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公开(公告)号：JPH05218393A
公开(公告)日：1993-08-27
申请号：JP1814992
申请日：1992-01-06
Applicant: CANON KK
Inventor： MATSUTANI SHIGEKI
Abstract: PURPOSE:To accurately control electrons which are low level in energy, by providing a two-dimensional region which is small enough as compared with the mean free path of the electrons and also providing a system of artificially forming one-dimensional curve with continuous arrangement of the two-dimensional region in an electronic control device. CONSTITUTION:A periodic pattern effectively having a wavelength of L is formed side by side in a stripe pattern, the number of which is large enough (30 to 100 periods), in parallel with an X-axis on a GaAlAs substrate 1. The formation is performed by a method such as an ordinary exposure to light, or an exposure to an electron beam or the like. And then a GaAs thin film 2 is uniformly formed along the pattern with the thickness d1 of a molecular level and at the same time a GaAlAs thin film 3 is formed to have the thickness d2 of a molecular level. After that, an FIB(Focused Ion Beam) is applied to one part of lines 8, 9 to depict an arbitrary line segment with required accuracy. At that time, an insulating layer including GaAlAs made with GaAs 2 and GaAlAs of a mixing part 10 being mixed is formed.
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公开(公告)号：JPH04303916A
公开(公告)日：1992-10-27
申请号：JP9362291
申请日：1991-03-29
Applicant: CANON KK
Inventor： MATSUTANI SHIGEKI
IPC: G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
Abstract: PURPOSE:To statistically correct a deceived amount on the basis of an undulating shape on the surface of a resist caused by a plurality of alignment marks by a method wherein a plurality of wafer marks composed of said alignment marks are formed and pieces of information on positions from the alignment marks are utilized. CONSTITUTION:Wafer magnifications at alignment marks in individual line widths are computed from individual discrepancy amounts 1 to 3 corresponding to a fundamental frequency and from positions inside the individual alignment marks. At this time, a radius at f(r)=mXr+f0 is replaced with a projective component on the xsi axis and computed. The deceived amount of the wafer magnifications due to an irregularity in a resist coating operation is computed from the line widthd and the wafer magnifications. A true wafer magnification m0 in a state that the line widths of alignment marks Wa are zero is found by the method of least squares by using a relational formula between the discrepancy amounts of individual measured values from measured values by a wafer mark GW and by the irregularity in the resist coating operation and the line widths.
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公开(公告)号：JPH04181945A
公开(公告)日：1992-06-29
申请号：JP31074990
申请日：1990-11-16
Applicant: CANON KK
Inventor： MATSUTANI SHIGEKI
IPC: G03F9/00 , H01L21/027 , H01L21/30
Abstract: PURPOSE:To enable highly accurate positioning by correcting errors from error detecting means for positioning. CONSTITUTION:The surface profile of a resist near the alignment mark surface provided on a wafer W is measured by a surface profile measuring means 110. From the result of this measurement, errors generated on detecting the position is calculated with an error detecting means 112. Signals from the error detecting means 112 are used to correct the positioning measurement with a correcting means 113. Namely, errors due to the profile of the resist surface near the wafer mark Wa of the wafer W are corrected by using two grading patterns G1 and G2 having different pitches to remove unnecessary noise light. Thereby, highly accurate positioning of the wafer to the exposure device is attained.
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公开(公告)号：JPH0423422A
公开(公告)日：1992-01-27
申请号：JP12700490
申请日：1990-05-18
Applicant: CANON KK
Inventor： MATSUTANI SHIGEKI
IPC: G03F9/02 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30
Abstract: PURPOSE:To make it possible to perform alignment with higher accuracy by installing an automatic focussing device for alignment independently of an automatic focussing device for exposure. CONSTITUTION:'An electric signal related with an optical position of an exposed body is measured based on alignment mark optical information on the exposed body by way of a alignment detection optical system' An electric signal of each optical position at each point on the exposed body is imitated as a function dependent on the optical position. An optimum optical position is looked for at each point on the exposed body based on the functional features available from during the imitation. The optical position at each point thus obtained is subjected to statistical processing as information at each point on the exposed body. The optical position of the exposed body thus obtained is stored as the optical position optimum to alignment. A means to drive the exposed body to the optimum optical position is installed separately from an exposure focussing means or simultaneously. This construction makes it possible to improve the alignment accuracy.
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公开(公告)号：JPH044410A
公开(公告)日：1992-01-08
申请号：JP10517090
申请日：1990-04-23
Applicant: CANON KK
Inventor： MATSUTANI SHIGEKI
Abstract: PURPOSE:To improve the accuracy of relative position between a wafer and a reticle by automatically a medium parameter used for relative positioning, and adopting a medium parameter whose deviation value becomes the minimum as a position detecting parameter. CONSTITUTION:A frequency intensity detector 19 evaluates the symmetricalness of one-dimensional waveform data outputted from an integrating device or detects the maximum value of frequency coefficients on the basis of data outputted from an FFT arithmetic unit 18. A phase detector 110 detects the position of a pattern F represented by a corresponding phase on the basis of the output of the detector 19 and a deviated amount detected by a deviated amount detector 111 is corrected by driving a wafer stage 10 on the basis of the result of detection. In other words, positioning control is performed. Therefore, the parameter can be made the optimum to position detection and the accuracy of relative position between a wafer and a reticle can be improved.
