公开(公告)号：US20190179232A1

公开(公告)日：2019-06-13

申请号：US16276861

申请日：2019-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Ferdy MIGCHELBRINK ,  Elmar EVERS

IPC: G03F7/20

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US20190079419A1

公开(公告)日：2019-03-14

申请号：US16188216

申请日：2018-11-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Martinus Hendrikus Antonius LEENDERS ,  Nicolaas Rudolf KEMPER ,  Joost Jeroen OTTENS

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

公开(公告)号：US20180292762A1

公开(公告)日：2018-10-11

申请号：US16008355

申请日：2018-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Nicolaas TEN KATE ,  Joost Jeroen OTTENS ,  Marcel BECKERS ,  Marco POLIZZI ,  Michel RIEPEN ,  Anthonie KUIJPER ,  Koen STEFFENS ,  Adrianes Johannes BAETEN ,  Anca Mihaela ANTONEVICI

IPC: G03F7/20 ,  B01D19/00

Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

公开(公告)号：US20180081285A1

公开(公告)日：2018-03-22

申请号：US15824686

申请日：2017-11-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Nicolaas Rudolf KEMPER ,  Ferdy MIGCHELBRINK ,  Elmar EVERS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US20170045831A1

公开(公告)日：2017-02-16

申请号：US15333044

申请日：2016-10-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie COX ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Joost Jeroen OTTENS ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martinus Cornelis Maria VERHAGEN ,  Marco POLIZZI ,  Edwin Augustinus Matheus VAN GOMPEL ,  Johannes Petrus Maria SMEULERS ,  Stefan Philip Christiaan BELFROID ,  Herman VOGEL

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20150323876A1

公开(公告)日：2015-11-12

申请号：US14806395

申请日：2015-07-22

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie COX ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Martinus Hendrikus Antonius LEENDERS ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Joost Jeroen OTTENS ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martinus Cornelis Maria VERHAGEN ,  Marco POLIZZI ,  Edwin Augustinus Matheus VAN GOMPEL ,  Johannes Petrus Maria SMEULERS ,  Stefan Philip Christiaan BELFROID ,  Herman VOGEL

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20180188661A1

公开(公告)日：2018-07-05

申请号：US15904946

申请日：2018-02-26

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Marco Polizzi ,  Edwin Augustinus Matheus Van Gompel ,  Johannes Petrus Maria Smeulers ,  Stefan Philip Christiaan Belfroid ,  Herman Vogel

IPC: G03F7/20

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

公开(公告)号：US20170031250A1

公开(公告)日：2017-02-02

申请号：US15293009

申请日：2016-10-13

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf KEMPER ,  Henrikus Herman Marie COX ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Jeroen Johannes Sophia Maria MERTENS ,  Frits VAN DER MEULEN ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Jan-Gerard Cornelis VAN DER TOORN ,  Martinus Cornelis Maria VERHAGEN ,  Stefan Philip Christiaan BELFROID ,  Johannes Petrus Maria SMEULERS ,  Herman VOGEL

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。

公开(公告)号：US20160306283A1

公开(公告)日：2016-10-20

申请号：US15196120

申请日：2016-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Daniel Jozef Maria DIRECKS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas Rudolf KEMPER ,  Danny Maria Hubertus PHILIPS ,  Michel RIEPEN ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Adrianes Johannes BAETEN ,  Fabrizio EVANGELISTA

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70991

Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.

Abstract translation: 公开了一种用于光刻设备的流体处理结构。 流体处理结构具有以平面方式排成一行的多个开口。 流体处理结构被配置为使得开口在使用中朝向相对表面定向，面对表面是基底和/或基底台。 衬底台被配置为支撑衬底。 开口线的外侧是阻尼器。 阻尼器可以具有沿着开口线变化的宽度。 阻尼器宽度限定在开口线和相对的阻尼器边缘之间。

公开(公告)号：US20160116850A1

公开(公告)日：2016-04-28

申请号：US14975412

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Nicolaas Rudolf KEMPER ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10−3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.

Abstract translation: 公开了一种浸没式光刻设备，其包括流体处理系统，该流体处理系统被配置为将浸没液体限制在投影系统的最终元件与基板和/或台之间的局部空间中，以及气体供应装置，其构造成供应具有浸入溶解度的气体 在20℃下大于5×10 -3 mol / kg的液体和与空间相邻的区域的1atm总压力。