公开(公告)号：WO2009097323A2

公开(公告)日：2009-08-06

申请号：PCT/US2009/032222

申请日：2009-01-28

Applicant: REFLECTIVE X-RAY OPTICS LLC ,  WINDT, David, L.

Inventor： WINDT, David, L.

IPC: A61B6/00

CPC classification number: A61B6/08 ,  A61B6/06 ,  A61B6/4035 ,  A61B6/4078 ,  A61B6/4085 ,  A61B6/502 ,  A61B6/582 ,  A61B6/583 ,  A61B6/587

Abstract: An X-ray optical alignment system for X-ray imaging devices includes a visible-light point source and a multi-axis positioner therefor, fixedly mounted with respect to the X-ray focal spot. A mirror or beamsplitter is fixedly mounted with respect to the X-ray focal spot and disposed in the beam path of the X-ray source. The beamsplitter reflects light emitted from the light source and transmits X-rays emitted from the X-ray source. A first X-ray attenuating grid is fixedly but removably mountable with respect to the X-ray source, having a first X-ray attenuation pattern; and a second X-ray attenuating grid is adjustably mountable with respect to the first grid having a second X-ray attenuating pattern corresponding to the first X-ray attenuating pattern. When the grids are aligned, their attenuating patterns are also aligned and allow X-rays from the X-ray source and light reflected from the beamsplitter to pass therethrough.

Abstract translation: 用于X射线成像设备的X射线光学对准系统包括固定安装在X射线焦斑上的可见光点源和用于其的多轴定位器。 镜子或分束器相对于X射线焦斑固定地安装并且设置在X射线源的光束路径中。 分束器反射从光源发射的光并透射从X射线源发射的X射线。 第一X射线衰减网格相对于X射线源固定但可拆卸地安装，具有第一X射线衰减图案; 并且第二X射线衰减网格相对于具有对应于第一X射线衰减图案的第二X射线衰减图案的第一网格可调节地安装。 当网格对齐时，它们的衰减图案也被对齐，并允许来自X射线源的X射线和从分束器反射的光通过。

公开(公告)号：EP2249704A4

公开(公告)日：2013-07-03

申请号：EP09704969

申请日：2009-01-30

Applicant: REFLECTIVE X RAY OPTICS LLC

Inventor： WINDT DAVID L

IPC: A61B6/00

CPC classification number: G21K1/025 ,  A61B6/032 ,  A61B6/4021 ,  A61B6/4085 ,  A61B6/4291 ,  A61B6/482 ,  A61B6/502 ,  A61B6/5282

公开(公告)号：EP2249704A2

公开(公告)日：2010-11-17

申请号：EP09704969.6

申请日：2009-01-30

Applicant: Reflective X-ray Optics LLC

Inventor： WINDT, David, L.

IPC: A61B6/00

CPC classification number: G21K1/025 ,  A61B6/032 ,  A61B6/4021 ,  A61B6/4085 ,  A61B6/4291 ,  A61B6/482 ,  A61B6/502 ,  A61B6/5282

Abstract: An X-ray imaging device and alignment/scanning system include at least one multilayer X-ray mirror mounted on a multi-axis adjustable mirror mount pivotable about a scanning axis. A mirror scanner is coupled with the mirror mount and synchronized with the X-ray source so that the mirror scanner moves the mirror mount about the scanning axis. The invention may include a plurality of mirrors, optionally in a stack, and preferably including first and second mirrors respectively adapted to reflect X-rays of first and second energies. A movable attenuation plate having a window selectively allows X-rays to be transmitted by one of the mirrors and blocks X-rays from the other mirror(s). Sets of the mirrors may be configured in blocks or interspersed. The mirror scanner may be operable at variable speeds to enable selective control of the scanning speed of the mirror.

公开(公告)号：EP2247240A2

公开(公告)日：2010-11-10

申请号：EP09705681.6

申请日：2009-01-28

Applicant: Reflective X-ray Optics LLC

Inventor： WINDT, David, L.

