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    PRESSER FOOT DEVICE FOR SEWING MACHINE
    21.
    发明专利
    PRESSER FOOT DEVICE FOR SEWING MACHINE 失效

    公开(公告)号：JPH02182287A

    公开(公告)日：1990-07-16

    申请号：JP30786089

    申请日：1989-11-29

    Applicant: MEFINA SA

    Inventor： ANTONIO JIMENESU ,  MISHIERU KONBUPAN

    IPC: D05B29/00 ,  D05B29/02

    Abstract: PURPOSE: To make considerably heavy sewing easily absorbed by moving a presser foot on a vertical route while fixing it by a lever when inclining the lever from one angle terminal position to the other position. CONSTITUTION: A lever 70 is freely inclined in a direction F1 or F2 by turning on tracks 72a and 72b corresponding to sectors 70c and 70d with screws thereof. Therefore, the vertical component of pressure operated by a spring 77 on a carrier 74 is moved to the left contact areas of sectors 70c and 70d on this track so as to incline the lever 70 in the direction F2 from the lower position to the upper position. As soon as the vertical component of pressure operated by the spring 77 is moved to the right contact area of this lever, the lever 70 takes the lower position by moving in the opposite direction of the carriage 74. At the lower or working position of a presser foot 71, this presser foot operates the maximum pressure applicable to the grip of a fabric feeding mechanism on the fabric.

    INFORMATION DEVICE FOR ELECTRONIC SEWING MACHINE
    22.
    发明专利
    INFORMATION DEVICE FOR ELECTRONIC SEWING MACHINE 失效

    公开(公告)号：JPH0257287A

    公开(公告)日：1990-02-27

    申请号：JP11386889

    申请日：1989-05-08

    Applicant: MEFINA SA

    Inventor： ANTONIO JIMENETSU ,  PIEERUUAREN DOUSHIYUNOO

    IPC: D05B3/02 ,  D05B19/10 ,  D05B73/02 ,  G05B19/10

    Abstract: PURPOSE: To enable a key to select a sewing pattern expressing an ideogram by positioning ideograms on the respective surfaces of a flap to position these ideograms practically on the same straight line as ideograms, which are supported at the portion of a substrate covered with the flap, at one or other terminal position and maintaining the ideograms in the state visible through the window of the flap at the turning position of the flap. CONSTITUTION: The first set of instructions supported by the substrate is formed from two rows of ideograms 13 and 14 with characteristics for each sewing pattern in the series of sewing patterns. The flap is hinged between these rows. The second set is formed from at least two other rows of ideograms 13 and 14 indicating the other sewing pattern executable for a sewing machine, one of these rows is provided on the first using surface of a flap 9 and the other row is provided on the second using surface of the flap 9. The ideograms 13 and 14 on the respective surfaces of the flap are positioned at one terminal and the other terminal of the terminal position and the flap 9 has a window 15 related to the respective ideograms.

    SEWING MACHINE
    23.
    发明专利
    SEWING MACHINE 失效

    公开(公告)号：JPH0223985A

    公开(公告)日：1990-01-26

    申请号：JP13027889

    申请日：1989-05-25

    Applicant: MEFINA SA

    Inventor： ANTONIO JIMUNE ,  PIEERU AREN DEYUSHIYUNOO

    IPC: D05B3/02 ,  D05B19/10 ,  D05B73/02

    Abstract: PURPOSE: To protect ideograms by providing a flap pivotally supported between ideogram strings in a cover and folding the flap into the bottom part of the cover at the both ends of a rotary position so as to shield one of the two ideogram strings in either one of the both end rotary positions. CONSTITUTION: This sewing machine is provided with a first table T1 formed by the ideogram strings which are horizontally aligned in two stages over the almost whole length of an upper arm in the casing of the sewing machine and a table T2 arranged inside the cover 7 which is pivotally supported with a shaft 8 fitted to the top part of a front surface in the casing of the sewing machine as a center. The both ends 12a and 12b extended in parallel with the shaft 8 are pivotally supported inside an opening which is arranged on the side wall of the cover 7 between the ideogram strings 9 and 10 carried in the bottom part of the cover 7 and the flap 11 is fitted to it. The flap can be rotated between the two end part positions to shield the ideogram string 9 or 10.

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