNATION FLOW REACTORS WITH A FLOW BARRIER 审中-公开
    低流量流动反应器与流动障碍

    公开(公告)号:WO00070116A1

    公开(公告)日:2000-11-23

    申请号:PCT/US1999/011331

    申请日:1999-05-19

    Abstract: A flow barrier (310) disposed at the periphery of a workpiece for achieving uniform reaction across the surface of the workpiece, such as a semiconductor wafer, in a stagnation flow reactor operating under the conditions of a low pressure or low flow rate. The flow barrier (310) is preferably in the shape of annulus and can include within the annular structure passages or flow channels (410, 415) for directing a secondary flow of gas substantially at the surface of a semiconductor workpiece. The flow barrier (310) can be constructed of any material which is chemically inert to reactive gases flowing over the surface of the semiconductor workpiece.

    Abstract translation: 设置在工件周边处的流动阻挡件(310),用于在低压或低流量条件下操作的停滞流动反应器中,跨越诸如半导体晶片的工件的表面实现均匀的反应。 流动阻挡件(310)优选地是环形的并且可以包括在环形结构通道或流动通道(410,415)内,用于引导基本上在半导体工件的表面处的二次气流。 流动阻挡件(310)可以由对在半导体工件的表面上流动的反应性气体具有化学惰性的任何材料构成。

    SPRAY DEPOSITION PROCESS
    248.
    发明申请
    SPRAY DEPOSITION PROCESS 审中-公开
    喷雾沉积工艺

    公开(公告)号:WO00050177A1

    公开(公告)日:2000-08-31

    申请号:PCT/US2000/004494

    申请日:2000-02-23

    CPC classification number: C23C4/12 B22D23/003 C23C4/02 C23C4/123 C23C4/131

    Abstract: A process for producing a metallic tool, mould, die or other body of significant thickness or a coating, the process comprising directing a spray (3, 4) comprising molten metallic droplets carried by a propelling gas toward an object surface (7) of a substrate or pattern (5) so as to build up a metallic deposit or coating comprising the mould, tool, die, body or coating on the object surface (7) of the substrate or pattern (5), wherein at one or more predetermined stages during spraying droplets of a relatively large mean size are sprayed and at one or more other stages droplets or a relatively smaller mean size are sprayed.

    Abstract translation: 一种用于生产金属工具,模具,模具或具有显着厚度或涂层的其它主体的方法,所述方法包括将包括由推进气体携带的熔融金属液滴的喷雾(3,4)引导到喷雾器的物体表面(7) 衬底或图案(5),以便在衬底或图案(5)的物体表面(7)上形成包括模具,工具,模具,主体或涂层的金属沉积物或涂层,其中在一个或多个预定阶段 在喷洒相对较大的平均尺寸的液滴期间,在一个或多个其它阶段喷雾液滴或相对较小的平均尺寸。

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