公开(公告)号：EP2159567A1

公开(公告)日：2010-03-03

申请号：EP09179076.6

申请日：2004-09-10

Applicant: WALLAC OY

Inventor： Kivelä, Petri

IPC: G01N21/25 ,  G01N21/64 ,  G01N21/76 ,  G01N21/13

CPC classification number: G01N21/253 ,  G01N21/13 ,  G01N21/6428 ,  G01N21/6452 ,  G01N21/76 ,  G01N2021/6421 ,  G01N2021/6441 ,  G01N2021/6471 ,  G01N2021/6482 ,  G01N2021/6484 ,  G01N2201/0446 ,  G01N2201/0453 ,  G01N2201/0826 ,  G01N2201/103

Abstract: The present invention relates generally to the field of biochemical laboratory instrumentation for different applications of measuring properties of samples on e.g. microtitration plates and corresponding sample supports. The object of the invention is achieved by providing an optical measurement instrumentation wherein a sample (281-285) is activated (212AS, 218AS) and the emission is detected (291, 292), wherein between the activation and detection phases of measuring the sample, a shift is made in the relative position between the sample and means (218) directing the activation radiation to the sample as well as in the relative position between the sample and the means (293) receiving the emission radiation from the sample. This can be implemented e.g. by moving (299) the sample assay plate and/or a measuring head between the activation and emission phases of a sample. The invention allows a simultaneous activation of a first sample and detecting emission from a second sample thus enhancing efficiency of the measurement.

Abstract translation: 本发明涉及基因集会生化实验室仪器的领域有关E.G.测量样品的性质的不同的应用程序 微量滴定板和相应的样品载体。 本发明的目的是通过提供对光学测量仪器worin的样品（281-285）被激活（212AS，218AS）取得并且在检测到发射（291，292），测量样品的活化和检测阶段之间worin ，之后，移动在样本的装置（218）之间的相对位置由引导所述激活辐射到样品，以及在样品和接收来自样品的发射辐射的装置（293）之间的相对位置。 例如，这可以被实现 通过移动（299）的样品测定板和/或样品的活化和发射相之间的测量头。 本发明允许一个第一样本的同时激活和检测发射从从而提高了测量的效率的第二样品。

公开(公告)号：EP1554552A4

公开(公告)日：2009-11-11

申请号：EP03776262

申请日：2003-10-08

Applicant: HINDS INSTRUMENTS INC

Inventor： KAPLAN ANDREW D ,  MANSFIELD JAMES C ,  MARK DOUGLAS C

IPC: G01J4/00 ,  G01N21/01 ,  G01N21/23 ,  G01N21/95

CPC classification number: G01N21/23 ,  G01N2021/9513 ,  G01N2201/101 ,  G01N2201/103

公开(公告)号：EP1553406A1

公开(公告)日：2005-07-13

申请号：EP04028745.0

申请日：2004-12-03

Applicant: Candela Instruments

Inventor： Meeks, Steven W.

IPC: G01N21/95 ,  G01N21/47 ,  H01L21/66

CPC classification number: G01N21/9506 ,  G01B11/0616 ,  G01B11/0641 ,  G01B11/065 ,  G01B11/303 ,  G01B11/306 ,  G01N21/21 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/958 ,  G01N2021/8427 ,  G01N2021/8841 ,  G01N2201/103 ,  G01N2201/104 ,  G01N2201/1045 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A double-sided optical inspection system is presented which may detect and classify particles, pits and scratches on thin film disks or wafers in a single scan of the surface. In one embodiment, the invention uses a pair of orthogonally oriented laser beams, one in the radial and one in the circumferential direction on both surfaces of the wafer or thin film disk. The scattered light from radial and circumferential beams is separated via their polarization or by the use of a dichroic mirror together with two different laser wavelengths.

Abstract translation: 提出了一种双面光学检测系统，其可以在表面的单次扫描中检测和分类薄膜盘或晶片上的颗粒，凹坑和划痕。 在一个实施例中，本发明使用一对正交取向的激光束，一个在径向上，一个在圆周方向上在晶片或薄膜盘的两个表面上。 来自径向和周向光束的散射光通过它们的偏振分离，或者通过使用二向色镜与两种不同的激光波长分离。

公开(公告)号：EP0679325A1

公开(公告)日：1995-11-02

申请号：EP94905056.0

申请日：1994-01-13

Applicant: SCHUTZE, Raimund

Inventor： SCHUTZE, Raimund

IPC: G01N33 ,  C12M1 ,  G01N1 ,  G01N15 ,  G01N21 ,  G02B21 ,  H05H3

CPC classification number: G01N15/0205 ,  C12M41/46 ,  G01N2201/103 ,  G01N2201/1087

Abstract: The description relates to a device for handling, treating and observing small particles, especially biological particles. A first laser (4) generates light beams in a first wavelength range which are focussed by a first optical device (12, 13; 14, 15) and form an optical trap. A slide (22) holds corresponding particles. There is also a light source (17) for observation purposes and observation and recording devices for observing the particles and recording their behaviour. A second laser (3) generates light beams in a second wavelength range which are focussed so that particles on the slide may be treated. The optical devices for the light beams can be positioned and adjusted independently of each other and thus the light beams can be focussed in the same object plane of the slide at the start of treatment and observation independently of their wavelengths.

