公开(公告)号：US07113567B2

公开(公告)日：2006-09-26

申请号：US10196805

申请日：2002-07-17

Applicant: Carsten Michaelsen ,  Rüdiger Bormann ,  Jörg Wiesmann

Inventor： Carsten Michaelsen ,  Rüdiger Bormann ,  Jörg Wiesmann

IPC: G21K1/06 ,  G01N23/223 ,  G01T1/36

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair comprises carbon or scandium and the other comprises a metal oxide or a metal nitride and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.

Abstract translation: 在通过波长色散X射线光谱法分析样品中原子或分子元素的装置和方法中，其中初级x射线或电子辐射被引导到样品上，从而从样品发射荧光辐射，荧光辐射 被引导到由多层结构构成的反射镜或聚焦装置，该多层结构包括一对层，其中一层包括碳或钪，另一层包含金属氧化物或金属氮化物，并且荧光辐射从反射镜反射 或聚焦装置到分析检测器上，以分析样品中包含的原子或分子元素。

公开(公告)号：US07076026B2

公开(公告)日：2006-07-11

申请号：US10866057

申请日：2004-06-10

Applicant: Boris Verman ,  Jimpei Harada

Inventor： Boris Verman ,  Jimpei Harada

IPC: G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or depth grading, or both.

Abstract translation: 本发明提供一种具有Kirkpatrick-Baez衍射光学元件的X射线束调节系统，其包括两个光学元件，其中一个光学元件是晶体。 这些元件并排配置。 水晶可以是一个完美的水晶。 一个或两个衍射元件可以是镶嵌晶体。 一个元件可以是多层光学元件。 例如，多层光学器件可以是具有梯度d间距的椭圆镜或抛物面镜。 分级d间距可以是横向分级或深度分级，或两者。

公开(公告)号：US20050270647A1

公开(公告)日：2005-12-08

申请号：US11021974

申请日：2004-12-23

Applicant: Francois Polack ,  Mourad Idir ,  Erick Jourdain ,  Audrey Liard-Cloup

Inventor： Francois Polack ,  Mourad Idir ,  Erick Jourdain ,  Audrey Liard-Cloup

IPC: G01J3/18 ,  G02B5/08 ,  G02B5/18 ,  G21K1/06

CPC classification number: G02B5/1838 ,  B82Y10/00 ,  G01J3/18 ,  G21K2201/061

Abstract: The invention concerns a two-dimensional diffraction gratting for the dispersion of polychromatic or quasi-monochromatic luminous flux including a substrate (2) having a surface (3), a first (5) and a second (6) stacks of thin biperiodic layers of period d in the thickness direction, including at least ten periods, each period d being formed of layers of at least two different materials (7, 8), said stacks (5, 6) forming contiguous lines (11) of width p/2, parallel to one another, and repeated periodically along a direction parallel to the surface of the substrate (2) with a period p, the second stack (6) being alternate with the first stack (5) and offset in width by d/2, so that the stacks (5 and 6) form a thick gratting (9) carried by the substrate (2). According to the invention, said thick grafting (9) consists of the doubly periodical repetition of a same unit cell, topped with a thin surface gratting (10) having an amplitude at the most equal to d/2.

Abstract translation: 本发明涉及用于分散多色或准单色光束的二维衍射，包括具有表面（3），第一（5）和第二（6）的薄的双周期层的叠层的衬底（2） 包括至少十个周期的周期d，每个周期d由至少两个不同材料（7,8）的层形成，所述堆叠（5,6）形成宽度为p / 2的连续线（11） 并且以周期p沿平行于衬底（2）的表面的方向周期性重复，第二堆叠（6）与第一堆叠（5）交替并且以宽度偏移d / 2 ，使得堆叠（5和6）形成由衬底（2）承载的厚层（9）。 根据本发明，所述厚接枝（9）由相同单元电池的双重周期性重复组成，顶部具有最大等于d / 2的振幅的薄表面曲折（10）。

公开(公告)号：US20050002090A1

公开(公告)日：2005-01-06

申请号：US10876898

申请日：2004-06-25

Applicant: Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

Inventor： Wolfgang Singer ,  Martin Antoni ,  Johannes Wangler

IPC: G03F7/20 ,  G02B17/00

CPC classification number: B82Y10/00 ,  G03B27/54 ,  G03F7/70083 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G21K2201/061

Abstract: There is provided an illumination system. The illumination system includes a source of light having a wavelength of less than or equal to about 193 nm, a first facet, a second facet, and a reflective element. The light is incident on the first facet via a first path, propagates from the first facet to the second facet via a second path, and propagates from the second facet to the reflective element via a third path. The second path and the third path are in substantially opposite directions from one another and substantially parallel to each other.

