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公开(公告)号：KR1020110104828A
公开(公告)日：2011-09-23
申请号：KR1020100023948
申请日：2010-03-17
Applicant: 충남대학교산학협력단
CPC classification number: B01J19/087 , B01J2219/0894
Abstract: 본 발명은 소재를 플라즈마 처리하는 단계를 포함하는 양친매성 소재의 제조방법에 관한 것이다.
본 발명에 따르면, 소재의 플라즈마 처리를 통하여 다른 표면 변형 첨가물 및 정밀반응 없이 친수성 및 친유성을 함께 갖는 양친매성 소재를 제조함으로써, 낮은 비용으로 다양한 기술분야에 적용 가능한 양친매성 소재를 제조할 수 있는 효과가 있다.-
22.发明公开정용매 및 부용매 혼합물을 이용한 폴리머 기재 표면의 조직 제어 및 소수성 향상을 위한 방법 无效通过使用良好溶剂和不良溶剂的混合物控制聚合物底物表面的形态和改善聚合物底物表面的疏水性的方法
公开(公告)号：KR1020100082665A
公开(公告)日：2010-07-19
申请号：KR1020090002058
申请日：2009-01-09
Applicant: 충남대학교산학협력단
Inventor： 최호석
IPC: C08J7/12 , C08J7/02 , C08L101/00
Abstract: PURPOSE: A method for controlling the structure of the surface of a polymer substrate, and improving the hydrophobicity of the surface are provided to use a good solvent and poor solvent mixture treatment method. CONSTITUTION: A method for improving the hydrophobicity of the surface of a polymer substrate comprises the following steps: diluting a pure good solvent with a pure poor solvent; dipping the polymer substrate into the mixture; and drying the polymer substrate. The volume ratio of the good solvent and the poor solvent is 1~100:100~1. The polymer substrate is dipped into the mixture for 0.0001~24 hours at -20~100 deg C.
Abstract translation: 目的：提供一种控制聚合物基材表面结构，提高表面疏水性的方法，以使用良溶剂和不良溶剂混合物处理方法。 构成：改善聚合物基材表面的疏水性的方法包括以下步骤：用纯的不良溶剂稀释纯的良溶剂; 将聚合物基材浸入混合物中; 并干燥聚合物基材。 良溶剂和不良溶剂的体积比为1〜100：100〜1。 将聚合物基材在-20〜100℃下浸入混合物中0.0001〜24小时
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公开(公告)号：KR102026144B1
公开(公告)日：2019-09-27
申请号：KR1020190043756
申请日：2019-04-15
Applicant: 충남대학교산학협력단
IPC: H01M4/92 , H01M8/1011 , B01J21/18 , B01J23/42 , B01J23/44
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公开(公告)号：KR20180058695A
公开(公告)日：2018-06-01
申请号：KR20180058761
申请日：2018-05-24
Applicant: 충남대학교산학협력단
Abstract: 본발명은균일한형상의금속나노입자가고분자매트릭스내에고르게분산되어있는금속나노입자-고분자복합체박막의제조방법에관한것으로, 보다상세하게는 (A) 이온성액체와폴리에틸렌옥사이드의혼합물을제조하는단계; (B) 상기혼합물에금속나노입자의전구체를용해시켜반응액을제조하는단계; (C) 상기반응액의계면에플라즈마를가하여기-액계면에금속나노입자-고분자복합체박막을형성시키는단계; 및 (D) 상기금속나노입자-고분자복합체박막을반응액으로부터분리하는단계;를포함하는것을특징으로하는금속나노입자-고분자복합체박막의제조방법에관한것이다.
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Patent Agency Ranking
公开(公告)号：KR101862827B1
公开(公告)日：2018-05-31
申请号：KR1020170071718
申请日：2017-06-08
Applicant: 충남대학교산학협력단
Abstract: 본발명은균일한형상의금속나노입자가고분자매트릭스내에고르게분산되어있는금속나노입자-고분자복합체박막의제조방법에관한것으로, 보다상세하게는 (A) 이온성액체와폴리에틸렌옥사이드의혼합물을제조하는단계; (B) 상기혼합물에금속나노입자의전구체를용해시켜반응액을제조하는단계; (C) 상기반응액의계면에플라즈마를가하여기-액계면에금속나노입자-고분자복합체박막을형성시키는단계; 및 (D) 상기금속나노입자-고분자복합체박막을반응액으로부터분리하는단계;를포함하는것을특징으로하는금속나노입자-고분자복합체박막의제조방법에관한것이다.
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公开(公告)号：KR101792832B1
公开(公告)日：2017-11-20
申请号：KR1020140148118
申请日：2014-10-29
Applicant: 충남대학교산학협력단
IPC: C08J5/22 , C08J3/28 , C08G65/48 , H01M10/0565
CPC classification number: C08J3/28 , C08J5/2256 , C08J2371/02 , C08K5/19 , C08L71/02 , H01M10/0565 , H01M2300/0045 , H01M2300/0082 , H01M2300/0085
Abstract: 본발명은열특성이우수하여겔 고분자전해질의메트릭스에적합한플라즈마고분자박막의제조방법및 상기방법에의해제조된고분자박막과상기고분자박막이적용된겔 고분자전해질과이차전지에관한것으로, 보다상세하게는액상의고분자모노머계면에플라즈마를가하여중합하는것을특징으로하는플라즈마중합에의한고분자박막의제조방법및 상기방법에의해제조된고분자박막과상기고분자박막이적용된겔 고분자전해질과이차전지에관한것에관한것이다.
