公开(公告)号：US08382301B2

公开(公告)日：2013-02-26

申请号：US12403233

申请日：2009-03-12

Applicant: Dirk Heinrich Ehm ,  Stephan Muellender ,  Thomas Stein ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Dieter Kraus ,  Richard Versluis ,  Marcus Gerhardus Hendrikus Meijerink

Inventor： Dirk Heinrich Ehm ,  Stephan Muellender ,  Thomas Stein ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn ,  Dieter Kraus ,  Richard Versluis ,  Marcus Gerhardus Hendrikus Meijerink

IPC: G02B5/08 ,  H01S3/22

CPC classification number: G03B27/16 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70883 ,  G03F7/70916 ,  G21K2201/061

Abstract: An optical arrangement, e.g. a projection exposure apparatus (1) for EUV lithography, includes: a housing (2) enclosing an interior space (15); at least one, preferably reflective optical element (4-10, 12, 14.1-14.6) arranged in the housing (2); at least one vacuum generating unit (3) for the interior space (15) of the housing (2); and at least one vacuum housing (18, 18.1-18.10) arranged in the interior space (15) and enclosing at least the optical surface (17, 17.1, 17.2) of the optical element (4-10, 12, 14.1-14.5). A contamination reduction unit is associated with the vacuum housing (18.1-18.10) and reduces the partial pressure of contaminating substances, in particular of water and/or hydrocarbons, at least in close proximity to the optical surface (17, 17.1, 17.2) in relation to the partial pressure of the contaminating substances in the interior space (15).

公开(公告)号：US20130022171A1

公开(公告)日：2013-01-24

申请号：US13637391

申请日：2010-07-30

Applicant: Kyong Woo Kim ,  Jae Hee Kim ,  Young Man Kwon ,  Cheol Woo Ryu

Inventor： Kyong Woo Kim ,  Jae Hee Kim ,  Young Man Kwon ,  Cheol Woo Ryu

IPC: G01N23/04

CPC classification number: A61B6/06 ,  A61B6/4035 ,  A61B6/4064 ,  A61B6/542 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/067

Abstract: The present disclosure relates to an apparatus for alignment of multilayer film mirrors for a monochromatic X-ray generator and an X-ray image detecting method using the same. The apparatus for alignment of multilayer film mirrors for a monochromatic X-ray generator includes a collimator disposed between an X-ray generating unit and a detector and aligning them and limiting the radiation direction of X-ray to provide an optimum incident angle to multilayer film mirrors generating the monochromatic X-ray from the X-ray.

Abstract translation: 本公开涉及用于单色X射线发生器的多层膜反射镜的对准装置和使用其的X射线图像检测方法。 用于单色X射线发生器的多层膜反射镜对准装置包括设置在X射线产生单元和检测器之间的准直器并对准它们并限制X射线的辐射方向以向多层膜提供最佳入射角 从X射线产生单色X射线的镜子。

公开(公告)号：US20120328082A1

公开(公告)日：2012-12-27

申请号：US13582578

申请日：2010-06-01

Applicant: Wataru Kubo ,  Kohei Okamoto ,  Atsushi Komoto ,  Hirokatsu Miyata

Inventor： Wataru Kubo ,  Kohei Okamoto ,  Atsushi Komoto ,  Hirokatsu Miyata

IPC: G21K1/06 ,  B05D5/00

CPC classification number: G21K1/062 ,  B05D5/00 ,  G21K1/06 ,  G21K2201/061 ,  H01J2235/168

Abstract: Provided is an X-ray mirror, a method of producing the X-rat mirror, and an X-ray apparatus. The X-ray mirror comprises: a substrate; and an X-ray reflecting structure formed of multiple regions present on the substrate, in which the X-ray reflecting structure comprises a mesostructured film that has the multiple regions having different structural periods in a normal direction of the substrate. Thus, there can be reduced the absorption loss of an X-ray of the mirror that reflects X-rays having different energies.

