Abstract:
PURPOSE: An organic light emitting diode(OLED) lighting apparatus and a manufacturing method thereof are provided to extend the lifetime of an OLED by reducing the resistance of an anode and a cathode. CONSTITUTION: An OLED comprises an anode electrode(210), a cathode electrode(230), and an organic light emitting layer(220). A sealing member(300) covers the OLED. The sealing member comprises a sealing substrate, first and second conductive auxiliary layers, a plurality of contact members, and an insulating layer. The first and second conductive auxiliary layers are formed on the sealing substrate and are electrically separated. The plurality of contact members connect the first conductive auxiliary layer with a cathode electrode and the second conductive auxiliary layer with an anode electrode. The insulating layer covers the first and second conductive auxiliary layers excluding a part where the plurality of contact members are located.
Abstract:
PURPOSE: A thin film transistor array panel for an X-ray detector and a method for manufacturing a thin film transistor on a substrate are provided to simplify a process and stably drive a device by applying a device of a top gate structure to a TFT backplane panel. CONSTITUTION: A thin film transistor(120) has a top gate structure and is formed in each pixel region defined on a base substrate(110). The thin film transistor includes a source electrode(122B) and a drain electrode(122A) formed on the same layer as the source electrode. A photoelectric conversion device(140) is electrically connected to the thin film transistor. The photoelectric conversion device includes a pixel electrode(142), a photoconductor layer(144), and a bias electrode(146).
Abstract:
PURPOSE: A method of manufacturing oxide semiconductor thin film transistor and semiconductor equipment are provided to reduce a contact resistance between source and drain semiconductor channel layers by using air pressure plasma processing. CONSTITUTION: A gate insulating film(114) where a channel layer(116) composed of an oxide semiconductor is formed is made on a substrate to cover a gate electrode. The surface of a generated channel layer is processed with use of air pressure plasma. A source and drain electrodes are respectively formed on both sides of the surface processed channel layer. A protective film(120) covering the generated source and drain electrodes and channel layer is formed.
Abstract:
본 발명은 물질의 수분, 산소 등을 포함하는 외기의 침투율을 측정하는 장치에 관한 것으로, 본 실시예에 따른 기판의 외기 침투율 측정을 위한 반응 물질 카트리지는 기판을 투과한 외기와의 접촉에 따라 반응하는 반응 물질을 포함하는 반응부; 상기 반응부를 수용하며, 상기 반응 물질의 상기 외기와의 접촉에 따른 변화를 측정하는 측정부에 탈착 가능한 카트리지 몸체; 및 상기 카트리지 몸체를 차폐하며, 상기 반응 물질과 상기 외기의 접촉을 위하여 상기 카트리지 몸체에서 박리되는 차폐수단을 포함한다. 본 발명에 따르면 카트리지화된 가스 투과도 측정 장치 및 방법을 이용함으로써 종래의 기술에 비해 정밀하고 신뢰성 있는 데이터 확보가 가능하여 플렉서블 AMOLED 등의 새로운 응용분야에 필요한 제품의 신뢰성 평가가 용이할 수 있다. 또한 기판이 수용되는 부분도 카트리지 형태로 제작하여 상대적으로 장착 및 지지가 자유롭지 않은 유연 기판을 측정하고자 할 때 장치 외부에서 간편하게 작업할 수 있어서 측정자 간의 균일도 오류를 줄일 수 있다.