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    1.
    发明专利
    未知

    公开(公告)号：DE59004374D1

    公开(公告)日：1994-03-10

    申请号：DE59004374

    申请日：1990-03-14

    Applicant: BASF AG

    Inventor： WEGNER GERHARD PROF DR ,  CASERI WALTER DR ,  SAUER THOMAS

    IPC: G02B5/30 ,  C08G77/48 ,  C08G77/50 ,  C08G77/58 ,  C08J5/18 ,  C09B69/10 ,  G02B1/04 ,  G02B1/10 ,  H01J61/35

    Abstract: Novel polymers contain phthalocyanine ring systems bonded via axial bonds to a central metal atom in the polymer chain and consist of repeating units of the general formula (I) (I) In the general formula (I), Pcs is a phthalocyanine ring system having peripheral substituents, Me is the central atom of the phthalocyanine ring system, which atom is bonded in the polymer main chain, suitable central metal atoms Me being silicon and germanium, R is alkylene, R' and R'' are each alkyl, cycloalkyl, aryl or alkoxy and Z is a silicon-carbon bond or further Si-containing groups. The novel polymers can be particularly advantageously used for the production of ultrathin layers by the LB technique, optically transparent films having high optical anisotropy and a high volume concentration of phthalocyanine radicals being formed.

    PROCESS FOR THE PRODUCTION OF RESIST IMAGES AND DRY RESIST FILM FOR THIS PROCESS
    2.
    发明专利
    PROCESS FOR THE PRODUCTION OF RESIST IMAGES AND DRY RESIST FILM FOR THIS PROCESS 未知

    公开(公告)号：DE3473065D1

    公开(公告)日：1988-09-01

    申请号：DE3473065

    申请日：1984-11-22

    Applicant: BASF AG

    Inventor： LEYRER REINHOLD J DR ,  WEGNER GERHARD PROF DR ,  MUELLER MICHAEL

    IPC: G03F7/039 ,  G03F7/10

    Abstract: In the production of resist images by application of a radiation-sensitive positive-working resist layer based on degradable polymers onto a substrate, imagewise exposure of the resist layer to actinic radiation and removal of the irradiated parts of the layer with development of the resist image, the radiation-sensitive resist layer used is composed of poly(diacetylenes), in particular soluble ones. Preferably, the radiation-sensitive resist layer based on the poly(diacetylenes) contains sensitizers which can be activated by actinic radiation and which, after being activated, induce or accelerate molecular degradation of the poly(diacetylenes). Dry film resists comprise a temporary dimensionally stable base and a radiation-sensitive resist layer which is applied on the base, can be degraded by exposure to actinic radiation and is based on poly(diacetylenes), in particular soluble ones, with or without a cover sheet on top of the said resist layer.

    9.
    发明专利
    未知

    公开(公告)号：DE3724542A1

    公开(公告)日：1989-02-02

    申请号：DE3724542

    申请日：1987-07-24

    Applicant: BASF AG

    Inventor： WEGNER GERHARD PROF DR ,  DUDA GISELA ,  BUBECK CHRISTOPH ,  SCHOUTEN AREND JAN

    IPC: C08K5/00 ,  B05D1/20 ,  C08J5/18 ,  C08L101/00 ,  C09K3/00 ,  G02B5/22

    Abstract: Thin films which contain a defined concentration of dye per unit area and are useful as layer elements, e.g. for optical filters, are prepared by spreading an oleophilic dye which is soluble in an organic water-immiscible solvent and an organic polymer dissolved in an organic solvent as a thin film at the water/air interface and, after the solvent has evaporated, transferring said film by the Langmuir-Blodgett technique to a solid base material.

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