Abstract translation: 本发明提供一种X射线镜，X射线镜的制造方法以及X射线装置。 X射线镜包括：基片; 以及由存在于基板上的多个区域形成的X射线反射结构，其中，X射线反射结构包括具有在基板的法线方向上具有不同结构周期的多个区域的介孔结构膜。 因此，可以减少反射具有不同能量的X射线的反射镜的X射线的吸收损失。

公开(公告)号：US20120320354A1

公开(公告)日：2012-12-20

申请号：US13438337

申请日：2012-04-03

Applicant: Andrei Mikhailovich YAKUNIN

Inventor： Andrei Mikhailovich YAKUNIN

IPC: G03B27/70 ,  G02B1/10 ,  B05D5/06 ,  G02B5/08

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03C17/3642 ,  C03C17/3663 ,  G02B5/0891 ,  G21K1/062 ,  G21K2201/061

Abstract: A multilayer mirror constructed to reflect radiation having a wavelength in the range of 6.4 nm to 7.2 nm. The multilayer mirror has alternating layers, including a first layer and a second layer. The first and second layers are selected from the group consisting of: U, or a compound or nitride thereof, and B4C layers; Th, or a compound or nitride thereof, and B4C layers; La, or a compound or nitride thereof, and B9C layers; La, or a compound or nitride thereof, and B4C layers; U, or a compound or nitride thereof, and B9C layers; Th, or a compound or nitride thereof, and B9C layers; La, or a compound or nitride thereof, and B layers; U, or a compound or nitride thereof, and B layers; C, or a compound or nitride thereof, and B layers; Th, or a compound or nitride thereof, and B layers.

Abstract translation: 构造成反射波长在6.4nm至7.2nm范围内的辐射的多层反射镜。 多层反射镜具有交替层，包括第一层和第二层。 第一层和第二层选自：U或其化合物或氮化物和B4C层; Th或其化合物或氮化物，以及B4C层; La或其化合物或氮化物和B9C层; La或其化合物或氮化物，以及B4C层; U或其化合物或氮化物，以及B9C层; Th或其化合物或氮化物和B9C层; La或其化合物或氮化物，以及B层; U或其化合物或氮化物，和B层; C或其化合物或氮化物，和B层; Th或其化合物或氮化物，以及B层。

公开(公告)号：US08335039B2

公开(公告)日：2012-12-18

申请号：US13238748

申请日：2011-09-21

Applicant: Dong-gun Lee ,  Seong-sue Kim

Inventor： Dong-gun Lee ,  Seong-sue Kim

IPC: G02B27/44 ,  G03F7/20 ,  G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/84 ,  G21K2201/061

Abstract: An apparatus for measuring an image of a pattern to be formed on a semiconductor by scanning the pattern using a scanner, the apparatus including an EUV mask including the pattern, a zoneplate lens on a first side of the EUV mask and adapted to focus EUV light on a portion of the EUV mask at a same angle as an angle at which the scanner will be disposed with respect to a normal line of the EUV mask, and a detector arranged on another side of the EUV mask and adapted to sense energy of the EUV light from the EUV mask, wherein NAzoneplate=NAscanner/n and NAdetector=NAscanner/n*σ, where NAzoneplate denotes a NA of the zoneplate lens, NAdetector denotes a NA of the detector, and NAscanner denotes a NA of the scanner, σ denotes an off-axis degree of the scanner, and n denotes a reduction magnification of the scanner.

Abstract translation: 一种用于通过使用扫描仪扫描图案来测量要在半导体上形成的图案的图像的装置，该装置包括包含图案的EUV掩模，在EUV掩模的第一侧上的偏光透镜，并且适于聚焦EUV光 在EUV掩模的一部分上以与扫描仪将相对于EUV掩模的法线配置的角度相同的角度，以及检测器，布置在EUV掩模的另一侧上，并且适于感测 来自EUV掩模的EUV光，其中NAzoneplate = NAscanner / n和NAdetector = NAscanner / n *＆sgr，其中NAzoneplate表示该区域透镜的NA，NAdetector表示检测器的NA，NAscanner表示扫描仪的NA， ＆sgr 表示扫描仪的离轴度，n表示扫描仪的缩小倍率。

公开(公告)号：US20120248345A1

公开(公告)日：2012-10-04

申请号：US13491705

申请日：2012-06-08

Applicant: Boris Verman

Inventor： Boris Verman

IPC: G21K1/00 ,  B82Y99/00

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/067 ,  G21K2201/061

Abstract: A nanotube based device for guiding a beam of x-rays, photons, or neutrons, includes a beam source and at least one nanotube. Each nanotube has an optical entrance positioned in a manner that a projection of the direction of the central axis at the optical entrance intersects with the beam source. Each nanotube may have an interior diameter that varies along the length of the nanotube. to point the entrances of a bundle of nanotubes toward a point-shaped beam source, the bundle can be grown as an array of multilayer nanotubes from a spherical growth plate. The clear aperture of the bundle is enhanced by providing a smaller number of wall layers of each nanotube near the growth plate than at a distance from the growth plate.

