LAMP SENSOR MODULATION OF A POWER SUPPLY
    1.
    发明申请

    公开(公告)号:WO2020148597A1

    公开(公告)日:2020-07-23

    申请号:PCT/IB2020/000066

    申请日:2020-01-17

    Abstract: A system, method, and assembly for controlling a power supply for at least one ultraviolet lamp where at least one ultraviolet lamp uses input received from at least one sensor of at least one ultraviolet lamp to measure a characteristic of the at least one ultraviolet lamp and, if based on that at least one sensor, the at least one ultraviolet lamp determines that at least one characteristic of a power supply operatively coupled to the at least one ultraviolet lamp should be changed, generates a command for that power supply to modify that at least one characteristic either by modulating its output or adjusting an output level.

    FLUID TREATMENT SYSTEM
    2.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号:WO2017008156A1

    公开(公告)日:2017-01-19

    申请号:PCT/CA2016/050815

    申请日:2016-07-12

    CPC classification number: C02F1/325 C02F2201/004 C02F2201/3223

    Abstract: There is described, a fluid treatment system comprising: a fluid treatment chamber comprising a fluid inlet, a fluid outlet and a fluid treatment zone; an elongate radiation source assembly comprising an elongate radiation source configured to be disposed in the fluid treatment zone; and a lamp socket element secured to a proximal portion of the fluid treatment chamber, the lamp socket element configured to be disengaged from the elongate radiation source assembly only when the fluid treatment chamber is fluid non-pressurized.

    Abstract translation: 描述了一种流体处理系统,包括:流体处理室,其包括流体入口,流体出口和流体处理区; 细长辐射源组件,包括构造成设置在流体处理区域中的细长辐射源; 以及固定到所述流体处理室的近端部分的灯插座元件,所述灯插座元件被配置为仅当所述流体处理室是流体未加压时与所述细长辐射源组件脱离接合。

    CLEANING APPARATUS
    3.
    发明申请
    CLEANING APPARATUS 审中-公开
    清洁装置

    公开(公告)号:WO2014085912A1

    公开(公告)日:2014-06-12

    申请号:PCT/CA2013/001011

    申请日:2013-12-09

    Abstract: There is disclosed a cleaning apparatus for a radiation source assembly in a fluid treatment system. The cleaning system comprises: a cleaning carriage comprising at least one cleaning element for contact with at least a portion of the exterior of the radiation source assembly; a rodless cylinder comprising an elongate housing having a longitudinal axis; a slidable element disposed on an exterior surface of the elongate housing, the slidable element being: (i) coupled to the cleaning carriage, and (ii) magnetically coupled to a driving element disposed within the elongate housing, the driving element comprising a friction modifying element in contact with an interior surface of the elongate housing to define a first frictional resistance in a rotational direction about the longitudinal axis and a second frictional resistance in an axial direction along the longitudinal axis, the friction modifying element configured such that the first frictional resistance is greater than the second friction resistance; and an elongate motive element coupled to the driving element.

    Abstract translation: 公开了一种用于流体处理系统中的辐射源组件的清洁装置。 清洁系统包括:清洁托架,其包括用于与辐射源组件的外部的至少一部分接触的至少一个清洁元件; 无杆气缸,包括具有纵向轴线的细长壳体; 可滑动元件,其设置在所述细长壳体的外表面上,所述可滑动元件为:(i)联接到所述清洁托架,以及(ii)磁耦合到设置在所述细长壳体内的驱动元件,所述驱动元件包括摩擦修正 元件,其与所述细长壳体的内表面接触以限定围绕所述纵向轴线的旋转方向上的第一摩擦阻力,以及沿着所述纵向轴线沿轴向方向的第二摩擦阻力,所述摩擦修改元件构造成使得所述第一摩擦阻力 大于第二摩擦阻力; 以及耦合到驱动元件的细长动力元件。

