中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

113 records (took 0.019 seconds)

    FORMATION OF THIN FILM CAPACITOR
    1.
    发明专利
    FORMATION OF THIN FILM CAPACITOR 失效

    公开(公告)号：JP2000164460A

    公开(公告)日：2000-06-16

    申请号：JP33350099

    申请日：1999-11-24

    Applicant: MICROCOATING TECHNOLOGIES INC

    Inventor： HUNT ANDREW TYE ,  FLANAGAN JOHN SCOTT ,  NEUMAN GEORGE A ,  JII JIUAMU WAN ,  HERUMATO G HORRIS ,  WEN-I RIN ,  MICHEL HENDRICK

    IPC: H01G4/33 ,  B82B1/00 ,  H01G4/08 ,  H05K1/16 ,  H05K3/38 ,  H05K3/46

    Abstract: PROBLEM TO BE SOLVED: To enable a smaller miniaturization of a printed circuit board by method wherein a thin film capacitor is made to comprise a metal wheel and a dielectric layer having a specified thickness on the wheel as a structure for the thin film capacitor. SOLUTION: As a simple layout of a thin layer capacitor, a dielectric layer 404 is formed on a metal wheel 402 or a metal layer 402 and a second metal layer 406 is formed on the surface on the opposite side of the layer 404. A layer, which can function as the layer 404 for a buried capacitor and a registor, is very thin and is uniform, can be deposited by a combustion chemical vapor deposition(CCVD) method. The thickness of the layer 404 deposited for the buried capacitor is typically about 0.03 to about 2 microns, preferably the thickness is about 0.1 to about 1 micron and most preferably the thickness is about 0.2 to about 0.6 micron. As the thinner layer 104 has a higher capacitance, the capability to deposit a very thin film of the CCVD method is the favorable point of the CCVD method.

    LIQUID ATOMIZATION METHODS AND DEVICES
    4.
    发明专利
    LIQUID ATOMIZATION METHODS AND DEVICES 未知

    公开(公告)号：CA2385324C

    公开(公告)日：2008-03-25

    申请号：CA2385324

    申请日：2000-09-21

    Applicant: MICROCOATING TECHNOLOGIES INC

    Inventor： REESE BRIAN T ,  HUNT ANDREW TYE ,  OLJACA MIODRAG ,  NEUMAN GEORGE A

    IPC: B05D1/02 ,  B05B1/24 ,  B05B9/00 ,  B05B17/04 ,  B05D3/00 ,  B05D3/02

    Abstract: The present invention involves controlled atomization of liquids for various applications such as particle/droplet seeding for laser-based measurements of flow velocity, temperature, and concentration; flame and plasma based elemental analysis; nano-powder production; spray drying for generation of small-sized particles; nebulizers in the production of sub-micron size droplets and for atomizing fuel for use in combustion chambers. In these and other atomizer applications the control of droplet and/or particle size is very critical. In some applications extremely small droplets are preferred (less than a micron), while in others, droplet diameters on the scale of several microns are required. The present invention has the flexibility of forming droplets within a particular range of diameters, wherein not only the size of the average droplet can be adjusted, but the range of sizes may be adjusted as well. The atomizer (4) itself is in the form of a heated tube (44) having an inlet end (48) and an outlet end (50). As liquid travels through the tube it is heated and upon exiting the tube and entering a reduced pressure area the liquid atomizes to form very fine droplets. By electrically heating the tube by passing a current therethrough, the heating adjustment can be performed on-the-fly, allowing droplet size adjustment during operation of the atomizer. Several different embodiments of the atomization device are disclosed.

Patent Agency Ranking