Abstract translation: 提供照明系统。 照明系统包括波长小于或等于约193nm的光源，第一刻面，第二刻面和反射元件。 光通过第一路径入射在第一刻面上，经由第二路径从第一刻面传播到第二刻面，并且经由第三路径从第二面传播到反射元件。 第二路径和第三路径彼此基本上相反的方向并且基本上彼此平行。

公开(公告)号：US06650728B2

公开(公告)日：2003-11-18

申请号：US10196806

申请日：2002-07-17

Applicant: Carsten Michaelsen ,  Rudiger Bormann ,  Jörg Wiesmann

Inventor： Carsten Michaelsen ,  Rudiger Bormann ,  Jörg Wiesmann

IPC: G01N23223

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/064

Abstract: In an apparatus and a method for the analysis of atomic or molecular elements contained in a sample by wavelength dispersive X-ray spectrometry, wherein primary x ray or electron radiation is directed onto the sample whereby fluorescence radiation is emitted from the sample, the fluorescence radiation is directed onto a mirror or focussing device consisting of a multi-layer structure including pairs of layers of which one layer of a pair consists of lanthanum and the other consists of carbon and the fluorescence radiation is reflected from the mirror or focussing device onto an analysis detector for the analysis of the atomic or molecular elements contained in the sample.

Abstract translation: 在通过波长色散X射线光谱法分析样品中原子或分子元素的装置和方法中，其中初级x射线或电子辐射被引导到样品上，从而从样品发射荧光辐射，荧光辐射 被引导到由多层结构组成的反射镜或聚焦装置，该多层结构包括一对层，其中一层由镧构成，另一层由碳组成，另一层由碳组成，并且荧光辐射从反射镜或聚焦装置反射到分析 用于分析样品中包含的原子或分子元素的检测器。

公开(公告)号：US20030043456A1

公开(公告)日：2003-03-06

申请号：US10205206

申请日：2002-07-26

Applicant: ASM LITHOGRAPHY B.V.

Inventor： Mandeep Singh

IPC: G02B001/00 ,  G02B005/08 ,  G02B005/20 ,  F21V009/04 ,  F21V009/06 ,  G02B007/182

CPC classification number: B82Y10/00 ,  G02B5/0891 ,  G03F1/24 ,  G03F7/70058 ,  G03F7/70233 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/061 ,  Y10S359/90 ,  Y10T428/24355

Abstract: The reflectivity of multilayered EUV mirrors tuned for 11-16 nm, for which the two-component Mo/Be and Mo/Si multilayered systems are commonly used, is enhanced by incorporating additional elements and their compounds mainly from period 5 of the periodic table. In addition, the reflectivity performance of the multilayer stacks is further enhanced by a numerical global optimization procedure by which the layer thicknesses are varied for optimum performance in, contradistinction to the constant layer thicknessnulli.e. constant partition rationullmultilayer stacks commonly designed and, fabricated hitherto. By incorporating additional materials with differing complex refractive indices in various regions of the stack, or by wholly replacing one of the components (typically Mo), we have observed peak reflectivity enhancements of up to 5% for a single reflector compared to a standard unoptimized stack. The additional materials used are: Rb, RbCl, Sr, Y, Zr, Ru, Rh, Tc, Pd, Nb and Be. Protective capping layers of B, Ru, Rh, C, Si3N4, SiC, in addition to protecting the mirrors from environmental attack, may serve to improve the reflectivity characteristics.

Abstract translation: 通常使用双组分Mo / Be和Mo / Si多层体系的11-16nm的多层EUV反射镜的反射率通过主要从周期表的第5周引入附加元素及其化合物来增强。 此外，通过数值全局优化程序进一步增强了多层堆叠的反射性能，通过该数值全局优化程序，层厚度随着恒定层厚度的变化而达到最佳性能。 常规分配比 - 通常设计和制造的多层堆叠。 通过在堆叠的各个区域中引入具有不同复合折射率的附加材料，或通过完全替代其中一个部件（通常为Mo）），与标准非优化堆叠相比，我们观察到单个反射器的峰值反射率增强高达5％ 。 使用的附加材料有：Rb，RbCl，Sr，Y，Zr，Ru，Rh，Tc，Pd，Nb和Be。 B，Ru，Rh，C，Si3N4，SiC的保护性覆盖层除了保护镜子免受环境攻击之外，还可用于提高反射率特性。

