公开(公告)号：DE3908458A1

公开(公告)日：1990-09-20

申请号：DE3908458

申请日：1989-03-16

Applicant: BASF AG

Inventor： WEGNER GERHARD PROF DR ,  CASERI WALTER DR ,  SAUER THOMAS DR

IPC: G02B5/30 ,  C08G77/48 ,  C08G77/50 ,  C08G77/58 ,  C08J5/18 ,  C09B69/10 ,  G02B1/04 ,  G02B1/10 ,  H01J61/35

Abstract: Novel polymers contain phthalocyanine ring systems bonded via axial bonds to a central metal atom in the polymer chain and consist of repeating units of the general formula (I) (I) In the general formula (I), Pcs is a phthalocyanine ring system having peripheral substituents, Me is the central atom of the phthalocyanine ring system, which atom is bonded in the polymer main chain, suitable central metal atoms Me being silicon and germanium, R is alkylene, R' and R'' are each alkyl, cycloalkyl, aryl or alkoxy and Z is a silicon-carbon bond or further Si-containing groups. The novel polymers can be particularly advantageously used for the production of ultrathin layers by the LB technique, optically transparent films having high optical anisotropy and a high volume concentration of phthalocyanine radicals being formed.

公开(公告)号：DE3474554D1

公开(公告)日：1988-11-17

申请号：DE3474554

申请日：1984-12-12

Applicant: BASF AG

Inventor： LEYRER REINHOLD J DR ,  WEGNER GERHARD PROF DR ,  MUELLER MICHAEL

IPC: C08F8/00 ,  C08F8/50 ,  C08F38/00 ,  C08F38/02

公开(公告)号：DE3342829A1

公开(公告)日：1985-06-05

申请号：DE3342829

申请日：1983-11-26

Applicant: BASF AG

Inventor： WEGNER GERHARD PROF DR ,  MUELLER MICHAEL

IPC: G03C1/72 ,  G03C5/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/26 ,  G03F7/00 ,  G03C1/68

Abstract: In the production of resist patterns by applying a photosensitive, positive-working resist layer based on photodegradable polymers to a substrate, image-wise exposing the resist layer to actinic light and removing the exposed layer portions to develop the resist pattern, a photosensitive resist layer is used which is made of a poly(diacetylene) which is, in particular, soluble. The invention also relates to dry film resists with a temporary, dimensionally stable layer base, a photosensitive photodegradable resist layer applied thereto and based on poly(diacetylenes), which are preferably soluble, and, optionally, a top layer on the photosensitive resist layer.

公开(公告)号：DE3318856A1

公开(公告)日：1984-11-29

申请号：DE3318856

申请日：1983-05-25

Applicant: BASF AG

Inventor： WEGNER GERHARD PROF DR ,  WERNET WOLFGANG

IPC: C08G61/00 ,  C08G61/10 ,  C08G61/12 ,  C08G73/06 ,  C25D13/08 ,  H01B1/12 ,  H01M4/60 ,  C25B3/02 ,  C08F34/00 ,  C08G85/00 ,  C08G61/02 ,  C08L45/00

Abstract: Poly(heteroaromatics) are prepared by electrochemical polymerization, in particular anodic oxidation, of a monomeric heteroaromatic compound in an aqueous electrolyte solvent in which the monomeric heteroaromatic compound is dispersed, in the presence of a conductive salt and a dispersant. The films obtained by the process have good mechanical properties and high electrical conductivities.

公开(公告)号：DE2221525A1

公开(公告)日：1973-11-22

申请号：DE2221525

申请日：1972-05-03

Applicant: BASF AG

Inventor： BARZYNSKI HELMUT DR ,  PENZIEN KLAUS DR ,  WEGNER GERHARD PROF DR

IPC: G03F7/025 ,  G03C1/10

Abstract: Multi-layered, highly radiation-sensitive recording material, which can be fixed easily, consists of (A) a dimensionally stable sheet support; (B) opt. a subbing coat; (C) a layer of a suspension of radiation-sensitive diyne crystals (I) in a polymeric binder (II), in which (I) can be dissolved by treating the material with a solvent a and/or by increasing the temp., and (D) a transparent top coat (III), which is scarcely water-soluble. Rapid and simple fixing is possible after exposure. (I) is a bisurethane of formula (R-NH-CO-O-Y-X-C=C)2 (where X is (CH2)n with n = 1-9; Y can be absent or -(O-CHR'-CHR")m with m = 1-3 and R'=H, R" = Me or R'=Me, R" = H, R is H, aryl, aralkyl, alkyl, alkenyl, chloralkyl or alkoxyalkyl with 1-17C), (II) a vinylpyrrolidone polymer, and (III) an alcohol-soluble, synthetic polyamide.