도가니 보호막 제조 방법
    22.
    发明公开
    도가니 보호막 제조 방법 有权
    一种可制造保护层的方法

    公开(公告)号:KR1020130114353A

    公开(公告)日:2013-10-18

    申请号:KR1020120036625

    申请日:2012-04-09

    CPC classification number: Y02E10/50 C30B15/10 C30B11/002 C30B29/06 H01L31/042

    Abstract: PURPOSE: A method for manufacturing a crucible protecting layer is provided to improve the quality of a silicon ingot by using a mixture of water and silicon nitride. CONSTITUTION: An aqueous dispersant is coated on the inner surface of a crucible and is made of water and silicon nitride. The crucible is thermally processed at 900 to 1350 degrees centigrade. A protection layer is formed by a thermal process and is made of the silicon nitride.

    Abstract translation: 目的:提供一种用于制造坩埚保护层的方法,以通过使用水和氮化硅的混合物来改善硅锭的质量。 构成:将水性分散剂涂覆在坩埚的内表面上,并由水和氮化硅制成。 坩埚在900至1350摄氏度下热处理。 保护层由热处理形成,由氮化硅制成。

    반도체 또는 금속산화물 잉곳 제조장치
    23.
    发明公开
    반도체 또는 금속산화물 잉곳 제조장치 有权
    半导体或金属氧化物的装置

    公开(公告)号:KR1020130020082A

    公开(公告)日:2013-02-27

    申请号:KR1020110082476

    申请日:2011-08-18

    Abstract: PURPOSE: An apparatus for manufacturing semiconductor or metal oxide ingot are provided to manufacture high quality ingot by performing liquid to solid phase transition on semiconductor or a metal oxide material. CONSTITUTION: A crucible(200) accommodates semiconductor or a metal oxide material. A cooling device(400) and a first heater(310) are separated from the crucible. An insulating member is placed between the crucible and the cooling device. A moving unit changes the position of the insulating member.

    Abstract translation: 目的:提供一种用于制造半导体或金属氧化物晶锭的装置,通过在半导体或金属氧化物材料上进行液相至固相转变来制造高质量的锭料。 构成:坩埚(200)容纳半导体或金属氧化物材料。 冷却装置(400)和第一加热器(310)与坩埚分离。 在坩埚和冷却装置之间放置绝缘构件。 移动单元改变绝缘构件的位置。

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