公开(公告)号：NL2002932A1

公开(公告)日：2009-12-03

申请号：NL2002932

申请日：2009-05-27

Applicant: ASML NETHERLANDS BV

Inventor： SCHAAR MAURITS VAN DER ,  KERKHOF MARCUS VAN DE ,  MUSA SAMI

IPC: G03F7/20

公开(公告)号：DE602006005886D1

公开(公告)日：2009-05-07

申请号：DE602006005886

申请日：2006-11-17

Applicant: ASML NETHERLANDS BV

Inventor： VAN HAREN RICHARD JOHANNES ,  MUSA SAMI

IPC: G03F9/00

公开(公告)号：SG132640A1

公开(公告)日：2007-06-28

申请号：SG2006081194

申请日：2006-11-22

Applicant: ASML NETHERLANDS BV

Inventor： VAN HAREN RICHARD JOHANNES FRA ,  MUSA SAMI

Abstract: The present invention relates to alignment marks for use on substrates, the alignment marks consisting of periodic 2-dimensional arrays of structures, the spacing of the structures being smaller than an alignment beam but larger than an exposure beam and the width of the structures varying sinusoidally from one end of an array to the other.