Abstract:
PURPOSE: A structure for a cantilever typed near field probe applicable to a head of an optical information storing device and a manufacturing method thereof are provided to maximally shorten an optical loss region on the head of the optical information storing device and improve an optical throughput needed for recording/playing the optical information more than a few thousands times of a current optical fiber probe. CONSTITUTION: A hole(11) penetrating an upper/lower part of a body is formed on a silicon substrate(10). A dielectrics thin film(20) is formed to a bottom of the silicon substrate as a mask layer. As an oxide film(40) is deposited to the upper part of the silicon substrate as the probe of a parabolic curve, an aperture(41) leading to the penetrating hole of the silicon substrate is formed on a vertex of the oxide film. As depositing on the oxide film, a near field aperture(71) leading to the aperture of the oxide film and having a high throughout is formed on a metal thin film(70).
Abstract:
PURPOSE: Josephson junction including a superconducting MgB2 thin film is provided to not only have such a uniform junction so as to be applied in an integrated circuit but also be used to make a circuit with a common refrigerator under low temperature ranging 15 to 20 K. CONSTITUTION: A bottom superconductor thin film(12) made up of MgB2 is formed on a substrate(10). A metal barrier layer(20a) is formed on the bottom superconductor thin film. A top superconductor thin film(22a) is formed on the metal barrier layer. The first capping layer is formed on the superconductor thin film to prevent diffusion of Mg. After exposing the product in the air, the first capping layer, A top superconductor thin film and barrier layer are patterned in sequence. The second capping layer(32) is formed to isolate the bottom superconductor thin film from the top superconductor thin film electrically. After patterning the first capping layer again so as to expose the top superconductor thin film, electric pads(40) and wires(42) are formed on the exposed surface of it.
Abstract:
PURPOSE: An apparatus for driving a sample holder of semiconductor fabrication equipment and an etching method using the same are provided to form smoothly an incline boundary by controlling an incident angle of ion beam and a revolution speed of a sample. CONSTITUTION: A gear teeth(11) is formed on a sample holder(10). A rotation driving portion is connected with the gear tooth(11) of the sample holder(10). A slope driving portion(30) is used for shifting the sample holder(10) as much as a predetermined angle. The rotation driving portion includes a motor(21), a gear portion(22), a driving shaft(23), the first bevel gear(24), the second bevel gear(25), and the third bevel gear(27). The slope driving portion(30) is formed with a rotary handle bar(31), a worm(33) installed at a rotary shaft(32), a horizontal gear(34), and a fixing member(36). A supply line(40) is connected with a cooling line(41) of a vacuum chamber. A flange(42) is adhered on the vacuum chamber.