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Patent Agency Ranking26.发明专利
公开(公告)号：JPH03160410A
公开(公告)日：1991-07-10
申请号：JP29958289
申请日：1989-11-20
Applicant: CANON KK
Inventor： MATSUTANI SHIGEKI , TAKAKURA SHIN , UZAWA SHIGEYUKI
IPC: G02B7/36 , H01L21/027 , H01L21/30
Abstract: PURPOSE:To allow automatic focusing without being affected by the temp. difference and size of an object with respect to a background by taking the cumulative distribution in the direction from the max. value of density represented by the absolute value of the derivative (denoted as absolute derivative density hereafter) to zero value of the absolute derivative density and determining the plural points of the differential absolute value densities coinciding with the number of picture elements, the cumulation of which is of a prescribed ratio to the total number of the picture elements in a window. CONSTITUTION:The histogram of the absolute derivative density which shows the picture element number as a frequency versus the absolute derivative density is obtd. from the absolute derivative image. The cumulative distribution is taken with this histogram in the zero direction of the absolute derivative densities from the max. value of the absolute derivative densities. The centroid for the point of the absolute derivative density coinciding with the number of the picture elements, the cumulation of which is of the prescribed ratio to the total number of the picture elements in the window or the absolute derivative density part larger than this point is determined and is designated as the 2nd point. The dispersion around the 2nd point is determined for the same part of the histogram. The automatic focusing taking the three-dimensional structure of the object is executed in this way.
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公开(公告)号：JP2002013977A
公开(公告)日：2002-01-18
申请号：JP2001158958
申请日：2001-05-28
Applicant: CANON KK
Inventor： KANEKO NORIO , MATSUTANI SHIGEKI
IPC: G01H9/00
Abstract: PROBLEM TO BE SOLVED: To provide a small oscillation detecting device with high mechanical reliability capable of detecting a three dimensional small oscillation. SOLUTION: This small oscillation detecting device has a superconductor and a magnetic circuit for floating the superconductor by a magnetic field, and it detects an optical position of the floating superconductor. It is characterized by that it has a coherent light source, a reflector provided in the superconductor, a reference reflector provided in the magnetic circuit, an optical system irradiating light from the light source to each reflector, an optical system effectively modulating a frequency of one of the reflected lights from the reflectors in a spatial direction, an image pickup means picking up an interference pattern of modulated light and unmodulated light, a processing means processing an output of the image pickup means and converting it into a signal indicating the optical position of the superconductor, and a control means controlling the magnetic force of the magnetic circuit on the basis of an output of the processing means.
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公开(公告)号：JPH11329224A
公开(公告)日：1999-11-30
申请号：JP13397698
申请日：1998-05-15
Applicant: CANON KK
Inventor： MATSUTANI SHIGEKI , OKUDA MASAHIRO , ASAI AKIRA
Abstract: PROBLEM TO BE SOLVED: To estimate on the orbits of electrons in a system where emitted electrons are reflected and scattered, and to quantify the quantity of the electrons getting to an accelerating electrode to which the electrons are emitted. SOLUTION: This orbit calculation method and its device calculate orbits of charged particles emitted from an electron emission element. In a system provided with the electron emitting element and an accelerating electrode accelerating the electrons emitted from the electron emitting element in the direct upper direction of the electron emitting element, the distribution f(x) of landing spots where the electrons emitted from the electron emitting element fall near the electron emitting element when the potential of the accelerating electrode is set at zero is calculated (S2). According to the calculated landing spot distribution f(x), a carry-over factor of the electrons from the electron emitting element to the accelerating electrode in the case where the effects from the voltage impressed on the accelerating electrode is considered is obtained from the integrated value of the landing spot distribution f(x) from a stagnation point xS multiplied by a constant.
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公开(公告)号：JPH1055351A
公开(公告)日：1998-02-24
申请号：JP21352496
申请日：1996-08-13
Applicant: CANON KK
Inventor： MATSUTANI SHIGEKI
Abstract: PROBLEM TO BE SOLVED: To provide an electronic orbit calculating device, and its orbit calculating method, which calculates an orbit with high precision even for a system which scatters and absorbs electrons. SOLUTION: A desired simulated space and boundary conditions regarding an electric field in the regions are set in advance (S201), an electric field distribution at a desired point in the modeled simulated space is calculated, and on the basis of the calculated electric field distribution, an orbit of a simulated electron is calculated until the boundary part is reached (S202-S205, and S207). When the simulated electron reached the boundary part causes an elastic scattering (S206), the scattering position is specified and a weight (q) is varied to calculate the scattering distribution at the position (S208-S209). In S202, random numbers are generated according to the scattering distribution at the specified scattering position, the initial speed of the simulated electron is generated, and it is emitted again. This process is repeated to calculate the orbit of the simulated electron.
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公开(公告)号：JPH08306522A
公开(公告)日：1996-11-22
申请号：JP13562495
申请日：1995-05-11
Applicant: CANON KK
Inventor： KANEKO NORIO , MATSUTANI SHIGEKI
Abstract: PURPOSE: To detect the abnormality of a current lead itself occurring at current application at an early stage by attaching a light waveguide part to the conductor wire of a conductor, which constitutes a current lead, and allowing light to enter this light waveguide part, and detecting the change of intensity, wavelength, etc., of the light having come out. CONSTITUTION: An insulator 5 surrounds a conductor wire 3 and a light waveguide 4, and further these are attached to the supporter 2 lying at the roughly center of a hollow tube 1. And, at least one conductor consisting of such conductor wire 3 and the light waveguide 4 into the hollow tube 1 so as to constitute a current lead. Since the conductor wire 3 and the light waveguide 4 are positioned closely, if unequal partial heating occurs in the conductor wire 3, the light waveguide 4 is partially deformed, too, by the thermal expansion of the conductor wire 3. It becomes possible to detect the abnormality of the current lead itself at an early stage by optically detecting the deformation occurring in this light waveguide 4.
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