公开(公告)号：US06521101B1

公开(公告)日：2003-02-18

申请号：US08762572

申请日：1996-12-09

Applicant: Kenneth M. Skulina ,  Richard M. Bionta ,  Daniel M. Makowiecki ,  Craig S. Alford

Inventor： Kenneth M. Skulina ,  Richard M. Bionta ,  Daniel M. Makowiecki ,  Craig S. Alford

IPC: C23C1434

CPC classification number: B82Y10/00 ,  C23C14/14 ,  C23C14/564 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: Beryllium-based multilayer structures and a process for fabricating beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 Å or 11.1 nm). The process includes alternating sputter deposition of beryllium and a metal, typically from the fifth row of the periodic table, such as niobium (Nb), molybdenum (Mo), ruthenium (Ru), and rhodium (Rh). The process includes not only the method of sputtering the materials, but the industrial hygiene controls for safe handling of beryllium. The mirrors made in accordance with the process may be utilized in soft x-ray and extreme-ultraviolet projection lithography, which requires mirrors of high reflectivity (>60%) for x-rays in the range of 60-140 Å (60-14.0 nm).

Abstract translation: 铍基多层结构和制造铍基多层反射镜的方法，可用于大于铍K边缘（111或11.1nm）的波长区域。 该方法包括交替溅射沉积铍和通常从元素周期表第五行的金属，例如铌（Nb），钼（Mo），钌（Ru）和铑（Rh）。 该方法不仅包括溅射材料的方法，还包括用于安全处理铍的工业卫生控制。 根据该方法制造的反射镜可用于软X射线和极紫外投影光刻，其需要60-140埃（60-14.0）范围内的X射线具有高反射率（> 60％）的反射镜 nm）。

公开(公告)号：US6014423A

公开(公告)日：2000-01-11

申请号：US26391

申请日：1998-02-19

Applicant: George Gutman ,  Licai Jiang ,  Boris Verman

Inventor： George Gutman ,  Licai Jiang ,  Boris Verman

IPC: G21K1/06

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061

Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.

Abstract translation: 包括多个x射线反射器的x射线反射系统，其中所述x射线反射器耦合在一起以形成多角的Kirkpatrick-Baez并排系统，并且可以包括多层或多层 层布拉格X射线反射面。

公开(公告)号：US5757882A

公开(公告)日：1998-05-26

申请号：US574249

申请日：1995-12-18

Applicant: George Gutman

Inventor： George Gutman

IPC: G21K1/00 ,  G21K1/06

CPC classification number: B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/068

Abstract: An optical system for providing a steerable monochromatized source of x-ray or neutron radiation. The system incorporates a radiation source and a Bragg structure reflective optical element. A stage causes the optical element to move relative to the radiation source. Such movement is coordinated with lateral d-layer grading such that Bragg's law of reflection is satisfied for radiation of a given wavelength bandwidth to be reflected at various instances and departure angles.

Abstract translation: 一种用于提供x射线或中子辐射的可导向单色化源的光学系统。 该系统包含辐射源和布拉格结构反射光学元件。 阶段使光学元件相对于辐射源移动。 这种运动与横向d层分级协调，使得对于给定波长带宽的辐射满足反射的布拉格定律以在各种情况和出发角度被反射。

公开(公告)号：US5433988A

公开(公告)日：1995-07-18

申请号：US323592

申请日：1994-10-17

Applicant: Yasuaki Fukuda ,  Yutaka Watanabe ,  Shigetaro Ogura ,  Takashi Iizuka

Inventor： Yasuaki Fukuda ,  Yutaka Watanabe ,  Shigetaro Ogura ,  Takashi Iizuka

IPC: B32B15/08 ,  G02B1/10 ,  G21K1/06 ,  G02B5/28

CPC classification number: B32B15/08 ,  B82Y10/00 ,  G02B5/0833 ,  G02B5/0891 ,  G02B5/26 ,  G21K1/062 ,  G21K2201/061 ,  Y10S428/913 ,  Y10T428/24355 ,  Y10T428/30

Abstract: A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layers primarily consists of at least one of single elements, such as ruthenium, or of a boride carbide, silicate, nitride oxide of a transition metal. The second layers primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).

Abstract translation: 用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。 第一层主要由单一元素中的至少一种组成，例如钌，或硼化物碳化物，硅酸盐，过渡金属的氮氧化物。 第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和 铝（例如碳化物，氮化物和铝的氧化物）。