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公开(公告)号:KR1020170063087A
公开(公告)日:2017-06-08
申请号:KR1020150169053
申请日:2015-11-30
Applicant: 삼성전자주식회사
IPC: H01L51/42 , H01L51/52 , H01L31/0256 , H01L51/44 , H01L27/146
CPC classification number: H01L27/307 , H01L51/0053 , H01L51/0058 , H01L51/006 , H01L51/0061 , H01L51/0062 , H01L51/0065 , H01L51/424 , H01L51/4293 , H01L51/442 , H01L51/5004 , H01L2251/303 , Y02E10/549
Abstract: 서로마주하는제1 전극과제2 전극, 상기제1 전극과상기제2 전극사이에위치하고 pn 접합을형성하는제1 물질과제2 물질을포함하는광전변환층, 그리고상기제1 전극과상기광전변환층사이에서상기제1 전극과인접하게위치하고제3 물질을포함하는중간층을포함하고, 상기제1 물질과상기제3 물질은각각 1.7 내지 2.3eV의에너지밴드갭을가지는유기물인유기광전소자및 이를포함하는이미지센서에관한것이다.
Abstract translation: 第一电极任务第二电极,所述第一电极和设置在包括第一材料,电极之间的第二光电转换层挑战第二材料以形成pn结,并且所述第一电极和所述光电转换层彼此面对, 其中第一材料和第三材料分别是能带隙为1.7至2.3eV的有机材料,以及包括其的有机光伏装置 到图像传感器。
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22.
公开(公告)号:KR1020170037390A
公开(公告)日:2017-04-04
申请号:KR1020150136924
申请日:2015-09-25
Applicant: 삼성전자주식회사
Inventor: 야기타다오 , 사쿠라이리에 , 최혜성 , 이마세타츠야 , 시부야히로마사 , 윤성영 , 이계황 , 이광희 , 임동석 , 임선정 , 불리아드자비에 , 진용완 , 최용석 , 한문규
IPC: C07D345/00 , C07D333/10 , C07C13/54 , C07F7/02 , H01L27/146 , H01L51/42
CPC classification number: H01L51/0061 , C07D333/36 , C07D345/00 , H01L27/307 , H01L51/0046 , H01L51/0052 , H01L51/0054 , H01L51/006 , H01L51/0062 , H01L51/0068 , H01L51/4253 , Y02E10/549
Abstract: 하기화학식 1의유기광전소자용화합물및 이를포함하는유기광전소자, 이미지센서및 전자장치를제공한다: [화학식 1]상기화학식 1에서, 각치환기의정의는명세서에기재된바와같다.
Abstract translation: 本发明提供由下式(1)表示的有机光电器件化合物和包含其的有机光电器件,图像传感器和电子器件:其中,在式(1)中,每个取代基如说明书中所定义。
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公开(公告)号:KR101639071B1
公开(公告)日:2016-07-12
申请号:KR1020080107022
申请日:2008-10-30
Applicant: 삼성전자주식회사
CPC classification number: C09J7/0221 , C09J7/387 , H01L51/5237 , H01L51/5256 , Y10T428/1059 , Y10T428/239
Abstract: 본발명의구현예들은배리어층및 배리어층하부에위치하며 2종이상의상이한도메인을형성하는블록공중합체를포함하는접착층을포함하는다층박막, 이의제조방법, 및이를포함하는봉지구조체에관한것으로이러한다층박막은가스및 수분차단성및 유연성이우수하여소자등의봉지구조체제조에효과적으로적용될수 있을뿐 아니라소자의기판으로도적용가능하다
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公开(公告)号:KR1020160025838A
公开(公告)日:2016-03-09
申请号:KR1020140113220
申请日:2014-08-28
Applicant: 삼성전자주식회사
IPC: C09K11/06 , H01L51/50 , H01L51/42 , H01L27/146
CPC classification number: H01L51/0053 , H01L27/307 , H01L51/0067 , H01L51/0072 , H01L51/0077 , H01L51/008 , H01L51/424 , H01L51/4253
Abstract: 서로마주하는제1 전극과제2 전극, 그리고상기제1 전극과상기제2 전극사이에위치하는활성층을포함하고, 상기활성층은가시광선영역내에서 500nm 내지 600nm 파장영역에서최대흡수파장을가지는제1 화합물, 그리고가시광선영역내에서투명한제2 화합물을포함하는유기광전소자및 상기유기광전소자를포함하는이미지센서에관한것이다.
