公开(公告)号：US20190377266A1

公开(公告)日：2019-12-12

申请号：US16547933

申请日：2019-08-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Paul Corné Henri DE WIT

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.

公开(公告)号：US20180239258A1

公开(公告)日：2018-08-23

申请号：US15959115

申请日：2018-04-20

Applicant: ASML Netherlands B.V.

Inventor： Günes NAKIBOGLU ,  Suzanne Johanna Antonetta Geertruda COSIJNS ,  Anne Willemijn Bertine QUIST ,  Lukasz SOSNIAK ,  Frank Johannes Jacobus VAN BOXTEL ,  Engelbertus Antonius Fransiscus VAN DER PASCH

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

公开(公告)号：US20180224757A1

公开(公告)日：2018-08-09

申请号：US15748644

申请日：2016-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Robert Edgar VAN LEEUWEN

IPC: G03F7/20 ,  G01B11/02 ,  G01B11/26 ,  G01B9/02

CPC classification number: G03F7/70775 ,  G01B9/02061 ,  G01B11/026 ,  G01B11/26 ,  G03F7/70716 ,  G03F7/7085

Abstract: A position measurement system includes an interferometer to determine a position of an object. The interferometer is arranged to generate a first, second and third signals representative of the position by irradiating respective first, second and third areas of a reflective surface of the object. Along a line, the first and second areas are at a first distance relative to each other, the second and third areas are at a second distance relative to each other, and the first and third areas are at a third distance relative to each other. The interferometer is arranged to provide a rotation signal representative of a rotation of the object along an axis based on the first, second and third signals. The axis is parallel to the reflective surface and perpendicular to the line.

公开(公告)号：US20180164705A1

公开(公告)日：2018-06-14

申请号：US15894223

申请日：2018-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Peter Paul STEIJAERT ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Franciscus VAN DE MAST

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet,

公开(公告)号：US20160223917A1

公开(公告)日：2016-08-04

申请号：US15077439

申请日：2016-03-22

Applicant: ASML NETHERLANDS B.V

Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Andre Bernardus JEUNINK ,  Robbert Edgar VAN LEEUWEN ,  Emiel Jozef Melanie EUSSEN

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

Abstract: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

Abstract translation: 一种测量系统，被配置为测量对象台的与位置相关的信号，所述测量系统包括可安装在所述对象台上的至少一个传感器和可安装在基本上固定的框架上的传感器目标对象;以及安装装置，其被配置为安装所述传感器目标 物体在基本上固定的框架上，其中测量系统还包括补偿器，其被配置为补偿传感器目标物体相对于基本上固定的框架的运动和/或变形。 补偿器可以包括无源或主动阻尼器和/或反馈位置控制器。 在替代实施例中，补偿器包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。