유전자 분석장치
    22.
    发明公开
    유전자 분석장치 审中-实审
    基因分析装置

    公开(公告)号:KR1020130060914A

    公开(公告)日:2013-06-10

    申请号:KR1020110127225

    申请日:2011-11-30

    Abstract: PURPOSE: A gene analysis apparatus is provided to increase intensity of a fluorescence light by bioreaction. CONSTITUTION: A gene analysis apparatus comprises: an illuminating optical system for irradiating a sample solution with an excitation light; a microfluidic device(110) comprising one or more microchambers(115) with a reflection pattern; a detection optical system comprising a photodetector for detecting a fluorescence light generated by bioreaction in the microchambers. The microfluidic device is formed of a silicon substrate material or a polymer material.

    Abstract translation: 目的:提供一种通过生物反应增加荧光强度的基因分析装置。 构成:基因分析装置包括:用激发光照射样品溶液的照明光学系统; 包括具有反射图案的一个或多个微室(115)的微流体装置(110) 检测光学系统,包括用于检测由微室中的生物反应产生的荧光的光电检测器。 微流体装置由硅衬底材料或聚合物材料形成。

    비휘발성 메모리 장치 및 그 형성 방법
    30.
    发明公开
    비휘발성 메모리 장치 및 그 형성 방법 有权
    非易失性存储器件及其形成方法

    公开(公告)号:KR1020090032304A

    公开(公告)日:2009-04-01

    申请号:KR1020070097399

    申请日:2007-09-27

    Inventor: 박진택 정원석

    Abstract: A non-volatile memory device and a method of formation thereof are provided to prevent the information distortion due to the movement of the electronics stored in the charge storage pattern by forming the charge storage pattern on the active region except for the element isolation film. A substrate(110) of a non-volatile memory device comprises a cell region(A) and a peripheral region(B). A cell active region(120a) is defined by an element isolation film(121a). The cell element isolation film comprises an upper element isolation layer(123a) and a lower element isolation layer(122). A tunneling insulating layer(134) is located in the cell active region. A charge storage pattern(135a) is located in the tunneling insulating layer. The charge storage pattern comprises a horizontal part(136) and a protrusion part(137). A blocking insulation film pattern(145a) is located in the charge storage pattern and the cell element isolation film. A control gate line(155a) is located in the blocking insulation film pattern. A neighboring gate insulating layer(127) is located on a peripheral active region(120b). A neighboring gate electrode(156) is located in the neighboring gate insulating layer. The charge storage pattern is not arranged in the cell element isolation film.

    Abstract translation: 提供了一种非易失性存储器件及其形成方法,用于通过在除了元件隔离膜之外的有源区域上形成电荷存储图案来防止由存储在电荷存储图案中的电子元件的移动引起的信息失真。 非易失性存储器件的衬底(110)包括单元区域(A)和外围区域(B)。 电池活性区域(120a)由元件隔离膜(121a)限定。 电池元件隔离膜包括上部元件隔离层(123a)和下部元件隔离层(122)。 隧道绝缘层(134)位于电池活性区域中。 电荷存储图案(135a)位于隧道绝缘层中。 电荷存储图案包括水平部分(136)和突出部分(137)。 阻挡绝缘膜图案(145a)位于电荷存储图案和电池元件隔离膜中。 控制栅极线(155a)位于阻挡绝缘膜图案中。 相邻的栅极绝缘层(127)位于外围有源区(120b)上。 相邻的栅极电极(156)位于相邻的栅极绝缘层中。 电池存储图案不布置在电池元件隔离膜中。

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