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公开(公告)号：KR1020130138978A
公开(公告)日：2013-12-20
申请号：KR1020120062574
申请日：2012-06-12
Applicant: 충남대학교산학협력단
CPC classification number: B22F9/20 , B22F1/0018 , B22F2202/13 , B22F2304/05
Abstract: The present invention provides a method for manufacturing metal nanoparticles attached on substrate surface by using plasma, comprising the steps of: (i) manufacturing metal nanoparticle precursor solution; (ii) coating the metal nanoparticle precursor solution on the substrate surface; (iii) drying the coated substrate surface; and (iv) plasma-processing the dried substrate surface. Furthermore, the present invention provides the metal nanoparticles attached to be dispersed on the substrate surface.
Abstract translation: 本发明提供一种通过使用等离子体制造附着在基板表面上的金属纳米颗粒的方法，包括以下步骤：（i）制造金属纳米颗粒前体溶液; （ii）将金属纳米颗粒前体溶液涂覆在基材表面上; （iii）干燥涂覆的基材表面; 和（iv）等离子体处理干燥的基材表面。 此外，本发明提供附着在分散在基板表面上的金属纳米颗粒。
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公开(公告)号：KR1020130055419A
公开(公告)日：2013-05-28
申请号：KR1020110121161
申请日：2011-11-18
Applicant: 충남대학교산학협력단
IPC: C08J7/04 , B05D1/00 , C08J3/00 , H01L21/027
CPC classification number: B05D1/005 , B05D1/60 , C08J3/005 , C08J7/045 , G03F7/16 , G03F7/168 , H01L21/0273 , H01L21/0274
Abstract: PURPOSE: A manufacturing method of a micropolymer pattern is provided to control polymer patterns according to the moderate ratio of solvent and non-solvent, based on solubility parameter of the polymer. CONSTITUTION: A manufacturing method of a micropolymer pattern on a substrate comprises a step of manufacturing a mixed solvent by diluting solvent by nonsolvent; a step of manufacturing a polymer solution by dissolving the polymer resin into the mixed liquid; and a step of coating a substrate with the polymer solution and drying the coated substrate. The solvent is acetone, acetic acid, aniline, arylamine, benzene, bromobenzene, chloroform, chloroethane, chlrorobenzene, chlorohexanol, ethylbenzene, ethoxyethane, hexane, methyl acetate, N-methyl-2-pyrrolidone, 2- pyrrolidone, pyridine, p-dioxane, tetrahydrofuran, or toluene.
Abstract translation: 目的：提供微聚合物图案的制造方法，以根据溶剂和非溶剂的中等比例，基于聚合物的溶解度参数来控制聚合物图案。 构成：基材上的微聚合物图案的制造方法包括通过非溶剂稀释溶剂来制造混合溶剂的步骤; 通过将聚合物树脂溶解在混合液中来制造聚合物溶液的步骤; 以及用聚合物溶液涂覆基材并干燥涂布的基材的步骤。 溶剂为丙酮，乙酸，苯胺，芳胺，苯，溴苯，氯仿，氯乙烷，氯苯乙烯，氯己醇，乙苯，乙氧基乙烷，己烷，乙酸甲酯，N-甲基-2-吡咯烷酮，2-吡咯烷酮，吡啶， ，四氢呋喃或甲苯。
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30.发明公开
公开(公告)号：KR1020110095662A
公开(公告)日：2011-08-25
申请号：KR1020100015254
申请日：2010-02-19
Applicant: 충남대학교산학협력단
CPC classification number: Y02E50/17 , C07H3/02 , C07H1/08 , C07H3/04 , C12P7/04 , C12P7/06 , C12P7/16 , C12P7/28 , Y02E50/10 , Y02E50/16
Abstract: PURPOSE: A method for manufacturing a saccharide material using marine algae is provided to manufacture bio-fuel. CONSTITUTION: A method for manufacturing a saccharide material comprises: a step of performing a plasma treatment of marine algae; a step of placing marine algae in a plasma reactor; a step of reducing pressure of the plasma reactor using a vacuum pump; a step of removing vapor remaining in the plasma reactor; a step of injecting electric discharge gas to the plasma reactor; a step of discharging plasma by applying 10-500 W to the plasma reactor; and a step of performing acid treatment.
Abstract translation: 目的：提供使用海藻制造糖类材料的方法来制造生物燃料。 构成：制造糖类材料的方法包括：对海藻进行等离子体处理的工序; 将海藻放置在等离子体反应器中的步骤; 使用真空泵降低等离子体反应器的压力的步骤; 去除等离子体反应器中残留的蒸气的步骤; 向等离子体反应器注入放电气体的步骤; 通过对等离子体反应器施加10-500W来排出等离子体的步骤; 和进行酸处理的步骤。
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