公开(公告)号：US20170248854A1

公开(公告)日：2017-08-31

申请号：US15470491

申请日：2017-03-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US20170212432A1

公开(公告)日：2017-07-27

申请号：US15483410

申请日：2017-04-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Martinus Hendrikus Antonius LEENDERS ,  Nicolaas Rudolf KEMPER ,  Joost Jeroen OTTENS

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

公开(公告)号：US20150355556A1

公开(公告)日：2015-12-10

申请号：US14831663

申请日：2015-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Martinus Hendrikus Antonius LEENDERS ,  Nicolaas Rudolf KEMPER ,  Joost Jeroen OTTENS

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

Abstract translation: 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。

公开(公告)号：US20150055104A1

公开(公告)日：2015-02-26

申请号：US14473795

申请日：2014-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Sjoerd Nicolaas Lambertus DONDERS ,  Bob Streefkerk ,  Martinus Hendrikus Antonius LEENDERS

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.

Abstract translation: 公开了一种浸没式光刻设备，其中液体被供应到投影系统和基板之间的空间，并且提供板结构以将空间分成两部分。 板结构具有允许透射投影光束的孔，其中具有通孔，以减少板的存在的阻尼效果，并且可选地具有一个或多个入口和出口以提供围绕板的孔的各种流动。 本发明的实施例可以减少污染物的输送，杂散光，温度梯度和/或气泡对成像质量的影响。