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    LITHOGRAPHIC APPARATUS AND METHOD
    1.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 有权
    LITHOGRAPHIC设备和方法

    公开(公告)号：US20160116848A1

    公开(公告)日：2016-04-28

    申请号：US14988944

    申请日：2016-01-06

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Heine Melle MULDER ,  Johannes Jacobus Matheus BASELMANS ,  Adrianus Franciscus Petrus ENGELEN ,  Markus Franciscus Antonius EURLINGS ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Paul VAN DER VEEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Wilfred Edward ENDENDIJK

    IPC: G03F7/20

    CPC classification number: G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

    Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

    Abstract translation: 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。

    METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS COMPRISING THE RADIATION SOURCE
    2.
    发明申请
    METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS COMPRISING THE RADIATION SOURCE 有权
    控制辐射源的方法和包含辐射源的光刻设备

    公开(公告)号：US20160070179A1

    公开(公告)日：2016-03-10

    申请号：US14787738

    申请日：2014-04-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Wilhelmus Patrick Elisabeth Maria OP 'T ROOT ,  Adrianus Leonardus Gertrudus BOMMER ,  Robert DE JONG ,  Frank EVERTS ,  Herman Philip GODFRIED ,  Roland Pieter STOLK ,  Paul VAN DER VEEN

    IPC: G03F7/20

    CPC classification number: G03F7/70558 ,  G03F7/70025 ,  G03F7/70516 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/225

    Abstract: A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.

    Abstract translation: 选择要施加到辐射源的变量的周期性调制的方法，其中所述源传送用于投影到衬底上的辐射，并且其中以扫描速度存在所述衬底和所述辐射之间的相对运动，所述方法包括： 一组系统参数和用于基板上的位置的计算量，所述数量是对从应用于源的变量的调制产生的递送到位置的能量剂量的贡献的度量的量，其中贡献 能量剂量被计算为卷积：辐射曲线和对源发射的辐射的辐照度的贡献; 并且选择用于所述一组系统参数的量和所述基板上的位置的所述调制频率满足一定的标准。

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