公开(公告)号：US08531679B2

公开(公告)日：2013-09-10

申请号：US12746528

申请日：2008-12-10

Applicant: David Scheiner

Inventor： David Scheiner

IPC: G01B11/00

CPC classification number: G01B11/00 ,  G01B11/02 ,  G01B11/08 ,  G01B11/12 ,  G01B11/22 ,  G01B11/24 ,  G01B2210/56 ,  G01R31/2853 ,  G01R31/311 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The present invention provides a novel system and method for obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by non-destructive technique. The optical system comprises an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole; a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole; and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.

Abstract translation: 本发明提供了一种用于通过非破坏性技术获得通孔的横截面轮廓，深度，宽度，斜率，底切和其它参数中的至少一个的新颖系统和方法。 光学系统包括用于产生至少一个光束并将其引导到包含至少一个通孔的结构的区域中的样品的照明系统; 检测系统，被配置和可操作以收集从所述被照射区域反射的光的图案，所述光图案指示所述通孔的一个或多个参数; 以及连接到所述检测系统的控制系统，所述控制系统包括用于存储预定理论模型的存储器实用程序，所述预定理论模型包括表示描述通孔反射模式的一组参数的数据，以及配置和可操作的数据处理和分析实用程序 接收和分析指示检测到的光图案的图像数据，并确定所述通孔的一个或多个参数。

公开(公告)号：US07123366B2

公开(公告)日：2006-10-17

申请号：US10919823

申请日：2004-08-17

Applicant: David Scheiner ,  Vladimir Machavariani

Inventor： David Scheiner ,  Vladimir Machavariani

IPC: G01B11/14

CPC classification number: G01J3/42 ,  G01B11/02 ,  G01B11/0625 ,  H01L22/12

Abstract: An apparatus and a method are disclosed for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing, wherein the structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. The method utilizes an optical model based on at least some of the features of the structure defined by a certain process of its manufacturing, and is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure.

Abstract translation: 公开了一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的装置和方法，其中该结构表示具有由至少两个金属 - 相对于限定波导的入射光，基本上透明的区域间隔开。 该方法基于由其制造的某个过程定义的结构的至少一些特征而使用光学模型，并且能够确定表示从结构和镜像反射的不同波长的光分量的光度强度的理论数据， 计算所述结构的所述至少一个期望参数。

公开(公告)号：US20060102830A1

公开(公告)日：2006-05-18

申请号：US11271773

申请日：2005-11-14

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: H01J40/14 ,  G02F1/01 ,  G01N21/86

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements comprise at least two measurements with different polarization states of incident light, each measurement including illuminating eh measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between eth diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

公开(公告)号：US20050280906A1

公开(公告)日：2005-12-22

申请号：US11003012

申请日：2004-12-03

Applicant: David Scheiner ,  Michael Winik ,  Yakov Lyubchik

Inventor： David Scheiner ,  Michael Winik ,  Yakov Lyubchik

IPC: G01N21/21 ,  G01N21/47 ,  G01N21/956 ,  G02B20060101 ,  G02B17/00 ,  G02B17/06 ,  G02B21/04 ,  G02B21/16

CPC classification number: G02B21/16 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0224 ,  G01J3/0243 ,  G01N21/211 ,  G01N21/47 ,  G01N21/956 ,  G02B17/06 ,  G02B17/0605 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G02B21/04 ,  G02B27/10 ,  G02B27/283

Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.

Abstract translation: 呈现镜头布置。 透镜装置包括具有凹面反射表面并限定透镜装置的光轴的第一元件以及沿着光轴与第一元件间隔开的第二基本平坦且至少部分反射的元件。 第二元件被配置为允许光通过其并且相对于光轴和第一元件定向，使得在输入光束到第二元件的预定入射角度处，输入光束被反射到反射 第一元件的表面并从其反射以穿过第二元件。

公开(公告)号：US20050146729A1

公开(公告)日：2005-07-07

申请号：US11053254

申请日：2005-02-08

Applicant: David Scheiner ,  Vladimir Machavariani

Inventor： David Scheiner ,  Vladimir Machavariani

IPC: G01B11/02 ,  G01B11/06 ,  G01J3/42 ,  H01L21/66 ,  G01B9/02

CPC classification number: G01J3/42 ,  G01B11/02 ,  G01B11/0625 ,  H01L22/12

Abstract: A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. An optical model is provided, which is based on at least some of the features of the structure defined by a certain process of its manufacturing, and on the relation between a range of the wavelengths of incident radiation to be used for measurements and a space size between the two metal-containing regions in the grid cycle, and a skin depth of said metal. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area is located and spectrophotometric measurements are applied to the measurement area, by illuminating it with incident light of a preset substantially wide wavelength range. A light component substantially specularly reflected from the measurement area is detected, and measured data representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data are analyzed and the optical model is optimized until the theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.

