Abstract:
A method for manufacturing an electron multiplier or microchannel plate (10) comprises the steps of forming a body (12) of etchable material, directionally applying a flux of reactive particles against the body in selected areas for removing material therefrom in order to form at least one electron multiplication channel (14) in the body.
Abstract:
The invention is directed to continuous dynodes formed by thin film processing techniques. According to one embodiment of the invention, a continuous dynode is disclosed in which at least one layer is formed by reacting a vapour in the presence of a substrate at a temperature and pressure sufficient to result in chemical vapour deposition kinetics dominated by interfacial processes between the vapour and the substrate. In another embodiment the surface of a bulk semiconductor or substrate is subjected to a reactive atmosphere at a temperature and pressure sufficient to result in a reaction modifying the surface of the substrate. In yet another embodiment a continuous dynode is formed by liquid phase deposition of a dynode material into the substrate from a supersaturated solution. The resulting devices exhibit conductive and emissive properties suitable for electron multiplication in CEM, MCP and MEM applications.
Abstract:
The invention is directed to continuous dynodes formed by thin film processing techniques. According to one embodiment of the invention, a continuous dynode is disclosed in which at least one layer is formed by reacting a vapour in the presence of a substrate at a temperature and pressure sufficient to result in chemical vapour deposition kinetics dominated by interfacial processes between the vapour and the substrate. In another embodiment the surface of a bulk semiconductor or substrate is subjected to a reactive atmosphere at a temperature and pressure sufficient to result in a reaction modifying the surface of the substrate. In yet another embodiment a continuous dynode is formed by liquid phase deposition of a dynode material into the substrate from a supersaturated solution. The resulting devices exhibit conductive and emissive properties suitable for electron multiplication in CEM, MCP and MEM applications.
Abstract:
A method for manufacturing an electron multiplier or microchannel plate (10) comprises the steps of forming a body (12) of etchable material, directionally applying a flux of reactive particles against the body in selected areas for removing material therefrom in order to form at least one electron multiplication channel (14) in the body.
Abstract:
A fibre optic photocathode is provided that is useful in achieving the strict dimensional constraints of instrumentation and array use, in which the output (6) of a high intensity light source, such as a laser, is transmitted in the core (2) of a clad optical fibre (1) to the cathode location, where a conducting cathode material (4), having a work function corresponding to the frequency of the light source in which the photon energy of the light (6), being slightly above the work function of the material (4), is positioned essentially in contact with the core (2) of the optical fibre (1). The photocathode (4) may be coated directly on the optical fibre (1). The end of the fibre core (2) may further be shaped to increase the extraction field so as to provide an intense optical emission spot. The optical fibre cladding may provide precision advantage in shaping. Electrical connection to the cathode material (4) may be facilitated by connection to a metal coating over the optical fibre cladding (3) or extending the cathode material (4) to an adjacent support.
Abstract:
A fibre optic photocathode is provided that is useful in achieving the strict dimensional constraints of instrumentation and array use, in which the output (6) of a high intensity light source, such as a laser, is transmitted in the core (2) of a clad optical fibre (1) to the cathode location, where a conducting cathode material (4), having a work function corresponding to the frequency of the light source in which the photon energy of the light (6), being slightly above the work function of the material (4), is positioned essentially in contact with the core (2) of the optical fibre (1). The photocathode (4) may be coated directly on the optical fibre (1). The end of the fibre core (2) may further be shaped to increase the extraction field so as to provide an intense optical emission spot. The optical fibre cladding may provide precision advantage in shaping. Electrical connection to the cathode material (4) may be facilitated by connection to a metal coating over the optical fibre cladding (3) or extending the cathode material (4) to an adjacent support.