公开(公告)号：US20150092171A1

公开(公告)日：2015-04-02

申请号：US14396027

申请日：2013-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70191 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/70825

Abstract: A lithographic apparatus includes a patterning device support to support a patterning device to form a patterned radiation beam, the patterning device support including a moveable structure movably arranged with respect to an object, a patterning device holder movably arranged relative to the movable structure and holding the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder relative to the movable structure; a substrate support to hold a substrate; and a projection system to project the patterned radiation beam onto the substrate, a position measurement system for measuring a substrate positional error which is a difference between a desired position and an actual position of the substrate relative to a reference object; and a controller to move the actuator and the ultra short stroke actuator based on the substrate positional error.

Abstract translation: 光刻设备包括图案形成装置支撑件以支撑图案形成装置以形成图案化的辐射束，图案形成装置支撑件包括相对于物体可移动地布置的可移动结构，相对于可移动结构可移动地布置并保持 图案形成装置，用于相对于物体移动可移动结构的致动器和超短行程致动器，用于相对于可移动结构移动图案形成装置保持器; 用于保持基板的基板支撑件; 以及用于将图案化的辐射束投影到基板上的投影系统，用于测量基板位置误差的位置测量系统，所述基板位置误差是所述基板相对于参考物体的期望位置和实际位置之间的差值; 以及基于基板位置误差来移动致动器和超短行程致动器的控制器。

公开(公告)号：US11940739B2

公开(公告)日：2024-03-26

申请号：US17562446

申请日：2021-12-27

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Marinus Petrus Reijnders

IPC: G03F7/20 ,  G01N21/956 ,  G03F7/00

CPC classification number: G03F7/70625 ,  G01N21/956 ,  G03F7/7015 ,  G03F7/70633

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US11880144B2

公开(公告)日：2024-01-23

申请号：US17603812

申请日：2020-03-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Sander Jeroen Hermanussen ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Hans Butler ,  Bas Jansen ,  Michael Marinus Anna Steur

IPC: G03F7/00 ,  H01L21/687

CPC classification number: G03F7/70725 ,  G03F7/70708 ,  G03F7/70783 ,  H01L21/6875 ,  H01L21/68735 ,  H01L21/68785

Abstract: An object table configured to hold an object on a holding surface, the object table including: a main body; a plurality of burls extending from the main body, end surfaces of the burls defining the holding surface; an actuator assembly; and a further actuator assembly, wherein the actuator assembly is configured to deform the main body to generate a long stroke out-of-plane deformation of the holding surface based on shape information of the object that is to be held and the further actuator assembly is configured to generate a short stroke out-of-plane deformation of the holding surface.

公开(公告)号：US11561479B2

公开(公告)日：2023-01-24

申请号：US17428223

申请日：2020-01-03

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Bas Jansen ,  Cornelius Adrianus Lambertus De Hoon

IPC: G03F7/20 ,  G01D3/032 ,  G01P15/09 ,  G01P21/00

Abstract: The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: a) a damping circuit configured to: —receive an acceleration signal from the piezoelectric element; —electronically dampen an amplitude of the first mechanical resonance frequency; and—generate a damped acceleration signal, b) an extender configured to: —receive the damped acceleration signal; —extend the frequency response; and—output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.

公开(公告)号：US11269262B2

公开(公告)日：2022-03-08

申请号：US17049719

申请日：2019-04-04

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Joep Sander De Beer ,  Cornelius Adrianus Lambertus De Hoon ,  Jeroen Pieter Starreveld ,  Martinus Van Duijnhoven ,  Maurice Willem Jozef Etiënne Wijckmans

IPC: G03F7/20

Abstract: A lithographic apparatus or frame assembly, comprising: a first and second pneumatic support, being arranged to control position of a frame, each of said pneumatic supports accommodating a pressure chamber; a frame position control system, comprising; a first position sensor device, configured to generate measurement data relating to the position of the frame; a first pressure controller, configured to control the pressure in the pressure chamber of the first pneumatic support on the basis of the measurement data generated by the first position sensor device; a pressure differential sensor device, configured to generate data relating to the difference between the pressure in the pressure chambers of the first and the second pneumatic support; a second pressure controller, configured to control the pressure in the pressure chamber of the second pneumatic support on the basis of the measurement data from the pressure differential sensor device.