Abstract translation: 本发明涉及一种有机光电器件,包括彼此面对的第一电极和第二电极以及位于第一电极和第二电极之间的有源层,其中有源层包括在第一电极和第二电极之间具有最大吸收波长的第一化合物 在可见光区域中的波长范围为500-600nm,在可见光区域透明的第二化合物。 本发明涉及包含有机光电装置的图像传感器。 在一个实施方案中提供了具有高光电转换效率和波长选择性的有机光电装置。
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公开(公告)号:KR1020100071650A
公开(公告)日:2010-06-29
申请号:KR1020080130441
申请日:2008-12-19
Applicant: 삼성전자주식회사
CPC classification number: H01L21/02304 , C09D183/04 , C09D183/16 , H01L21/02126 , H01L21/02255 , H01L21/3122 , H01L21/3125 , H01L31/0392 , H01L31/048 , H01L51/0097 , H01L51/448 , H01L51/5237 , H01L51/5256 , Y02E10/549 , Y10T428/31663
Abstract: PURPOSE: A gas barrier thin film, an electronic device including the same, and a method for manufacturing the gas barrier thin film are provided to improve gas barrier property by including novel organic and inorganic complex copolymer and to facilitate the fabrication of the gas barrier thin film. CONSTITUTION: A gas barrier thin film comprises; a substrate; a fixed layer which is formed on one side of the substrate; and an inorganic oxide layer which is formed on the fixed layer. The fixed layer includes a repeating unit which is marked as a chemical formula 1 and a repeating unit which is marked as a chemical formula 2. In the chemical formulas, R1, R2, and R3 are a hydrogen atom, an alkyl group with C1~C5, an alkenyl group with C2~C5, an alkynyl group with C2~C5, an alkoxy group with C1~C5, or an aryl group with C6~C15.
Abstract translation: 目的:提供一种阻气薄膜,包括该阻气薄膜的电子装置和制造阻气薄膜的方法,以通过包括新颖的有机和无机络合物共聚物来改善阻气性,并且有利于制造阻气薄膜 电影。 构成:阻气薄膜包括: 底物; 形成在基板一侧的固定层; 以及形成在固定层上的无机氧化物层。 固定层包括标记为化学式1的重复单元和标记为化学式2的重复单元。在化学式中,R1,R2和R3是氢原子,具有C1〜 C5,具有C2〜C5的烯基,具有C2〜C5的炔基,具有C1〜C5的烷氧基或具有C6〜C15的芳基。
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26.
公开(公告)号:KR1020090126863A
公开(公告)日:2009-12-09
申请号:KR1020080053196
申请日:2008-06-05
Applicant: 삼성전자주식회사
IPC: H01L21/203
CPC classification number: C23C14/352 , B05D1/002 , B05D1/60 , B05D2350/63 , C23C14/0036 , C23C14/081 , Y10T428/31663
Abstract: PURPOSE: A method for fabricating a multilayered encapsulation thin film having optical functionality and the multilayered encapsulation thin film fabricated by the same are provided to easily form the multilayered encapsulation thin film with the different density and the refractivity by performing the reactive or non-reactive PVD process. CONSTITUTION: A physical vapor deposition apparatus includes a plurality of targets in one vacuum chamber. A first thin film(2) is formed on the substrate(1) with the reactive or the non-reactive PVD process, using a part of target in the vacuum chamber. A second thin film(3) is formed on the first thin film with the reactive or non-reactive PVD process, using the other target within the vacuum chamber.
Abstract translation: 目的:提供一种制造具有光学功能的多层封装薄膜的方法和由其制造的多层封装薄膜,以通过执行反应性或非反应性PVD容易地形成具有不同密度和折射率的多层封装薄膜 处理。 构成:物理气相沉积装置在一个真空室中包括多个靶。 使用真空室中的一部分靶,在反应性或非反应性PVD工艺的基板(1)上形成第一薄膜(2)。 第一薄膜(3)在反应性或非反应性PVD方法的第一薄膜上使用真空室内的另一靶形成。
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公开(公告)号:KR1020090107882A
公开(公告)日:2009-10-14
申请号:KR1020080033400
申请日:2008-04-10
Applicant: 삼성전자주식회사
CPC classification number: H01L23/3135 , H01L23/291 , H01L51/5253 , H01L2924/0002 , H01L2924/12044 , Y10T428/31663 , H01L2924/00
Abstract: PURPOSE: An encapsulation thin film with a graded composition layer and anchoring layer, and a fabrication method thereof are provided to prevent moisture, oxygen, and harmful components from coming in. CONSTITUTION: An encapsulation thin film comprises a substrate, graded composition layer(30), and anchoring layer(20). The anchoring layer comprises organic and inorganic hybrid polymers including Si. In the graded composition layer, two or more selected from metal oxide, metal nitride, and silicon oxide continuously change in a vertical direction. The optical transmittance rate of the encapsulation thin in a visible light region is 85%.
Abstract translation: 目的:提供具有梯度组成层和锚定层的封装薄膜及其制造方法,以防止水分,氧气和有害成分进入。构成:包封薄膜包括基底,渐变组成层(30 )和锚定层(20)。 锚定层包括有机和无机混合聚合物,包括Si。 在分级组合物层中,选自金属氧化物,金属氮化物和氧化硅中的两种以上在垂直方向上连续变化。 可见光区域的封装薄膜的透光率为85%。
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