公开(公告)号：MY160091A

公开(公告)日：2017-02-28

申请号：MYPI2012005135

申请日：2011-06-01

Applicant: BASF SE

Inventor： FERSTL BERTHOLD ,  BRAUN SIMON ,  FESSENBECKER ACHIM

IPC: C09K13/00 ,  C09K13/06 ,  C11D7/32 ,  C11D7/34 ,  C11D7/36 ,  C11D11/00 ,  H01L21/306 ,  H01L21/461 ,  H01L31/18

Abstract: AN AQUEOUS ALKALINE ETCHING AND CLEANING COMPOSITION FOR TREATING THE SURFACE OF SILICON SUBSTRATES, THE SAID COMPOSITION COMPRISING: (A) A QUATERNARY AMMONIUM HYDROXIDE; AND (B) A COMPONENT SELECTED FROM THE GROUP CONSISTING OF WATER-SOLUBIE ACIDS AND THEIR WATERE-SOLUBLE SALTS OF THE GENERAL FORMULAS (I) TO (V): (R1-SO3-)nXn+ (I), R-PO32- (Xn+)3-n (II); (RO-SO3-)nXn+ (III), RO-PO32- (Xn+)3-n (IV), and [(RO)2P02-]nXn+ (V); WHEREIN THE n = 1 OR 2; X IS HYDROGEN OR ALKALINE OR ALKALINE-EARTH METAL; THE VARIABLE R1 IS AN OLEFINICALLY UNSATURATED ALIPHATIC OR CYCLOALIPHATIC MOIETY AND R IS R1 OR AN ALKYLARYL MOIETY; THE USE OF THE COMPOSITION FOR TREATING SILICON SUBSTRATES, A METHOD FOR TREATING THE SURFACE OF SILICON SUBSTRATES, AND METHODS FOR MANUFACTURING DEVICES GENERATING ELECTRICITY UPON THE EXPOSURE TO ELECTROMAGNETIC RADIATION.

公开(公告)号：AU2011311627A1

公开(公告)日：2013-04-04

申请号：AU2011311627

申请日：2011-10-04

Applicant: BASF SE

Inventor： FESSENBECKER ACHIM ,  HAAS JENS ,  RICHTER FRANK ,  BERTKAU WALTER ,  SCHADE CHRISTIAN ,  WITTELER HELMUT

IPC: C23C22/06 ,  C23C22/07 ,  C23C22/53 ,  C23C22/56 ,  C23C22/57

Abstract: The present invention relates to a method for passivating metallic surfaces, wherein the metallic surface is brought into contact with an aqueous composition containing at least one water-soluble polymer (X) that comprises acid groups, and at least one polyamine (P), wherein the pH of the composition is in the range from 0.5 to 2.