-
1.发明申请公开(公告)号：US20180046090A1
公开(公告)日：2018-02-15
申请号：US15791317
申请日：2017-10-23
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70608 , G03F7/70808 , G03F7/70858
Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
-
公开(公告)号：US20170242347A1
公开(公告)日：2017-08-24
申请号：US15448438
申请日：2017-03-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
-
公开(公告)号：US20160124321A1
公开(公告)日：2016-05-05
申请号：US14993810
申请日：2016-01-12
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70608 , G03F7/70808 , G03F7/70858
Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
Abstract translation: 在浸没式光刻装置中，其中浸没液体被供应到局部空间，该空间基本上平行于基底平面呈多边形。 在一个实施例中，空间的两个角部具有不大于构造成容纳液体的空间与构造成不含液体的周围之间的过渡区域的宽度的曲率半径。
-
公开(公告)号：US20150338748A1
公开(公告)日：2015-11-26
申请号：US14816997
申请日：2015-08-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Joeri LOF , Erik Roelof LOOPSTRA , Johannes Catharinus Hubertus MULKENS , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Alexander STRAAIJER , Bob STREEFKERK
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
Abstract translation: 光刻投影装置包括被配置为保持图案形成装置的支撑结构，所述图案形成装置被配置为根据期望的图案对辐射束进行图案化; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 液体供应系统，被配置为向所述投影系统和所述基板之间的空间提供液体; 以及快门，被配置为隔离所述基板的空间或被基板占据的空间。
-
公开(公告)号：US20180081282A1
公开(公告)日：2018-03-22
申请号：US15823188
申请日：2017-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Felix Godfried Peter PEETERS , Bob STREEFKERK , Franciscus Johannes Herman Maria TEUNISSEN , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
-
Patent Agency Ranking
公开(公告)号：US20160342098A1
公开(公告)日：2016-11-24
申请号：US15225586
申请日：2016-08-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Roelof Frederik DE GRAAF , Hans JANSEN , Bauke JANSEN , Hubertus Leonardus Franciscus HEUSSCHEN
IPC: G03F7/20
CPC classification number: G03F7/70925 , G03F7/70341 , G03F7/7085
Abstract: A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.
-
公开(公告)号：US20160070178A1
公开(公告)日：2016-03-10
申请号：US14941320
申请日：2015-11-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Timotheus Franciscus SENGERS , Sjoerd Nicolaas Lambertus DONDERS , Hans JANSEN , Arjen BOOGAARD
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70591 , G03F7/7085 , G03F7/7095
Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
-
公开(公告)号：US20150323875A1
公开(公告)日：2015-11-12
申请号：US14714944
申请日：2015-05-18
Applicant: ASML Netherlands B.V.
Inventor： Roelof Frederik DE GRAAF , Hans JANSEN , Bauke JANSEN , Hubertus Leonardus Franciscus HEUSSCHEN
IPC: G03F7/20
CPC classification number: G03F7/70925 , G03F7/70341 , G03F7/7085
Abstract: A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.
Abstract translation: 光刻系统包括浸没型光刻设备，其包括构造和布置成支撑衬底的支撑件，构造和布置成将图案化的辐射束投影到衬底的目标部分上的投影系统，配置为 用浸没液体至少部分地填充所述投影系统与所述基板和支撑体中的至少一个之间的空间，布置成将所述浸没液体提供给所述液体限制结构的液体供应系统，以及布置成提供清洁 液体流到与浸没液接触的光刻设备的表面。 该系统包括将洗涤液直接提供给液体限制结构并通过液体净化系统将浸液液体间接提供给液体限制结构的开关。
-
公开(公告)号：US20140335457A1
公开(公告)日：2014-11-13
申请号：US14444833
申请日：2014-07-28
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70608 , G03F7/70808 , G03F7/70858
Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
Abstract translation: 在浸没式光刻装置中，其中浸没液体被供应到局部空间，该空间基本上平行于基底平面呈多边形。 在一个实施例中，空间的两个角部具有不大于构造成容纳液体的空间与构造成不含液体的周围之间的过渡区域的宽度的曲率半径。
-
10.发明申请公开(公告)号：US20190258174A1
公开(公告)日：2019-08-22
申请号：US16398767
申请日：2019-04-30
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
-
-
-
-
-
-
-
-
-
Search Results
33
records
(took 0.049 seconds)
