公开(公告)号：US20190214318A1

公开(公告)日：2019-07-11

申请号：US16328319

申请日：2017-08-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Mark John MASLOW ,  Johannes Catharinus Hubertus MULKENS ,  Peter TEN BERGE ,  Franciscus VAN DE MAST ,  Jan-Willem GEMMINK ,  Liesbeth REIJNEN

IPC: H01L21/66 ,  G03F7/36 ,  G03F7/20 ,  H01L21/311 ,  H01L21/67

CPC classification number: H01L22/20 ,  G03F7/36 ,  G03F7/70616 ,  G03F7/70683 ,  H01L21/31105 ,  H01L21/31144 ,  H01L21/67253

Abstract: A substrate, including a substrate layer; and an etchable layer on the substrate layer, the etchable layer including a patterned region thereon or therein and including a blank region of sufficient size to enable a bulk etch rate of an etch tool for etching the blank region to be determined.

公开(公告)号：US20180164705A1

公开(公告)日：2018-06-14

申请号：US15894223

申请日：2018-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Peter Paul STEIJAERT ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Franciscus VAN DE MAST

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet,

公开(公告)号：US20150185624A1

公开(公告)日：2015-07-02

申请号：US14657772

申请日：2015-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Peter Paul STEIJAERT ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Franciscus VAN DE MAST

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

Abstract translation: 一种光刻设备，其具有第一出口以向至少部分传感器光束路径提供具有第一流动特性的热调节流体，以及与第一出口相关联的第二出口并提供具有第二流动特性的热调节流体， 与第一流动特性不同，邻近来自第一出口的热调节流体。

公开(公告)号：US20190235398A1

公开(公告)日：2019-08-01

申请号：US16284089

申请日：2019-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Peter Paul STEIJAERT ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Franciscus VAN DE MAST

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.