公开(公告)号：US3182191A

公开(公告)日：1965-05-04

申请号：US25853863

申请日：1963-02-14

Applicant: PURETEST WATER PURIFIER CO

Inventor： MCFARLAND ARTIE F ,  MCFARLAND ARTHUR E

IPC: A23L3/28 ,  A61L2/10 ,  C02F1/32

CPC classification number: C02F1/325 ,  A23L3/28 ,  A61L2/10 ,  C02F2201/3223 ,  C02F2201/324

公开(公告)号：US3061721A

公开(公告)日：1962-10-30

申请号：US329960

申请日：1960-01-19

Applicant: AL BRENNER

Inventor： AL BRENNER

IPC: B08B9/023 ,  C02F1/32

CPC classification number: C02F1/325 ,  C02F2201/324 ,  C02F2201/328 ,  F16L2101/12

公开(公告)号：US12012340B2

公开(公告)日：2024-06-18

申请号：US18325031

申请日：2023-05-29

Applicant: Michael D Bloomberg ,  Daniel Guttman

Inventor： Michael D Bloomberg ,  Daniel Guttman

IPC: C02F1/48 ,  A61L2/10 ,  A61L2/22 ,  A61L2/24 ,  A61L9/14 ,  A61L9/20 ,  A61N5/00 ,  B08B3/12 ,  C02F1/32 ,  C02F1/50 ,  G01N23/00 ,  C02F103/00

CPC classification number: C02F1/325 ,  A61L2/10 ,  A61L2/22 ,  A61L2/24 ,  A61L9/14 ,  A61L9/20 ,  C02F1/50 ,  A61L2202/11 ,  A61L2202/122 ,  A61L2202/14 ,  A61L2202/15 ,  A61L2209/11 ,  A61L2209/12 ,  A61L2209/134 ,  C02F2103/002 ,  C02F2201/3222 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2303/04

Abstract: A disinfection apparatus and method is provided for disinfecting a fluid. The apparatus elements define three internal container volumes. Fluid is introduced into an entry volume where its flow is conditioned to reduce splash and slow the fluid flow. The fluid is then channeled into a disinfection volume where a disinfection unit delivers a disinfection agent to the fluid. Finally, the fluid exits the apparatus through an exit volume. In one aspect, a sink-trap is disclosed in which wastewater liquid contacts a pair of diverters. The diverters have conditioned contact surfaces that slows and spreads the liquid flow and reduces liquid splash. The wastewater then passes through a UV chamber in which it is disinfected. The liquid then exits the sink-trap. Advanced self-cleaning apparatus are additionally disclosed to clean and disinfect the sink-trap and trapped wastewater. The entire apparatus operates under computer control.

公开(公告)号：US11807833B2

公开(公告)日：2023-11-07

申请号：US17177758

申请日：2021-02-17

Applicant: Trojan Technologies Group ULC

Inventor： Michael R. Sasges ,  Anthony Martin John Porter

IPC: B08B9/023 ,  C11D17/04 ,  C11D7/08 ,  C11D11/00 ,  A61L2/26 ,  A61L2/10 ,  C02F1/32 ,  B08B1/00 ,  B08B3/08 ,  C11D7/26

CPC classification number: C11D17/043 ,  A61L2/10 ,  A61L2/26 ,  B08B1/006 ,  B08B3/08 ,  B08B9/023 ,  C02F1/325 ,  C11D7/08 ,  C11D7/266 ,  C11D11/0041 ,  C11D17/049 ,  A61L2202/11 ,  B08B2209/02 ,  C02F2201/324 ,  C02F2303/04

Abstract: An embodiment provides a method for cleaning a surface, including: encapsulating a cleaning composition in a polymer material to form a compound, wherein the polymer material surrounds the cleaning composition; placing the compound in a location adjacent to the surface, wherein the location adjacent to the surface is a volume separated from an outer volume; dissolving the polymer material at a pH above a target value above the polymer material pH dissolution point, wherein the dissolving releases the cleaning composition; and cleaning the surface using the released cleaning composition. Other aspects are described and claimed.

公开(公告)号：US20170096350A1

公开(公告)日：2017-04-06

申请号：US14873693

申请日：2015-10-02

Applicant: ALFAWALL AKTIEBOLAG

Inventor： Johan MARKSTEDT ,  Staffan CAVALLI-BJÖRKMAN ,  Peter SAHLÉN

IPC: C02F1/32 ,  C02F1/00

CPC classification number: C02F1/325 ,  C02F1/008 ,  C02F2103/008 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2209/42 ,  C02F2209/44 ,  C02F2303/04 ,  C02F2303/14

Abstract: A ballast water treatment system includes at least one UV-light reactor with at least one UV-lamp, an inlet line for ballast water to be treated connected to the reactor and an outlet line connected to the reactor. The system includes a cleaning system for periodic cleaning of the reactor, including a water inlet line connected to the reactor for supplying water, a container with concentrated CIP-liquid connected to the reactor, a CIP-liquid inlet line connecting the container to the reactor, a dosage pump arranged in the CIP-liquid inlet line for supplying a predetermined amount of concentrated CIP-liquid to the reactor to mix with the water, a circuit comprising the reactor and a pump arranged in the circuit for circulation of water mixed with the concentrated CIP-liquid.

