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公开(公告)号：US20180088467A1
公开(公告)日：2018-03-29
申请号：US15567191
申请日：2016-04-18
Applicant: ASML Netherlands B.V.
Inventor： Johannes Jacobus Matheus BASELMANS , Pieter Bart Aloïs DE BUCK , Nico VANROOSE , Giovanni IMPONENTE , Roland Johannes Wilhelmus STAS , Chanpreet KAUR , James Robert DOWNES
CPC classification number: G03F7/706 , G01M11/0242 , G01M11/0257 , G03F7/70866
Abstract: A method comprising illuminating a patterning device (MA′) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.
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公开(公告)号：US20180039180A1
公开(公告)日：2018-02-08
申请号：US15788860
申请日：2017-10-20
Applicant: ASML Netherlands B.V.
Inventor： Jaqueline BORGES NICOLAU , Hannah NOBLE , Johannes Jacobus Matheus BASELMANS , Bart SMEETS , Paulus Jacobus Maria VAN ADRICHEM
CPC classification number: G03F7/70425 , G03F7/2026 , G03F7/70258 , G03F7/70433 , G03F7/705 , G03F7/70566 , G03F7/706 , G06T5/00
Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.
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公开(公告)号：US20170357159A1
公开(公告)日：2017-12-14
申请号：US15527254
申请日：2015-11-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Nick KANT , Nico VANROOSE , Johannes Jacobus Matheus BASELMANS
CPC classification number: G03F7/706 , G01M11/0242 , G03F7/20 , G03F7/70258 , G03F7/70308 , G03F7/705
Abstract: A method of reducing an aberration of a lithographic apparatus, the method including measuring the aberration, taking the measured aberration into account, estimating a state of the lithographic apparatus, calculating a correction using the estimated state, and applying the correction to the lithographic apparatus.
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公开(公告)号：US20170315450A1
公开(公告)日：2017-11-02
申请号：US15653380
申请日：2017-07-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle MULDER , Johannes Jacobus Matheus BASELMANS , Adrianus Franciscus Petrus ENGELEN , Markus Franciscus Antonius EURLINGS , Hendrikus Robertus Marie VAN GREEVENBROEK , Paul VAN DER VEEN , Patricius Aloysius Jacobus TINNEMANS , Wilfred Edward ENDENDIJK
IPC: G03F7/20
CPC classification number: G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
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公开(公告)号：US20170269483A1
公开(公告)日：2017-09-21
申请号：US15614542
申请日：2017-06-05
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
Abstract: An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.
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Patent Agency Ranking
公开(公告)号：US20170153557A1
公开(公告)日：2017-06-01
申请号：US15431440
申请日：2017-02-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Felix Godfried Peter PEETERS , Bob STREEFKERK , Franciscus Johannes Herman Maria TEUNISSEN , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
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公开(公告)号：US20160004171A1
公开(公告)日：2016-01-07
申请号：US14839633
申请日：2015-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Richard Joseph BRULS , Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Ronald Walther Jeanne SEVERIJNS , Sergei SHULEPOV , Herman BOOM , Timotheus Franciscus SENGERS
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：US20140293248A1
公开(公告)日：2014-10-02
申请号：US14261208
申请日：2014-04-24
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT AG
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Adrianus Franciscus Petrus ENGELEN , Jozef Maria FINDERS , Paul GRÄUPNER , Johannes Catharinus Hubertus MULKENS , Jan Bernard Plechelmus VAN SCHOOT
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70333
Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Abstract translation: 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。
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29.发明公开公开(公告)号：US20240288747A1
公开(公告)日：2024-08-29
申请号：US18572750
申请日：2022-08-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Mahesh Upendra AJGAONKAR , Amir ABDOLVAND , Willem Richard PONGERS , Johannes Jacobus Matheus BASELMANS , Yougfeng NI
CPC classification number: G02F1/365 , G02F1/3528 , G02F2202/32
Abstract: Radiation source assembly and method for generating broadband radiation by spectral broadening. The radiation source assembly includes a pump assembly configured to provide broadband input radiation. The pump assembly includes a pump source configured to provide first radiation at a pump wavelength, and a broadband assembly configured to provide second radiation including a continuous wavelength range, wherein the first radiation and the second radiation form the broadband input radiation. The radiation source assembly further includes an optical fibre configured to receive the broadband input radiation. The optical fibre includes a core configured along at least a part of the length of the fibre to guide the received broadband input radiation during propagation through the fibre, so as to generate broadband radiation by spectral broadening to be output by the fibre.
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公开(公告)号：US20240219843A1
公开(公告)日：2024-07-04
申请号：US18532977
申请日：2023-12-07
Applicant: ASML Netherlands B.V.
Inventor： Johannes Jacobus Matheus BASELMANS , Duan-Fu Stephen HSU , Willem Jan BOUMAN , Frank Jan TIMMERMANS , Marie-Claire VAN LARE
IPC: G03F7/00
CPC classification number: G03F7/70308
Abstract: Apparatuses and techniques for suppressing a zeroth order portion of a configured radiation beam. In some embodiments, an extreme ultraviolet (EUV) lithographic apparatus for forming an image on a substrate by use of an EUV radiation beam that is configured by a patterning device comprising a pattern of reflective regions and partially reflective regions, wherein the partially reflective regions are configured to suppress and apply a phase shift to a portion of the EUV radiation beam, may include a projection system. The projection system may be configured to suppress a zeroth order portion of a configured EUV radiation beam, and direct an unsuppressed portion of a configured EUV radiation beam towards a substrate to form an image on the substrate.
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