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公开(公告)号：US20190339623A1
公开(公告)日：2019-11-07
申请号：US16511809
申请日：2019-07-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Michel RIEPEN
IPC: G03F7/20
Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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公开(公告)号：US20170031250A1
公开(公告)日：2017-02-02
申请号：US15293009
申请日：2016-10-13
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Stefan Philip Christiaan BELFROID , Johannes Petrus Maria SMEULERS , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US20160026085A1
公开(公告)日：2016-01-28
申请号：US14871795
申请日：2015-09-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
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公开(公告)号：US20140375973A1
公开(公告)日：2014-12-25
申请号：US14484076
申请日：2014-09-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
Abstract translation: 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。
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公开(公告)号：US20170212422A1
公开(公告)日：2017-07-27
申请号：US15482587
申请日：2017-04-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Paulus Martinus Maria LIEBREGTS , Jeroen Johannes Sophia Maria MERTENS , Jan-Gerard Cornelis VAN DER TOORN , Michel RIEPEN
IPC: G03F7/20 , H01L21/67 , G03F7/30 , H01L21/027
CPC classification number: G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
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Patent Agency Ranking
公开(公告)号：US20170045831A1
公开(公告)日：2017-02-16
申请号：US15333044
申请日：2016-10-24
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Joost Jeroen OTTENS , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Marco POLIZZI , Edwin Augustinus Matheus VAN GOMPEL , Johannes Petrus Maria SMEULERS , Stefan Philip Christiaan BELFROID , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US20150323876A1
公开(公告)日：2015-11-12
申请号：US14806395
申请日：2015-07-22
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Joost Jeroen OTTENS , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Marco POLIZZI , Edwin Augustinus Matheus VAN GOMPEL , Johannes Petrus Maria SMEULERS , Stefan Philip Christiaan BELFROID , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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公开(公告)号：US20150109593A1
公开(公告)日：2015-04-23
申请号：US14586518
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Antonius Johannus VAN DER NET , Franciscus Johannes Herman Maria TEUNISSEN , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Edwin VAN GOMPEL
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
Abstract translation: 公开了一种光刻设备，其包括液体供应系统，该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间，出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物， 液体供应系统和基材，以及构造成通过出口抽出混合物的抽空系统，排气系统具有分离器箱，其布置成将液体与混合物中的气体分离，分离器箱压力控制器连接到非液体 分离罐的填充区域，被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号：US20180039188A1
公开(公告)日：2018-02-08
申请号：US15694537
申请日：2017-09-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Antonius Johannus VAN DER NET , Franciscus Johannes Herman Maria TEUNISSEN , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Edwin Augustinus Matheus VAN GOMPEL
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
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公开(公告)号：US20170357165A1
公开(公告)日：2017-12-14
申请号：US15687938
申请日：2017-08-28
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Nicolaas Rudolf KEMPER , Henrikus Herman Marie COX , Sjored Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEULEN , Franciscus Johannes Herman Maria TEUNISSEN , Jan-Gerard Cornelis VAN DER TOORN , Martinus Cornelis Maria VERHAGEN , Stefan Philip Christiaan BELFROID , Johannes Petrus Maria SMEULERS , Herman VOGEL
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
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