公开(公告)号：US20150185624A1

公开(公告)日：2015-07-02

申请号：US14657772

申请日：2015-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Peter Paul STEIJAERT ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Franciscus VAN DE MAST

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

Abstract translation: 一种光刻设备，其具有第一出口以向至少部分传感器光束路径提供具有第一流动特性的热调节流体，以及与第一出口相关联的第二出口并提供具有第二流动特性的热调节流体， 与第一流动特性不同，邻近来自第一出口的热调节流体。

公开(公告)号：US20190235398A1

公开(公告)日：2019-08-01

申请号：US16284089

申请日：2019-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Peter Paul STEIJAERT ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Franciscus VAN DE MAST

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

公开(公告)号：US20180164705A1

公开(公告)日：2018-06-14

申请号：US15894223

申请日：2018-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Peter Paul STEIJAERT ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Franciscus VAN DE MAST

IPC: G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608 ,  G03F7/70683 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70908

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet,

公开(公告)号：US20170052463A1

公开(公告)日：2017-02-23

申请号：US15306982

申请日：2015-03-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Gerardus Arnoldus Hendricus Franciscus JANSSEN ,  Martijn VAN BAREN

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/677

CPC classification number: G03F7/70875 ,  G03F7/7075 ,  G03F7/708 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70866 ,  H01L21/67 ,  H01L21/6719 ,  H01L21/67196 ,  H01L21/67265 ,  H01L21/67742

Abstract: A substrate handling system includes: a thermal shield for thermally insulating a space through which a substrate passes, from a thermal load originating outside the space, the thermal shield including: a first wall and a second wall with a gap therebetween, the first wall positioned between the space and the second wall; an inlet opening configured to allow a flow of gas from a gas source to enter the gap from outside the space; and an outlet opening configured to allow the flow of gas to exit the gap to outside of the space, wherein the system is configured to direct the flow of gas to enter the gap through the inlet opening, to flow through the gap and out of the gap to outside the space through the outlet opening thereby to reduce thermal fluctuations in the space due to the thermal load originating outside the space.

Abstract translation: 一种基板处理系统，包括：热屏蔽件，用于将基板通过的空间从发生在该空间外部的热负载热绝缘，所述热屏蔽包括：第一壁和第二壁，其间具有间隙，所述第一壁定位 在空间和第二个墙之间; 入口开口，其构造成允许来自气体源的气体流从所述空间外部进入所述间隙; 以及出口开口，其构造成允许气体流动离开所述间隙到所述空间的外部，其中所述系统被配置为引导气体流通过所述入口开口进入所述间隙，以流过所述间隙并离开所述间隙 通过出口开口到空间外部的间隙，由此由于源自空间外的热负荷而减小空间中的热波动。