IPC: A61B6/00

CPC classification number: A61B6/08 ,  A61B6/06 ,  A61B6/4035 ,  A61B6/4078 ,  A61B6/4085 ,  A61B6/502 ,  A61B6/582 ,  A61B6/583 ,  A61B6/587

Abstract: An X-ray optical alignment system for X-ray imaging devices includes a visible-light point source and a multi-axis positioner therefor, fixedly mounted with respect to the X-ray focal spot. A mirror or beamsplitter is fixedly mounted with respect to the X-ray focal spot and disposed in the beam path of the X-ray source. The beamsplitter reflects light emitted from the light source and transmits X-rays emitted from the X-ray source. A first X-ray attenuating grid is fixedly but removably mountable with respect to the X-ray source, having a first X-ray attenuation pattern; and a second X-ray attenuating grid is adjustably mountable with respect to the first grid having a second X-ray attenuating pattern corresponding to the first X-ray attenuating pattern. When the grids are aligned, their attenuating patterns are also aligned and allow X-rays from the X-ray source and light reflected from the beamsplitter to pass therethrough.

公开(公告)号：EP2210147A1

公开(公告)日：2010-07-28

申请号：EP07820858.4

申请日：2007-10-02

Applicant: Consiglio Nazionale delle Ricerche - INFM Istituto Nazionale per la Fisica della Materia ,  Universita Degli Studi Di Padova ,  Reflective X-ray Optics LLC

Inventor： PELIZZO, Maria-Guglielmina ,  NICOLOSI, Piergiorgio ,  SUMAN, Michele ,  WINDT, David L.

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G02B5/0891 ,  G02B27/0012 ,  G03F1/24 ,  G03F7/70233 ,  G21K1/062 ,  G21K2201/061 ,  Y10T428/24612

Abstract: Aperiodic mult ilayer structures An aperiodic multilayer structure (2, 2') comprising a plurality of alternating layers of a first (4, 4') and a second (6, 6') material and a capping layer (10, 10') covering these alternating layers, wherein the structure (2, 2') is characterized in that the thickness of the alternating layers chaotically varies in at least a portion of said structure (2, 2'). The invention further comprises design method comprising the step of define a time interval and a first plurality of periodic multilayer structures (A), then calculate a first merit function ( ∫ R(λ )10* I(λ)dλ ) and define a first domain for each first structures. The method further includes the step of apply at least one rando m mutation to each first structures inside the associated first domain and calculate a second merit function ( ∫R(λ) 10* I(λ)dλ for the at least one mutation. Then, the method proceeds with a co mparison of each first merit functions with the second merit function of the associated at least one mutation and if said second merit function is enhanced with respect to the first merit function, the at least one mutation is substituted for the structure of the first plurality and a second domain is defined for thw mutation, otherwise, the structure of the first plurality is maintained inside the corresponding first domain. The method further includes the step of calculate a mean value of the merit functions o f the first plurality of structures or mutations present in each first or second domain and define a threshold value to said mean value; then, for each first plurality of structures or mutations present in each first or second domain whose merit function is enhanced of the threshold with respect to the mean value, subst itute a third domain to the first or second domain unt il the corresponding merit function is enhanced of said predetermined threshold. Then, the preceding step are repeated unt il the time interval has lapsed and the merit funct ions of the first plurality of structures or mutations present in each first domain are compared and the structure or mutation whose merit function is the more enhanced is selected.

公开(公告)号：EP2247240B1

公开(公告)日：2016-11-02

申请号：EP09705681.6

申请日：2009-01-28

Applicant: Reflective X-ray Optics LLC

Inventor： WINDT, David, L.

IPC: A61B6/00 ,  A61B6/06 ,  A61B6/08

CPC classification number: A61B6/08 ,  A61B6/06 ,  A61B6/4035 ,  A61B6/4078 ,  A61B6/4085 ,  A61B6/502 ,  A61B6/582 ,  A61B6/583 ,  A61B6/587