公开(公告)号：US09321657B2

公开(公告)日：2016-04-26

申请号：US14424380

申请日：2012-09-05

Applicant: Soo-Tae Lee ,  Tae-Sung Pyo ,  Su-Kyu Lee

Inventor： Soo-Tae Lee ,  Tae-Sung Pyo ,  Su-Kyu Lee

IPC: B63J4/00 ,  C02F1/32 ,  C02F1/00 ,  B08B1/00 ,  C02F103/00

CPC classification number: C02F1/325 ,  B08B1/008 ,  B63J4/002 ,  C02F2103/008 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2201/328

Abstract: Disclosed herein is an apparatus having a double wiper structure for sterilizing ballast water. Each wiper for use in removing foreign substances from an ultraviolet lamp has a double structure including a main wiper part and auxiliary wiper parts. The auxiliary wiper parts are disposed on opposite sides of the main wiper part so that when the wiper body is moved forward or backward, the corresponding auxiliary wiper part primarily removes foreign substances before the main wiper part wipes the ultraviolet lamp unit. Each auxiliary wiper part includes an inclined protrusion and a pointed part so that friction between the surface of the ultraviolet lamp and the auxiliary wiper part can be minimized. The main wiper part includes a first blade and a second blade that are respectively disposed on opposite sides of a depression formed in an inner circumferential surface of the main wiper part.

Abstract translation: 本文公开了具有用于对压载水进行消毒的双重擦拭器结构的装置。 用于从紫外灯去除异物的每个刮水器具有包括主擦拭器部分和辅助擦拭器部件的双重结构。 辅助擦拭器部件设置在主擦拭器部件的相对侧上，使得当刮水器主体向前或向后移动时，相应的辅助擦拭器部件在主刮具部件擦拭紫外灯单元之前主要去除异物。 每个辅助擦拭器部分包括倾斜突起和尖锐部分，使得紫外灯的表面与辅助擦拭器部件之间的摩擦力可以最小化。 主擦拭器部分包括分别设置在形成在主刮具部分的内周表面中的凹陷的相对侧上的第一刀片和第二刀片。

公开(公告)号：US20150329380A1

公开(公告)日：2015-11-19

申请号：US14650426

申请日：2013-12-09

Applicant: TROJAN TECHNOLOGIES

Inventor： Chongze Zhu ,  Yonglin Chen

IPC: C02F1/32 ,  B08B1/00

CPC classification number: C02F1/325 ,  B01J19/12 ,  B08B1/008 ,  B08B9/023 ,  C02F2201/3223 ,  C02F2201/3225 ,  C02F2201/324 ,  C02F2303/14

Abstract: There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The cleaning system comprises: a cleaning carriage comprising at least one cleaning element for contact with at least a portion of the exterior of the radiation source assembly; a rodless cylinder comprising an elongate housing having a longitudinal axis; a slidable element disposed on an exterior surface of the elongate housing, the slidable element being: (i) coupled to the cleaning carriage, and (ii) magnetically coupled to a driving element disposed within the elongate housing, the driving element comprising a friction modifying element in contact with an interior surface of the elongate housing to define a first frictional resistance in a rotational direction about the longitudinal axis and a second frictional resistance in an axial direction along the longitudinal axis, the friction modifying element configured such that the first frictional resistance is greater than the second friction resistance; and an elongate motive element coupled to the driving element.

Abstract translation: 公开了一种用于流体处理系统中的辐射源组件的清洁装置。 清洁系统包括：清洁托架，其包括用于与辐射源组件的外部的至少一部分接触的至少一个清洁元件; 无杆气缸，包括具有纵向轴线的细长壳体; 可滑动元件，其设置在所述细长壳体的外表面上，所述可滑动元件：（i）联接到所述清洁托架，以及（ii）磁耦合到设置在所述细长壳体内的驱动元件，所述驱动元件包括摩擦修正 元件，其与所述细长壳体的内表面接触以限定围绕所述纵向轴线的旋转方向上的第一摩擦阻力，以及沿着所述纵向轴线沿轴向方向的第二摩擦阻力，所述摩擦修改元件构造成使得所述第一摩擦阻力 大于第二摩擦阻力; 以及耦合到驱动元件的细长动力元件。

公开(公告)号：US20150239751A1

公开(公告)日：2015-08-27

申请号：US14424380

申请日：2012-09-05

Applicant: Soo-Tae Lee ,  Tae-Sung Pyo ,  Su-Kyu Lee

Inventor： Soo-Tae Lee ,  Tae-Sung Pyo ,  Su-Kyu Lee

IPC: C02F1/32

CPC classification number: C02F1/325 ,  B08B1/008 ,  B63J4/002 ,  C02F2103/008 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/324 ,  C02F2201/326 ,  C02F2201/328

Abstract: Disclosed herein is an apparatus having a double wiper structure for sterilizing ballast water. Each wiper for use in removing foreign substances from an ultraviolet lamp has a double structure including a main wiper part and auxiliary wiper parts. The auxiliary wiper parts are disposed on opposite sides of the main wiper part so that when the wiper body is moved forward or backward, the corresponding auxiliary wiper part primarily removes foreign substances before the main wiper part wipes the ultraviolet lamp unit. Each auxiliary wiper part includes an inclined protrusion and a pointed part so that friction between the surface of the ultraviolet lamp and the auxiliary wiper part can be minimized. The main wiper part includes a first blade and a second blade that are respectively disposed on opposite sides of a depression formed in an inner circumferential surface of the main wiper part.

