Abstract:
PURPOSE: A gene analysis apparatus is provided to increase intensity of a fluorescence light by bioreaction. CONSTITUTION: A gene analysis apparatus comprises: an illuminating optical system for irradiating a sample solution with an excitation light; a microfluidic device(110) comprising one or more microchambers(115) with a reflection pattern; a detection optical system comprising a photodetector for detecting a fluorescence light generated by bioreaction in the microchambers. The microfluidic device is formed of a silicon substrate material or a polymer material.
Abstract:
본 발명은 반도체 재료로 구성된 기판; 상기 기판 내에 서로 이격되어 형성되고 상기 기판과 반대 극성으로 도핑된 소스 영역 및 드레인 영역; 상기 소스 영역과 드레인 영역 사이에 배치된 채널 영역; 상기 채널 영역 상에 배치되고 전기적 절연 재료로 구성된 절연층; 및 상기 절연층 위에 이격되어 배치된 게이트 전극을 포함하는 전계 효과 트랜지스터에 있어서, 상기 절연층 상에 위치하는 금층을 더 포함하는, 티올기를 갖는 분석물을 검출하기 위한 전계 효과 트랜지스터, 상기 전계 효과 트랜지스터를 포함하는 미세유동장치, 및 상기 전계 효과 트랜지스터 및 미세유동장치를 이용하여 티올기를 포함하는 분석물을 검출하는 방법을 제공한다. FET, 금층, 티올기, 미세유동장치
Abstract:
PURPOSE: A dielectric heating method using microwaves and anions is provided to reduce heating time of objects by increasing a heating rate through the addition of negative ions with high charge density promoting polarization of molecule. CONSTITUTION: A dielectric heating method using microwaves and anions comprises the steps of: adding negative ions with high charge density, which interacts with a medium molecule strongly than a hydrogen bond between medium molecules of dielectric, to a dielectric for dielectric heating; and irradiating microwaves to the dielectric to heat the dielectric.
Abstract:
A non-volatile memory device and a method of formation thereof are provided to prevent the information distortion due to the movement of the electronics stored in the charge storage pattern by forming the charge storage pattern on the active region except for the element isolation film. A substrate(110) of a non-volatile memory device comprises a cell region(A) and a peripheral region(B). A cell active region(120a) is defined by an element isolation film(121a). The cell element isolation film comprises an upper element isolation layer(123a) and a lower element isolation layer(122). A tunneling insulating layer(134) is located in the cell active region. A charge storage pattern(135a) is located in the tunneling insulating layer. The charge storage pattern comprises a horizontal part(136) and a protrusion part(137). A blocking insulation film pattern(145a) is located in the charge storage pattern and the cell element isolation film. A control gate line(155a) is located in the blocking insulation film pattern. A neighboring gate insulating layer(127) is located on a peripheral active region(120b). A neighboring gate electrode(156) is located in the neighboring gate insulating layer. The charge storage pattern is not arranged in the cell element isolation film.