    RADIATION SOURCE CARTRIDGE AND MODULE CONTAINING SAME
    4.
    发明申请
    RADIATION SOURCE CARTRIDGE AND MODULE CONTAINING SAME 审中-公开
    辐射源盒和包含它的模块

    公开(公告)号:WO2010069072A1

    公开(公告)日:2010-06-24

    申请号:PCT/CA2009/001856

    申请日:2009-12-16

    Abstract: There is disclosed an elongate radiation source cartridge. The cartridge comprises: (i) an elongate radiation source assembly having a proximal portion and distal portion, the distal portion of the elongate radiation source assembly being unsupported, (ii) a housing coupled to the proximal portion of the elongate radiation source assembly, and (iii) a power supply disposed within the housing, the power supply in electrical communication with the elongate radiation source assembly (in certain embodiments the power supply is optional). The elongate radiation source assembly and the housing are in substantial alignment with respect to a longitudinal axis of the elongate radiation source cartridge.

    Abstract translation: 公开了一种细长的辐射源盒。 盒包括:(i)具有近端部分和远端部分的细长辐射源组件,细长辐射源组件的远端部分未被支撑,(ii)耦合到细长辐射源组件的近侧部分的壳体,以及 (iii)设置在壳体内的电源,与细长辐射源组件电连通的电源(在某些实施例中,电源是可选的)。 细长辐射源组件和壳体相对于细长辐射源盒的纵向轴线基本对准。

    CHEMICAL INJECTION SYSTEM
    5.
    发明申请
    CHEMICAL INJECTION SYSTEM 审中-公开
    化学注射系统

    公开(公告)号:WO2009065220A1

    公开(公告)日:2009-05-28

    申请号:PCT/CA2008/002041

    申请日:2008-11-24

    Abstract: There is described a chemical injection system. Preferably, the system comprises a number of tubular members. The distal end of each tubular member is configured to be immersed in a flow of fluid and the proximal end of each tubular member is connected to a chemical supply. The system further includes a guide member for receiving at least one tubular member. The guide member is configured to orient the at least one tubular in a predetermined region of the flow of fluid. The chemical injection system may be regarded as a trailing array of flexible injection lines. By balancing the flexibility, length, weight, diameter, buoyancy, hydrodynamic characteristics and/or the angle at which each flexible injection line is positioned relative the flow of fluid, it is possible to dispose the distal end of each flexible injection line in a pre-determined region in the flow of fluid.

    Abstract translation: 描述了一种化学注射系统。 优选地,该系统包括多个管状构件。 每个管状构件的远端构造成浸入流体流中,并且每个管状构件的近端连接到化学物质供应。 该系统还包括用于容纳至少一个管状构件的引导构件。 引导构件被配置成将至少一个管状物定向在流体流的预定区域中。 化学注射系统可以被认为是柔性注射管线的拖尾阵列。 通过平衡柔性,长度,重量,直径,浮力,流体动力学特性和/或每个柔性注射管线相对于流体流定位的角度,可以将每个柔性注射管线的远端设置在预先 流体中的确定区域。

    ULTRAVIOLET RADIATION LIGHT EMITTING DIODE DEVICE
    6.
    发明申请
    ULTRAVIOLET RADIATION LIGHT EMITTING DIODE DEVICE 审中-公开
    超紫外线辐射发光二极管器件

    公开(公告)号:WO2008144922A1

    公开(公告)日:2008-12-04

    申请号:PCT/CA2008/001036

    申请日:2008-06-02

    CPC classification number: A61L2/10 A23C3/076 H01L33/405 H01L2224/14

    Abstract: There is disclosed an ultraviolet radiation device. The device comprises a base portion, a plurality of semiconductor structures connected to the base portion and an ultraviolet radiation transparent element connected to the plurality of semiconductor structures. Preferably: (i) the at least one light emitting diode is in direct contact with the ultraviolet radiation transparent element, or (ii) there is a spacing between the at least one light emitting diode and the ultraviolet radiation transparent element, the spacing being substantially completely free of air. There is also disclosed a fluid treatment system incorporating the ultraviolet radiation device.

