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21.发明申请公开(公告)号：US20230062585A1
公开(公告)日：2023-03-02
申请号：US17856213
申请日：2022-07-01
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20220342199A1
公开(公告)日：2022-10-27
申请号：US17634023
申请日：2020-08-05
Applicant: ASML NETHERLANDS B.V. , IMEC v.z.w.
Inventor： Alexandre HALBACH , Nitesh PANDEY , Sebastianus Adrianus GOORDEN , Veronique ROCHUS , Luc Roger Simonne HASPESLAGH , Guilherme BRONDANI TORRI
Abstract: A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying force to the respective post to displace the respective post relative to the substrate, thereby displacing the respective mirror. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection apparatus.
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公开(公告)号：US20220334497A1
公开(公告)日：2022-10-20
申请号：US17636830
申请日：2020-07-15
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY
IPC: G03F7/20
Abstract: Disclosed is a detection apparatus for a metrology device operable to measure a parameter of interest from scattered radiation having been scattered from a sample. The detection device comprises a detector comprising an array of pixels. The array of pixels comprises imaging pixels for detecting an image from which the parameter of interest is determined, and direction detecting pixels for detecting the angle of incidence of said scattered radiation on said detector.
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24.发明申请公开(公告)号：US20200249584A1
公开(公告)日：2020-08-06
申请号：US16856128
申请日：2020-04-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Robert John SOCHA , Arie Jeffrey DEN BOEF , Nitesh PANDEY
IPC: G03F7/20 , G01N21/88 , G01B11/27 , G01N21/956
Abstract: A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.
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公开(公告)号：US20200072599A1
公开(公告)日：2020-03-05
申请号：US16558457
申请日：2019-09-03
Applicant: ASML Netherlands B.V.
Inventor： Marinus Johannes Maria VAN DAM , Arie Jeffrey DEN BOEF , Nitesh PANDEY
Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.
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Patent Agency Ranking
公开(公告)号：US20200057387A1
公开(公告)日：2020-02-20
申请号：US16540145
申请日：2019-08-14
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY
IPC: G03F7/20 , G01N21/956 , G01N21/47
Abstract: A metrology apparatus for determining a parameter of interest of a structure formed by a lithographic process on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.
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公开(公告)号：US20190072859A1
公开(公告)日：2019-03-07
申请号：US16117614
申请日：2018-08-30
Applicant: ASML Netherlands B.V.
Inventor： Martin Jacobus Johan JAK , Martin EBERT , Arie Jeffrey DEN BOEF , Nitesh PANDEY
IPC: G03F7/20
Abstract: A method comprising: evaluating a plurality of polarization characteristics associated with measurement of a metrology target of a substrate processed using a patterning process, against one or more measurement quality parameters; and selecting one or more polarization characteristics from the plurality of polarization characteristics based on one or more of the measurement quality parameters
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公开(公告)号：US20180246423A1
公开(公告)日：2018-08-30
申请号：US15754470
申请日：2016-08-22
Applicant: ASML Netherlands B.V.
Inventor： Simon Gijsbert Josephus MATHIJSSEN , Arie Jeffrey DEN BOEF , Nitesh PANDEY , Patricius Aloysius Jacobus TINNEMANS , Stefan Michiel WITTE , Kjeld Sijbrand Eduard EIKEMA
CPC classification number: G03F9/7003 , G01B11/272 , G03F9/7046 , G03F9/7088 , G03F9/7092 , G06T7/73
Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.
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公开(公告)号：US20250067768A1
公开(公告)日：2025-02-27
申请号：US18724551
申请日：2022-12-22
Applicant: ASML Netherlands B.V.
Inventor： Mustafa Ümit ARABUL , Zili ZHOU , Nitesh PANDEY , Coen Adrianus VERSCHUREN , Willem Marie Julia Marcel COENE , Gerard Jan VERBIEST , Peter Gerard STEENEKEN , Martin Pierre ROBIN
Abstract: The disclosure relates to determining information about a target structure formed on a substrate using a lithographic process. In one arrangement, a cantilever probe is provided having a cantilever arm and a probe element. The probe element extends from the cantilever arm towards the target structure. Ultrasonic waves are generated in the cantilever probe. The ultrasonic waves propagate through the probe element into the target structure and reflect back from the target structure into the probe element or into a further probe element extending from the cantilever arm. The reflected ultrasonic waves are detected and used to determine information about the target structure.
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公开(公告)号：US20230341813A1
公开(公告)日：2023-10-26
申请号：US18034356
申请日：2021-10-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Hugo Augustinus Joseph CRAMER , Vasco Tomas TENNER
CPC classification number: G03H1/0443 , G03H1/265 , G03H2001/005
Abstract: A dark field digital holographic microscope and associated metrology method is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope includes an illumination branch for providing illumination radiation to illuminate the structure; a detection arrangement for capturing object radiation resulting from diffraction of the illumination radiation by the structure; and a reference branch for providing reference radiation for interfering with the object radiation to obtain an image of an interference pattern formed by the illumination radiation and reference radiation. The reference branch has an optical element operable to vary a characteristic of the reference radiation so as to reduce and/or minimize variation in a contrast metric of the image within a field of view of the dark field digital holographic microscope at a detector plane.
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