Abstract:
An x-ray imaging system includes an optical device having at least one point-focusing, curved monochromating optic for directing x-rays from an x-ray source towards a focal point. The at least one point-focusing, curved monochromating optic provides a focused monochromatic x-ray beam directed towards the focal point, and a detector is aligned with the focused monochromatic x-ray beam. The optical device facilitates x-ray imaging of an object when the object is located between the optical device and the detector within the focused monochromatic x-ray beam. In various embodiments: each point-focusing, curved monochromatic optic has an optical surface that is doubly-curved; the optical device facilitates passive image demagnification or magnification depending upon placement of the object and detector relative to the focal point; and at least one second point-focusing, curved monochromatic optic can be employed to facilitate refractive index or polarized beam imaging of the object.
Abstract:
A detector apparatus is disclosed that includes a housing and a multilayer disposed within the housing. The multilayer defining a leading edge and a trailing edge and is adapted to interact with a plurality of high-energy photons, impingent from the leading edge, to permit passage of photons of at least one selected energy. The multilayer is secured to a first securement adjacent to the leading edge. The multilayer is secured to a second securement bracket adjacent to the trailing edge. At least one detector is disposed adjacent to the trailing edge of the multilayer to detect the impingent high-energy photons. An adjustment mechanism operatively connects to the second securement bracket to adjust the position of the second securement bracket, thereby altering an angular position of the multilayer.
Abstract:
An X-ray imaging system is provided that includes a target for emitting X-rays and having at least one target focal spot, and an array of multilayer optic devices for transmitting X-rays through total internal reflection. The array of multilayer optics devices are in optical communication with the at least one target focal spot. Further, a method for imaging an object with an X-ray imaging machine is provided. Also, a method for forming a stack of multilayer optic devices is provided.
Abstract:
An X-ray imaging system is provided that includes a target for emitting X-rays and having at least one target focal spot, and an array of multilayer optic devices for transmitting X-rays through total internal reflection. The array of multilayer optics devices are in optical communication with the at least one target focal spot. Further, a method for imaging an object with an X-ray imaging machine is provided. Also, a method for forming a stack of multilayer optic devices is provided.
Abstract:
A multilayer mirror includes a layer sequence arranged on a substrate and a plurality of layer pairs. Each layer pair includes a first layer composed of a first material and a second layer composed of a second material. The first layers and the second layers each have a thickness of more than 2 nm, and the first material or the second material is a silicon boride or a molybdenum nitride.
Abstract:
An energy beam is irradiated onto a target from an energy beam source, thereby generating an X-ray with an irradiating area to be irradiated onto an object. Then, the X-ray is introduced into a spectrometer, thereby generating an X-ray with parallelism through the selection of wavelength and wavelength range.
Abstract:
An X-ray optical element for and influencing of X-ray beam characteristics in two dimensions includes two reflective, curved elements arranged side-by-side to receive X-ray radiation from an X-ray beam source so that the radiation is directed onto both reflective elements and then reflected from one element onto the other element, wherein the two reflective elements are curved at different angles and have different focal lengths.
Abstract:
There is provided a projection objective for a projection exposure apparatus that has a primary light source for emitting electromagnetic radiation having a chief ray with a wavelength ≦193 nm. The projection objective includes an object plane, a first mirror, a second mirror, a third mirror, a fourth mirror; and an image plane. The object plane, the first mirror, the second mirror, the third mirror, the fourth mirror and the image plane are arranged in a centered arrangement around a common optical axis. The first mirror, the second mirror, the third mirror, and the fourth mirror are situated between the object plane and the image plane. The chief ray, when incident on an object situated in the object plane, in a direction from the primary light source, is inclined away from the common optical axis.
Abstract:
Devices and related methods are provided for irradiating a portion of a body. A device according to one embodiment can include a radiation needle, a fluorescent target, and an x-ray transmitting window. The radiation needle can include a radiation conduit having a first and second end for passing primary x-rays. An x-ray generator can generate the primary x-rays and pass the primary x-rays from the first end to second end. The fluorescent target can connect to the second end for absorbing the primary x-rays and produce by fluorescence secondary x-rays for irradiating a predetermined portion of the body. The fluorescent target having a surface for absorbing the primary x-rays to fluoresce and emit said secondary x-rays. The x-ray transmitting window can be positioned adjacent to the fluorescent target such that the secondary x-rays exit through the x-ray transmitting window. The secondary x-rays can irradiate target tissue within the body.
Abstract:
An approach to correcting non-uniformity of critical dimension (CD) in a semiconductor wafer includes measuring 0th-order light transmitted through or reflected from a photomask in a plurality of regions of the photomask. The photomask is altered to equalize the 0th-order light from the photomask such that the wafer CD is uniform. The photomask can be altered such as by forming a phase grating on the back side of the photomask or by introducing shadowing elements into the photomask to alter the transmittance of the photomask.