Abstract translation: 一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的方法。 该结构表示具有由至少两个含金属区域形成的至少一个周期的格栅，该至少两个金属区域相对于限定波导的入射光被基本上透明的区域隔开。 提供了一种光学模型，其基于由其制造的特定过程定义的结构的至少一些特征以及用于测量的入射辐射的波长范围与空间大小之间的关系 在网格周期中的两个含金属区域之间，以及所述金属的趋肤深度。 该模型能够确定表示从结构镜面反射的不同波长的光分量的光度强度并且计算所述结构的至少一个期望参数的理论数据。 定位测量区域，并且通过用预设的基本上宽的波长范围的入射光照射分光光度测量值到测量区域。 检测从测量区域基本上镜面反射的光分量，并且获得表示波长范围内的每个波长的光度强度的测量数据。 分析测量和理论数据，并优化光学模型，直到理论数据满足预定条件。 在检测到满足预定条件时，计算结构的所述至少一个参数。

公开(公告)号：US20050140953A1

公开(公告)日：2005-06-30

申请号：US10500631

申请日：2003-01-05

Applicant: David Scheiner

Inventor： David Scheiner

IPC: G01N21/956 ,  G03B27/52

CPC classification number: G01N21/956

Abstract: A method of imaging a patterned sample comprising acquiring at least one image of the sample by illuminating the sample through an optical arrangement and collecting light reflected from the sample through said optical arrangement, wherein the optical arrangement has a predetermined numerical aperture NA and is located a predetermined distance from the sample. This predetermined distance being offset from a focal distance by an effective Talbot distance multiplied by a predetermined coefficient, the method thereby improving a smoothness of the image of the sample.

Abstract translation: 一种对图案化样品进行成像的方法，包括通过光学装置照射样品并收集从样品反射的光通过所述光学装置获取样品的至少一个图像，其中光学装置具有预定的数值孔径NA，并且位于 距样品预定距离。 该预定距离通过有效的Talbot距离乘以预定系数而从焦距偏移，从而提高了样本的图像的平滑度。

公开(公告)号：US20050062965A1

公开(公告)日：2005-03-24

申请号：US10919823

申请日：2004-08-17

Applicant: David Scheiner ,  Vladimir Machavariani

Inventor： David Scheiner ,  Vladimir Machavariani

IPC: G01B11/02 ,  G01B11/06 ,  G01J3/42 ,  H01L21/66

CPC classification number: G01J3/42 ,  G01B11/02 ,  G01B11/0625 ,  H01L22/12

Abstract: An apparatus and a method are disclosed for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing, wherein the structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. The method utilizes an optical model based on at least some of the features of the structure defined by a certain process of its manufacturing, and is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure.

Abstract translation: 公开了一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的装置和方法，其中该结构表示具有由至少两个金属 - 相对于限定波导的入射光，基本上透明的区域间隔开。 该方法基于由其制造的某个过程定义的结构的至少一些特征而使用光学模型，并且能够确定表示从结构和镜像反射的不同波长的光分量的光度强度的理论数据 计算所述结构的所述至少一个期望参数。

公开(公告)号：US06836324B2

公开(公告)日：2004-12-28

申请号：US10011263

申请日：2001-11-13

Applicant: David Scheiner ,  Vladimir Machavariani

Inventor： David Scheiner ,  Vladimir Machavariani

IPC: G01J342

CPC classification number: G01J3/42 ,  G01B11/02 ,  G01B11/0625 ,  H01L22/12

Abstract: An apparatus and a method are disclosed for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing, wherein the structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. The method utilizes an optical model on at least some of the features of the structure defined by a certain process of its manufacturing, and is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure.

Abstract translation: 公开了一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的装置和方法，其中该结构表示具有由至少两个金属 - 相对于限定波导的入射光，基本上透明的区域间隔开。 该方法利用由其制造的特定过程定义的结构的至少一些特征的光学模型，并且能够确定表示从结构镜面反射的不同波长的光分量的光度强度的理论数据，并且计算 所述结构的至少一个期望参数。

公开(公告)号：US20100284027A1

公开(公告)日：2010-11-11

申请号：US12746528

申请日：2008-12-10

Applicant: David Scheiner

Inventor： David Scheiner

IPC: G01B11/00

CPC classification number: G01B11/00 ,  G01B11/02 ,  G01B11/08 ,  G01B11/12 ,  G01B11/22 ,  G01B11/24 ,  G01B2210/56 ,  G01R31/2853 ,  G01R31/311 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The present invention provides a novel system and method for obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by non-destructive technique. The optical system comprises an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole; a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole; and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.

Abstract translation: 本发明提供了一种用于通过非破坏性技术获得通孔的横截面轮廓，深度，宽度，斜率，底切和其它参数中的至少一个的新颖系统和方法。 光学系统包括用于产生至少一个光束并将其引导到包含至少一个通孔的结构的区域中的样品的照明系统; 检测系统，被配置和可操作以收集从所述被照射区域反射的光的图案，所述光图案指示所述通孔的一个或多个参数; 以及连接到所述检测系统的控制系统，所述控制系统包括用于存储预定理论模型的存储器实用程序，所述预定理论模型包括表示描述通孔反射模式的一组参数的数据，以及配置和可操作的数据处理和分析实用程序 接收和分析指示检测到的光图案的图像数据，并确定所述通孔的一个或多个参数。

公开(公告)号：US20100214566A1

公开(公告)日：2010-08-26

申请号：US12775883

申请日：2010-05-07

Applicant: Boaz Brill ,  Moshe Finarov ,  David Scheiner

Inventor： Boaz Brill ,  Moshe Finarov ,  David Scheiner

IPC: G01B11/00 ,  H01L23/544

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/27 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  H01L22/12

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造期间层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。