公开(公告)号：US11169450B2

公开(公告)日：2021-11-09

申请号：US17050264

申请日：2019-03-18

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Joep Sander De Beer ,  Cornelius Adrianus Lambertus De Hoon ,  Jeroen Pieter Starreveld ,  Martinus Van Duijnhoven ,  Maurice Willem Jozef Etiënne Wijckmans

IPC: G03F7/20

Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

公开(公告)号：US10962890B2

公开(公告)日：2021-03-30

申请号：US16959738

申请日：2018-11-29

Applicant: ASML Netherlands B.V.

Inventor： Wilhelmus Franciscus Johannes Simons ,  Dave Braaksma ,  Hans Butler ,  Hendrikus Herman Marie Cox ,  René Wilhelmus Antonius Hubertus Leenaars ,  Stephan Christiaan Quintus Libourel ,  Martinus Van Duijnhoven ,  Maurice Willem Jozef Etiënne Wijckmans

IPC: G03F7/20

Abstract: The present invention relates to a positioning system, including: a first actuator to exert an actuation force on a moveable body, the first actuator being coupled to a balance mass configured to absorb a reaction force resulting from the actuation force, the actuation force providing an acceleration of the moveable body and the reaction force providing an acceleration of the balance mass, wherein a force resulting from the acceleration of the moveable body together with a force resulting from the acceleration of the balance mass result in a balance mass torque; a balance mass support to support the balance mass onto a frame, which balance mass support engages the frame at a support position; and a torque compensator; wherein the torque compensator exerts a compensation force to compensate the balance mass torque, and wherein the torque compensator exerts the compensation force on the frame at the support position.

公开(公告)号：US10191392B2

公开(公告)日：2019-01-29

申请号：US15324264

申请日：2015-07-10

Applicant: ASML Netherlands B.V.

Inventor： Johannes Adrianus Antonius Theodorus Dams ,  Dirk Hendrikus Marinus Engelen ,  Peter Michel Silvester Maria Heijmans ,  Simon Bernardus Cornelis Maria Martens ,  Hans Butler ,  Antonius Franciscus Johannes De Groot

IPC: G03F7/20 ,  H02K41/03 ,  H02K11/21 ,  H02K11/30 ,  H02K15/06

Abstract: An actuator includes coil assemblies arranged in an array, wherein each coil assembly defines a core chamber having a core chamber height; and at least one magnetic member that extends partly along the core chamber height of the core chamber of a corresponding at least one coil assembly, wherein the at least one magnetic member is made of a magnetic material. A shape of the at least one magnetic member, a size of the at least one magnetic member, a position of the at least one magnetic member and/or the magnetic material of the at least one magnetic member may be selected so as to control one or more parameters of the actuator.

公开(公告)号：US10180629B2

公开(公告)日：2019-01-15

申请号：US15385584

申请日：2016-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri Lof ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Aleksey Yurievich Kolesnychenko ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Johannes Catherinus Hubertus Mulkens ,  Roelof Aeilko Siebranc Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Erik Theodorus Maria Bijlaart ,  Christian Alexander Hoogendam ,  Helmar Van Santen ,  Marcus Adrianus Van De Kerkhof ,  Mark Kroon ,  Arie Jeffrey Den Boef ,  Joost Jeroen Ottens ,  Jeroen Johannes Sophia Maria Mertens

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US10120293B2

公开(公告)日：2018-11-06

申请号：US15028676

申请日：2014-09-25

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Ramidin Izair Kamidi ,  Yanin Kasemsinsup

IPC: G03B27/58 ,  G03F7/20 ,  G01B9/02 ,  G01B11/00

Abstract: An object positioning system includes an object; a measurement system to measure the position of the object, wherein each sensor of the measurement system has an associated measurement area on the object and wherein a location of at least one measurement area on the object is dependent on the position of the object; an actuator system to position the object; a control system configured to drive the actuator system, wherein the control system includes an observer with a dynamic model of the object to estimate an internal dynamic behavior of the object, wherein the dynamic model includes the dependency of the location of at least one measurement area on the position of the object, and wherein the control system is configured to drive the actuator system in dependency of an output of the observer.