Abstract translation: 本文公开了具有用于对压载水进行消毒的双重擦拭器结构的装置。 用于从紫外灯去除异物的每个刮水器具有包括主擦拭器部分和辅助擦拭器部件的双重结构。 辅助擦拭器部件设置在主擦拭器部件的相对侧上，使得当刮水器主体向前或向后移动时，相应的辅助擦拭器部件在主刮具部件擦拭紫外灯单元之前主要去除异物。 每个辅助擦拭器部分包括倾斜突起和尖锐部分，使得紫外灯的表面与辅助擦拭器部件之间的摩擦力可以最小化。 主擦拭器部分包括分别设置在形成在主刮具部分的内周表面中的凹陷的相对侧上的第一刀片和第二刀片。

公开(公告)号：US20150090660A1

公开(公告)日：2015-04-02

申请号：US14503306

申请日：2014-09-30

Applicant: University of Alaska Anchorage

Inventor： Aaron Dotson

IPC: C02F1/32 ,  C02F1/44 ,  B01D69/04 ,  B01D71/04 ,  B01D61/14 ,  B01D65/02

CPC classification number: C02F1/444 ,  B01D65/02 ,  B01D65/08 ,  B01D71/02 ,  B01D2311/2619 ,  B01D2321/30 ,  B01D2321/343 ,  C02F1/325 ,  C02F1/442 ,  C02F2101/30 ,  C02F2201/003 ,  C02F2201/3223 ,  C02F2201/324 ,  C02F2303/20 ,  C02F2305/10 ,  Y10T29/49826

Abstract: In one aspect, the invention relates to a filtration apparatus comprising a tubular inorganic porous membrane and a light source disposed within the lumen of the membrane for use in, for example, enhancing oxidation of organic molecules and enhancing foulant removal. In one aspect, the invention relates to a filtration apparatus comprising a tubular porous membrane and a displacement body disposed within the lumen of the membrane. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.

Abstract translation: 一方面，本发明涉及一种过滤装置，其包括管状无机多孔膜和设置在膜的内腔内的光源，用于例如增强有机分子的氧化和增强除垢。 一方面，本发明涉及一种过滤装置，其包括管状多孔膜和设置在膜的内腔内的置换体。 该摘要旨在作为用于在特定技术中进行搜索的扫描工具，而不意在限制本发明。

公开(公告)号：US20140360947A1

公开(公告)日：2014-12-11

申请号：US14458692

申请日：2014-08-13

Applicant: TROJAN TECHNOLOGIES INC.

Inventor： WES FROM ,  BOYKO M. TCHAVDAROV ,  MIKE MARCU ,  RICHARD GRATTON ,  DAVID OLSON ,  JIM FRASER ,  DUSKO A. KEZELE

IPC: C02F1/32

CPC classification number: C02F1/325 ,  A61L2/10 ,  C02F1/006 ,  C02F1/32 ,  C02F2201/3225 ,  C02F2201/3227 ,  C02F2201/3228 ,  C02F2201/324 ,  C02F2201/328

Abstract: A fluid treatment system having an inlet, an outlet, and a fluid treatment zone therebetween. The zone has an array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis disposed at an oblique angle with respect to a direction of fluid flow. Each row has a plurality of radiation source assemblies in spaced relation in a direction transverse to the direction of fluid flow, to define a gap through which fluid may flow between an adjacent pair of assemblies. Preferably, all rows in the array are staggered with respect to one another in a direction orthogonal to the direction of fluid flow, such that the gap between an adjacent pair of radiation source assemblies in an upstream row of assemblies is partially or completely obstructed in the direction of fluid flow by a serially disposed radiation source assembly in at least one downstream row.

Abstract translation: 一种在其间具有入口，出口和流体处理区域的流体处理系统。 该区域具有排列的辐射源组件。 每个辐射源组件具有相对于流体流动方向以倾斜角度设置的纵向轴线。 每排具有在横向于流体流动方向的方向上间隔开的多个辐射源组件，以限定一个间隙，流体可以通过该间隙在相邻的一对组件之间流动。 优选地，阵列中的所有行在与流体流动方向正交的方向上彼此交错，使得上游排组件中相邻的一对辐射源组件之间的间隙在 在至少一个下游排中通过串联设置的辐射源组件的流体流动方向。