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    Method for manufacturing copolymer consisting of carbon monoxide and olefinically unsaturated compound in aqueous medium, aqueous copolymer system thus manufactured and its usage
    3.
    发明专利
    Method for manufacturing copolymer consisting of carbon monoxide and olefinically unsaturated compound in aqueous medium, aqueous copolymer system thus manufactured and its usage 审中-公开
    在水性介质中制备一氧化碳和烯烃不饱和化合物的共聚物的方法，该制造的水性共聚物体系及其用途

    公开(公告)号：JP2003048979A

    公开(公告)日：2003-02-21

    申请号：JP2002147736

    申请日：2002-05-22

    Applicant: Basf Ag ,  ビーエーエスエフ アクチェンゲゼルシャフト

    Inventor： SCHMID MARKUS DIPL ING ,  LEYRER REINHOLD J DR ,  CHOWDHRY MUBARIK MAHMOOD ,  KRISTEN MARC OLIVER DR

    IPC: C08G67/02 ,  C09D173/00 ,  C09J173/00

    CPC classification number: C08G67/02

    Abstract: PROBLEM TO BE SOLVED: To improve a method for catalytically manufacturing a copolymer consisting of carbon monoxide and a 2-20C olefinically unsaturated compound in an aqueous medium by using a metal catalyst system.
    SOLUTION: In order to obtain a copolymer consisting of carbon monoxide and a 2-20C olefinically unsaturated compound, the copolymerization of carbon monoxide and the olefinically unsaturated compound is carried out in an aqueous medium in the presence of (a1) a metal complex of the general formula (I) (wherein, the substituents and the factors are shown in the specification), (b) a dispersant, and (c) optionally, an organic hydroxy compound. The copolymerization is carried out in the presence of a water-soluble high molecular host compound having hydrophobic hollow sections and hydrophilic outer coats.
    COPYRIGHT: (C)2003,JPO

    Abstract translation: 要解决的问题：通过使用金属催化剂体系改进在含水介质中催化制造由一氧化碳和2-20C烯属不饱和化合物组成的共聚物的方法。 解决方案：为了获得由一氧化碳和2-20C烯属不饱和化合物组成的共聚物，一氧化碳和烯属不饱和化合物的共聚在水性介质中在（a1）金属络合物存在下进行， 通式（I）（其中取代基和因子在说明书中示出），（b）分散剂和（c）任选的有机羟基化合物。 在具有疏水性中空部分和亲水外涂层的水溶性高分子量主体化合物的存在下进行共聚。

    5.
    发明专利
    未知

    公开(公告)号：DE3906246A1

    公开(公告)日：1990-09-06

    申请号：DE3906246

    申请日：1989-02-28

    Applicant: BASF AG

    Inventor： LEYRER REINHOLD J DR ,  LAUKE HARALD DR ,  STROHRIEGEL PETER DR ,  HAARER DIETRICH PROF DR

    IPC: C08F8/30 ,  C08F20/02 ,  C08F20/34 ,  C08F20/36

    Abstract: In order to prepare acrylate and/or methacrylate polymers containing lateral carbazolyl groups, polymers of acrylyl chloride and/or methacrylyl chloride are reacted in solution in a polymer-analogous reaction with alcoholates of N-( omega -hydroxyalkyl)carbazoles. The poly(meth)acrylates prepared in this way have good photoconductor properties and are advantageously suitable for use in electrophotographic recording elements.

    7.
    发明专利
    未知

    公开(公告)号：DE3761277D1

    公开(公告)日：1990-02-01

    申请号：DE3761277

    申请日：1987-03-17

    Applicant: BASF AG

    Inventor： LOERZER THOMAS DR ,  LEYRER REINHOLD J DR

    IPC: G03F7/004 ,  C07D235/02 ,  G03C1/72 ,  G03C1/73 ,  G03F7/105 ,  G03F7/02

    Abstract: A photochromic system contains an oxidizable leuco dye and a photochemically activated initiator which converts the leuco dye to the dye, the initiator being a phenanthroimidazole derivative. The photochromic system is useful for the production of photochromic layers for photoresists and printing plates.

    9.
    发明专利
    未知

    公开(公告)号：DE3514182A1

    公开(公告)日：1986-10-23

    申请号：DE3514182

    申请日：1985-04-19

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD DR ,  LEYRER REINHOLD J DR ,  NEUMANN PETER DR

    IPC: G03G13/28 ,  G03G5/05 ,  G03G5/06 ,  G03G5/10 ,  G03G13/26

    Abstract: An electrophotographic recording material contains, as charge carrier-transporting compounds in the photoconductor layer, a mixture of one or more compounds of the formula (I) and one or more compounds of the formula (II) in a ratio of from 9:1 to 0.6:1, preferably from 2.3:1 to 0.8:1. In the formulae, R1 and R2 independently of one another are each alkyl, allyl, phenylalkyl or unsubstituted or substituted phenyl, R3 and R4 independently of one another are each hydrogen, alkyl, alkoxy or halogen, and R6, R7, R8 and R9 independently of one another are each alkyl, phenylalkyl or cyclohexyl. When the mixture of (I) and (II) is present in an appropriate concentration, the recording materials are highly photosensitive, although the problems usually encounted in the case of high concentrations of charge carrier-transporting compounds do not arise.

    Method of producing resist patterns and dry-film resist suitable for said method
    10.
    发明专利
    Method of producing resist patterns and dry-film resist suitable for said method 未知

    公开(公告)号：DE3346716A1

    公开(公告)日：1985-07-04

    申请号：DE3346716

    申请日：1983-12-23

    Applicant: BASF AG

    Inventor： WEGNER GERHARD PROF DR ,  LEYRER REINHOLD J DR ,  MUELLER MICHAEL A

    IPC: G03F7/039 ,  G03F7/26 ,  C08F8/50 ,  C08F138/02 ,  G03C1/72

    Abstract: In the production of resist patterns by applying a radiation-sensitive, positive-working resist layer to a substrate, imagewise irradiation of the resist layer with actinic radiation and removal of the irradiated portions of the layer to develop the resist pattern, use is made of a radiation-sensitive resist layer based, in particular, on soluble poly(diacetylenes) containing sensitisers which can be activiated by the actinic radiation and which, after their activation, induce or accelerate the molecular decomposition of the poly(diacetylenes). The invention also relates to dry-film resists with a temporary, dimensionally stable layer base, a radiation-sensitive resist layer which is applied thereto and is based, preferably, on soluble poly(diacetylenes), and, optionally, to a top layer on the radiation-sensitive resist layer; the radiation-sensitive resist layer contains sensitisers which can be activated by actinic radiation and which, after their activation, induce or accelerate the molecular decomposition of the poly(diacetylenes).

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