ELECTRODEPOSITION OF CHROMIUM
    25.
    发明专利

    公开(公告)号:AU550891B2

    公开(公告)日:1986-04-10

    申请号:AU9068182

    申请日:1982-11-17

    Applicant: IBM

    Abstract: A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions. The chromium preferably has a concentration lower than 0.01M. Preferably the complexant is selected so that the stability constant K1 of chromium complex is in the range 10 M . Complexants in this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid and 5-sulphosalicylic acid.

    26.
    发明专利
    未知

    公开(公告)号:AT18075T

    公开(公告)日:1986-03-15

    申请号:AT82306021

    申请日:1982-11-11

    Applicant: IBM

    Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

    ELECTRODEPOSITION OF CHROMIUM
    28.
    发明专利

    公开(公告)号:GB2109816A

    公开(公告)日:1983-06-08

    申请号:GB8134778

    申请日:1981-11-18

    Applicant: IBM

    Abstract: A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions. The chromium preferably has a concentration lower than 0.01M. Preferably the complexant is selected so that the stability constant K1 of chromium complex is in the range 10 M . Complexants in this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid and 5-sulphosalicylic acid.

    ELECTRODEPOSITION OF CHROMIUM
    29.
    发明专利

    公开(公告)号:AU9068182A

    公开(公告)日:1983-05-26

    申请号:AU9068182

    申请日:1982-11-17

    Applicant: IBM

    Abstract: A chromium electroplating electrolyte containing trivalent chromium ions, a complexant, a buffer agent and thiocyanate ions for promoting chromium deposition, the thiocyanate having a molar concentration lower than that of the chromium ions. The chromium preferably has a concentration lower than 0.01M. Preferably the complexant is selected so that the stability constant K1 of chromium complex is in the range 10 M . Complexants in this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid and 5-sulphosalicylic acid.

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