    Abstract translation: 公开了一种紫外线照射装置。 该装置包括基部,连接到基部的多个半导体结构以及连接到多个半导体结构的紫外线透射元件。 优选地:(i)至少一个发光二极管与紫外线辐射透明元件直接接触,或者(ii)至少一个发光二极管和紫外线辐射透明元件之间存在间隔,该间隔基本上 完全没有空气。 还公开了结合有紫外线辐射装置的流体处理系统。

    FLUID TREATMENT SYSTEM
    7.
    发明申请
    FLUID TREATMENT SYSTEM 审中-公开
    流体处理系统

    公开(公告)号:WO2007071042A1

    公开(公告)日:2007-06-28

    申请号:PCT/CA2006/002084

    申请日:2006-12-21

    CPC classification number: A61L2/10 C02F1/325 C02F2201/004 C02F2303/14

    Abstract: There is described a fluid treatment system which may which may be used with radiation sources that do not require a protective sleeve - e.g., excimer radiation sources. An advantage of the present fluid system treatment is that the radiation sources may be removed from the fluid treatment zone without necessarily having to shut down the fluid treatment system, remove the fluid, break the seals which retain fluid tightness, replace/service radiation source and than reverse the steps. Instead, the present fluid treatment system allows for service/replacement of the radiation sources in the fluid treatment zone during operation of the fluid treatment system.

    Abstract translation: 描述了可以与不需要保护套筒(例如准分子辐射源)的辐射源一起使用的流体处理系统。 本流体系统处理的优点是可以从流体处理区域去除辐射源,而不必关闭流体处理系统,去除流体,破坏保持流体密封性的密封件,更换/使用辐射源和 反转步骤。 相反,本流体处理系统允许在流体处理系统的操作期间对流体处理区域中的辐射源进行维修/更换。

    RADIATION SENSOR DEVICE AND RADIATION SOURCE MODULE CONTAINING SAME
    10.
    发明申请
    RADIATION SENSOR DEVICE AND RADIATION SOURCE MODULE CONTAINING SAME 审中-公开
    辐射传感器装置和包含它的辐射源模块

    公开(公告)号:WO2005031288A1

    公开(公告)日:2005-04-07

    申请号:PCT/CA2004/001701

    申请日:2004-09-29

    Abstract: A radiation sensor device comprising a body portion having an entrance through which radiation may enter the body portion, a radiation detector and an optical filter interposed between the entrance and the radiation detector. The radiation detector is capable of detecting radiation having at least one wavelength in the range of from about 125 nm to about 1100 nm, and comprises: (i) a silicon-containing material comprising an n-doped layer disposed on a pair of p-doped layers, and (ii) a passivation layer disposed on a radiation impingement surface of the silicon­containing material, the passivation layer comprising nitrided silicon dioxide, a metal silicide and mixtures thereof. The optical filter has: (i) an optical transmittance of at least about 40% at a wavelength in the range of from about 175 nm to about 300 nm, and (ii) an optical transmittance of no greater than about 5% at a wavelength greater than about 350 nm.

    Abstract translation: 一种辐射传感器装置,包括具有入射部分的主体部分,辐射可以通过该入口进入主体部分,放射线检测器和插入在入射口和辐射检测器之间的光学滤光器。 辐射检测器能够检测具有在约125nm至约1100nm范围内的至少一个波长的辐射,并且包括:(i)含硅材料,其包含设置在一对p- 掺杂层,以及(ii)设置在所述含硅材料的辐射冲击表面上的钝化层,所述钝化层包括氮化二氧化硅,金属硅化物及其混合物。 光学滤波器具有:(i)在约175nm至约300nm范围内的波长处的至少约40%的光透射率,以及(ii)波长处的光透射率不大于约5% 大于约350nm。

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