Abstract translation: 用于引导X射线，光子或中子束的基于纳米管的装置包括束源和至少一个纳米管。 每个纳米管具有以使得在光学入口处的中心轴的方向的投影与光束源相交的方式定位的光学入口。 每个纳米管可具有沿纳米管长度变化的内径。 为了将一束纳米管的入口指向点状束源，该束可以从球形生长板作为多层纳米管的阵列生长。 通过在生长板附近提供比与生长板相距一定距离的每个纳米管的较小数量的壁层来增强束的透明孔。

公开(公告)号：US20120134465A1

公开(公告)日：2012-05-31

申请号：US13300083

申请日：2011-11-18

Applicant: Susanne Madeline Lee ,  Aurelle Boulder ,  Serge Louis Wilfrid Muller

Inventor： Susanne Madeline Lee ,  Aurelle Boulder ,  Serge Louis Wilfrid Muller

IPC: A61B6/04

CPC classification number: A61B6/482 ,  A61B6/08 ,  A61B6/4021 ,  A61B6/502 ,  A61B6/588 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/064 ,  H01J35/06 ,  H01J2235/068

Abstract: A mammograph is provided. The mammograph includes a source of X-rays; a detector of X-rays, the source being configured to emit at least one beam of X-rays to the detector; and an optic control device configured to control the direction of X-rays emitted by the source such that the X-rays emitted. by the source are substantially parallel to one another,

Abstract translation: 提供乳房X光检查。 乳房X线照相术包括X射线源; X射线检测器，所述源被配置为向所述检测器发射至少一束X射线; 以及光学控制装置，被配置为控制由所述源发射的X射线的方向，使得发射的X射线。 源极基本上彼此平行，

公开(公告)号：US20120050706A1

公开(公告)日：2012-03-01

申请号：US12807167

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/52 ,  H05G2/00

CPC classification number: G21K1/067 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon ice provided by the target portion to an irradiation location. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract translation: 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束将由目标部分提供的氙冰照射到照射位置。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。

公开(公告)号：US08126117B2

公开(公告)日：2012-02-28

申请号：US12699493

申请日：2010-02-03

Applicant: Boris Verman ,  Michael Young ,  Licai Jiang

Inventor： Boris Verman ,  Michael Young ,  Licai Jiang

IPC: H01J35/04 ,  H01J35/30 ,  G21K1/00 ,  G21K1/02

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

Abstract: A multi-beam x-ray system includes an x-ray source which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location.

Abstract translation: 多光束X射线系统包括发射x射线的X射线源和具有第一部分和第二部分的壳体。 第二部分可相对于第一部分移动，并且包括具有不同性能特征的多个光学元件。 每个光学元件通过第二部分相对于第一部分的移动被定位到工作位置，使得光学器件接收来自x射线源的x射线，并将具有所需性能属性的x射线引导到 理想位置。

公开(公告)号：US20110299658A1

公开(公告)日：2011-12-08

申请号：US13154746

申请日：2011-06-07

Applicant: Philipp Bernhardt

Inventor： Philipp Bernhardt

IPC: G21K1/06

CPC classification number: G21K1/06 ,  A61B6/4035 ,  A61B6/4441 ,  A61B6/544 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/067

Abstract: For a quasi-monochromatic x-ray radiation with high radiation intensity, an x-ray radiator generates quasi-monochromatic x-ray radiation to expose a subject from a point-shaped radiation source that emits a polychromatic x-ray radiation, and having a diffraction device to diffract the polychromatic x-ray radiation. The diffraction device has a super-mirror made of crystalline material with a flat surface. In the super-mirror, the crystalline material has at least one (in particular continuous) variation of the lattice plane spacing of the crystal lattice. The radiation source and the diffraction device are arranged such that quasi-monochromatic x-ray radiation is generated from the polychromatic x-ray radiation by partial reflection at the super-mirror.

Abstract translation: 对于具有高辐射强度的准单色X射线辐射，x射线辐射器产生准单色X射线辐射，以从发射多色X射线辐射的点状辐射源暴露受试者，并具有 衍射装置衍射多色X射线辐射。 衍射装置具有由具有平坦表面的结晶材料制成的超级反射镜。 在超镜中，晶体材料具有晶格的晶格面间距的至少一个（特别是连续的）变化。 辐射源和衍射装置被布置成使得通过在超镜下的部分反射从多色X射线辐射产生准单色x射线辐射。