21.
    发明专利
    未知

    公开(公告)号:ID29380A

    公开(公告)日:2001-08-30

    申请号:ID20002697

    申请日:1999-06-23

    Applicant: BASF AG

    Abstract: A process for removing acidic gas constituents, of the group consisting of CO2, H2S, COS, CS2 and mercaptans, from gases, in which, in an absorption step, a dirty gas rich in acidic gas constituents is brought into contact with an absorption medium, as a result of which a clean gas low in acidic gas constituents and an absorption medium laden with acidic gas constituents are obtained, the absorption medium used being a mixture comprisinga) from 0.1 to 50% by weight of one or more mono-cyclic or bicyclic nitrogen heterocycles which are unsubstituted and/or monosubstituted or poly-substituted on the carbon by OH, C1-C3 alkyl and/or C1-C3 hydroxyalkyl and which have from 5 to 14 ring atoms and 1 or 2 heterocyclically bound nitrogen atoms per ring as component A,b) from 1 to 60% by weight of a monohydric and/or polyhydric alcohol as component B,c) from 0 to 60% by weight of an aliphatic aminoalcohol as component C,d) from 0 to 98.9% by weight of water as component D,e) from 0 to 35% by weight of K2CO3 as component E,where the sum of components A, B, C, D and E is 100% by weight.

    22.
    发明专利
    未知

    公开(公告)号:BR9911708A

    公开(公告)日:2001-03-20

    申请号:BR9911708

    申请日:1999-06-23

    Applicant: BASF AG

    Abstract: A process for removing acidic gas constituents, of the group consisting of CO2, H2S, COS, CS2 and mercaptans, from gases, in which, in an absorption step, a dirty gas rich in acidic gas constituents is brought into contact with an absorption medium, as a result of which a clean gas low in acidic gas constituents and an absorption medium laden with acidic gas constituents are obtained, the absorption medium used being a mixture comprisinga) from 0.1 to 50% by weight of one or more mono-cyclic or bicyclic nitrogen heterocycles which are unsubstituted and/or monosubstituted or poly-substituted on the carbon by OH, C1-C3 alkyl and/or C1-C3 hydroxyalkyl and which have from 5 to 14 ring atoms and 1 or 2 heterocyclically bound nitrogen atoms per ring as component A,b) from 1 to 60% by weight of a monohydric and/or polyhydric alcohol as component B,c) from 0 to 60% by weight of an aliphatic aminoalcohol as component C,d) from 0 to 98.9% by weight of water as component D,e) from 0 to 35% by weight of K2CO3 as component E,where the sum of components A, B, C, D and E is 100% by weight.

    METHOD FOR REMOVING ACID GAS COMPONENTS FROM GASES

    公开(公告)号:CA2336043A1

    公开(公告)日:2000-01-06

    申请号:CA2336043

    申请日:1999-06-23

    Applicant: BASF AG

    Abstract: The invention relates to a method for removing acid gas components from gase s, the components being from the group consisting of CO2, H2S, COS, CS2 and mercaptans, wherein a crude gas rich in acid gas components is brought into contact with an absorbing agent in an absorption step, whereby a pure gas po or in acid gas components and an absorbing agent charged with acid gas componen ts is obtained, wherein a mixture is used as absorbing agent, containing: a) 0. 1 to 50 % by weight of one or several unsubstituted and/or once or several tim es OH, C1-C3-alkyl and/or C1-C3-hydroxyalkyl carbon substituted mono- or bicycl ic nitrogen heterocycles with 5 to 14 ring atoms and 1 or 2 heterocyclically bonded nitrogen atoms per ring as constituents A; b) 1 to 60 % by weight of a mono or polyvalent alcohol as constituent B; c) 0 to 60 % by weight of an aliphatic aminoalcohol as constituent C; d) 0 to 98.9 % by weight of water a s constituent D; e) 0 to 35 % by weight of K2CO3 as constituent E, wherein the sum of constituents A, B, C, D and E equals 100 % by weight.

    HERBICIDAL TETRAHYDRO(THIO)PYRAN-2,4-DIONE DERIVATIVES

    公开(公告)号:CA1327591C

    公开(公告)日:1994-03-08

    申请号:CA556426

    申请日:1988-01-13

    Applicant: BASF AG

    Abstract: Tetrahydro(thio)pyran-2,4-dione derivatives of the formula (I), where R1 is hydrogen, a cation, alkylcarbonyl, C2-C10-alkenylcarbonyl, or benzoyl which is unsubstituted or substituted by alkyl, R2 is alkyl, R3 is a non-aromatic, unsubstituted or alkyl-substituted heterocyclic compound of 5 to 7 ring members and having at most one double bond in the heterocyclic ring, X is oxygen or sulfur, and Z is oxygen or the radical NO -R4, R4 denoting alkyl, alkenyl, alkynyl, haloalkyl, haloalkenyl, alkoxyalkyl or the radical CH2-R5, where R5 is a heterocyclic compound of 5 ring members and containing from 1 to 3 hetero-atoms and from 0 to 2 double bonds and bearing either no substituents or one or two substituents selected from the group consisting of alkyl, alkoxy, halogen, trifluoromethyl, alkoxymethyl, alkylthiomethyl and vinyl, or R5 is phenyl which is unsubstituted or bears from one to three substituents selected from the group consisting of alkyl, alkoxy, halogen, trifluoromethyl, nitro and dialkylamino, and their use for combating unwanted plant growth and for regulating plant growth.

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