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241.发明专利
公开(公告)号：CA1116320A
公开(公告)日：1982-01-12
申请号：CA324216
申请日：1979-03-27
Applicant: VARIAN ASSOCIATES
Inventor： BROWN KARL L
Abstract: In a magnetic deflection system for deflecting a beam of charged particles, through a given beam bending angle at least four beam deflecting stations arc serially arranged along the beam path for bending the beam through the beam bending angle f, Each of the beam bending stations includes a magnet for producing a static magnetic field component of a strength and of a shape so that the beam is deflected free of transverse geometric aberrations of second order. The beam deflection system also includes sextupole magnetic field components of such a strength and location so as to eliminate second order chromatic aberrations of the deflected beam without introducing second order geometric aberrations, whereby a magnetic beam deflection system is provided which is free of both transverse chromatic a geometric aberrations of second order.
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公开(公告)号：CA1091363A
公开(公告)日：1980-12-09
申请号：CA310045
申请日：1978-08-25
Applicant: IBM
Inventor： HICKS WILLIAM W , KELLER JOHN H , KOESTNER JOSEPH H
IPC: G01Q30/10 , H01J37/08 , H01J37/09 , H01J37/317 , H01L21/027 , H01J3/00
Abstract: RADIATION HEATED ACCELERATION In an ion implantation apparatus, a beam defining member such as the acceleration plate is constructed such that the member is maintained at a temperature above the condensation point of the vapor emanating from the source of charged particles, thereby preventing the vapor from condensing on the member and providing a self-cleaning effect.
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公开(公告)号：DE2657129C3
公开(公告)日：1979-11-08
申请号：DE2657129
申请日：1976-12-16
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公开(公告)号：FR2365203B1
公开(公告)日：1979-01-12
申请号：FR7628313
申请日：1976-09-21
Applicant: INST VYSOKIKH TEMPERATUR AKADE
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公开(公告)号：GB1530031A
公开(公告)日：1978-10-25
申请号：GB376276
申请日：1976-01-30
Applicant: TEXAS INSTRUMENTS INC
Abstract: 1530031 Cathode ray tubes; ion beam apparatus TEXAS INSTRUMENTS Inc 30 Jan 1976 [5 Feb 1975] 03762/76 Heading H1D A charged particle beam (e.g. of electrons or positive or negative ions) scanning device comprises a charged particle source 16, an extended area target 14, at least one input buffer plate 19, 20 and at least one output buffer plate 50 sandwiching control plates 25- 30 all with aligned apertures, the control plates each having a plurality of electrodes 25a, 25b- 30a, 30b, on at least one surface, spacers 33 and thicker spacers 35, 35 1 between buffer and control plates to isolate the control plates from the high voltages applied to the buffer plates and to allow the control plates to be operated with low voltage swings, D.C. potentials to the buffer plates providing focusing and selectively applied potentials to the control plate electrodes selectively directing particles to the target. The high voltages applied to the buffer plates also negate charging due to secondary emission. Fig. 4 (not shown) includes a multi-filament cathode adjacent interdigitated electrodes (65), (67) one of which may be segmented to provide an additional scanning control of electron emission from the filaments, as described w.r.t. Figs. 5 to 8 (not shown). An elongated source may alternatively provide negative or positive ions. Component materials, dimensions, voltages and operation are detailed.
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Patent Agency Ranking
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公开(公告)号：DE2241552B2
公开(公告)日：1977-06-23
申请号：DE2241552
申请日：1972-08-24
Abstract: 1429058 Electron beam irradiation apparatus LICENTIA PATENT - VERWALTUNGS GmbH 13 Aug 1973 [24 Aug 1972] 38290/73 Heading H1D Irradiation apparatus comprises a horn having conical inner and outer parts 1, 2 defining a vacuum chamber, electron generator (and accelerator) 10, electric and/or magnetic field deflector 9, and annular electron output window 4 secured mechanically to the horn without auxiliary webs. Parts 1 and 2 may be connected by water cooled webs in vacuum space 3, the webs being narrow transverse to the beam and wide in the beam direction. The window may be secured by rings 5, 6 and flanges 7, 8.
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公开(公告)号：GB1435526A
公开(公告)日：1976-05-12
申请号：GB3414373
申请日：1973-07-18
Applicant: TEKTRONIX INC
Abstract: 1435526 Electron beam focusing and deflecting systems; X-ray tubes TEKTRONIX Inc 18 July 1973 [4 Aug 1972] 34143/73 Heading H1D An electron tube comprises cathode 40, an anode with beam limiting aperture 44, target 50 (e.g. light sensitive or silicon oxide storage), twisted and interleaved deflection electrodes 48 (also Figs. 3, 4 and 5, not shown) for generating a twisted electric field extending perpendicular to the tube axis at an orientation varying continuously and uniformly along the axis to provide two co-ordinate beam deflection, solenoid 25 producing a uniform oxide field proportional to the magnetic dwell angle which angle differs from the angle of twist of the E field by integer multiples of 2# radians, the B and E fields producing a helical motion of the beam so that the beam impinges orthogonally on the target and is scanned thereacross. The plane of deflection of the beam is also prevented from rotating away from the initial E field direction. Fig. 2 also includes grid 41, accelerator 42, barrel 45 providing field free drift space or prefocus lens according to potentials, deflection shield 46, and target mesh 49. Detailed theory is given for deflection and focusing operation for zero shading (i.e. right angle incidence on target), requiring # m =# e t2 n# where # m and # e are the magnetic dwell and electric twist angles. Characteristics are produced in Figs. 7-14 (not shown). Solenoid 25 may extend past the target to reduce fringing fields. Deflection 48 may be produced photographically. Applications include high beam intensity microspot tubes scan converters, monochrome or colour TV projection apparatus, vidicon or image orthicon tubes, X-ray tubes or high power focused beam tubes for electron machining, welding or contour drilling.
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