公开(公告)号：EP0458199B1

公开(公告)日：1995-08-23

申请号：EP91107982.0

申请日：1991-05-16

Applicant: NTN CORPORATION

Inventor： Saruta, Masahiro ,  Sagisaka, Tetsuji ,  Maeda, Kazunari ,  Yashiki, Takumi

IPC: G01N21/88 ,  B23K26/00 ,  G02F1/13

CPC classification number: G05B19/401 ,  B23K26/0853 ,  G01N21/88 ,  G01N2021/9513 ,  G01N2201/103 ,  G02F1/1309 ,  G05B2219/45165 ,  G05B2219/50064

公开(公告)号：EP0405806B1

公开(公告)日：1994-05-04

申请号：EP90306558.9

申请日：1990-06-15

Applicant: JAGUAR CARS LIMITED

Inventor： Maguire, Sean Patrick Joseph ,  Sivayoganathan, Kandiah ,  Balendran, Velupillai

IPC: G01N21/88 ,  G01B11/30

CPC classification number: G01N21/8806 ,  G01N21/9515 ,  G01N2021/4726 ,  G01N2021/556 ,  G01N2201/103

公开(公告)号：EP0458199A3

公开(公告)日：1992-09-16

申请号：EP91107982.0

申请日：1991-05-16

Applicant: NTN CORPORATION

Inventor： Saruta, Masahiro ,  Sagisaka, Tetsuji ,  Maeda, Kazunari ,  Yashiki, Takumi

IPC: G01N21/88 ,  B23K26/00 ,  G02F1/13

CPC classification number: G05B19/401 ,  B23K26/0853 ,  G01N21/88 ,  G01N2021/9513 ,  G01N2201/103 ,  G02F1/1309 ,  G05B2219/45165 ,  G05B2219/50064

Abstract: A laser processing device includes a Z stage (4) movable in the up and down directions with respect to a XY stage (3) movable in the X, Y directions on which an object to be processed is provided. The surface of the object to be processed is image-sensed by a CCD camera (7) through a lens of an electrically-driven revolver (5) attached to the Z stage, which is projected in a monitor (40). When a defect of the object is displayed in the monitor (40), a laser beam is radiated to a defective portion of the object from a laser head (9) provided in the Z stage and the defective portion is removed.

公开(公告)号：EP0230285B1

公开(公告)日：1991-12-27

申请号：EP87100518.7

申请日：1987-01-16

Applicant: Kabushiki Kaisha Toyoda Jidoshokki Seisakusho ,  Hattori, Shuzo

Inventor： Yoshida, Akihiro KK Toyoda Jidoshokki Seisakusho ,  Iida, Takahide KK Toyoda Jidoshokki Seisakusho ,  Miyake, Hiroshi KK Toyoda Jidoshokki Seisakusho ,  Hattori, Shuzo

IPC: G01N21/88 ,  H01L21/66 ,  G06F15/70 ,  G01N23/04

CPC classification number: G01N21/95607 ,  G01N2201/103

公开(公告)号：EP0398781A3

公开(公告)日：1991-07-31

申请号：EP90401210.1

申请日：1990-05-04

Applicant: EASTMAN KODAK COMPANY

Inventor： Moran, Kevin E.

IPC: G01N21/88 ,  H01L21/00 ,  G02B21/06

CPC classification number: H01L21/67288 ,  G01N21/31 ,  G01N21/88 ,  G01N21/9501 ,  G01N2021/8887 ,  G01N2021/9513 ,  G01N2201/103 ,  H01L22/12

Abstract: The invention relates to an inspection system for inspecting the surfaces of wafers, LCD's and film substrates for flaws. The system includes a scanning laser inspection system (50) for quickly inspecting the surface and identifying and locating the flaws. The system generates and displays a flaw map graphically illustrating the article surface and the respective locations of the flaws for subsequent optical inspection. The operator selects a flaw and an optical inspection system (60) is positioned over the selected flaw to provide a magnified image of the flaw. The operator may optically inspect all or any number of the flaws. The invention also includes means (72) for spectrometrically analyzing the reflected light to further identify the flaw.

Abstract translation: 本发明涉及一种用于检查晶片，液晶显示器和薄膜基板表面的缺陷的检查系统。 该系统包括用于快速检查表面并识别和定位缺陷的扫描激光检查系统（50）。 系统生成并显示图形化的缺陷图，用于说明物品表面和用于后续光学检查的缺陷的相应位置。 操作员选择缺陷，并且光学检查系统（60）位于所选择的缺陷上方以提供缺陷的放大图像。 操作员可以光学地检查全部或任何数量的缺陷。 本发明还包括用于光谱分析反射光以进一步识别缺陷的装置（72）。

公开(公告)号：EP0353504A3

公开(公告)日：1991-04-03

申请号：EP89112714.4

申请日：1989-07-12

Applicant: MITSUBISHI JUKOGYO KABUSHIKI KAISHA

Inventor： Mishimura, Nobuhiko Nagasaki Technical Institute ,  Masuyama, Fujimitsu Nagasaki Technical Institute ,  Kaneko, Akira Nagasaki Technical Institute

IPC: G01N21/88 ,  G02B21/00

CPC classification number: G02B21/002 ,  G01N15/1475 ,  G01N2021/8887 ,  G01N2201/103

Abstract: An automatic structure analyzing/processing apparatus for surface structure of material includes a structure observing device (7) for observing structure of a surface of material to produce an electrical image signal thereof, a sample stage (4) disposed opposite to the observing means, an image processing device (8) for converting the image signal from the structure observing device to digital signal and expanding or contracting a desired image reproduced from a memory means or combining a plurality of images reproduced from the memory means to produce an image signal, the memory device storing the digital signal processed by the image processing device, and a display device (9) for displaying the image signal produced from the image processing device as an image, whereby the structure of the surface of material is stored in the memory as the image and examination of the structure can be made readily in a short time.