公开(公告)号：JP2009138127A

公开(公告)日：2009-06-25

申请号：JP2007316921

申请日：2007-12-07

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： UEDA JIRO ,  KAJITA TORU ,  IIJIMA TAKAHIRO

IPC: C08L33/14 ,  C08F220/32 ,  C08F220/38 ,  C08K5/00 ,  C08L63/00 ,  C09D141/00 ,  C09D163/00 ,  C09D171/02 ,  C09D201/02 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a composition, which can form a cured film having high flatness on a substrate having low surface flatness, and which is for forming an optical device protective film having high transparency and surface hardness, and various excellent resistive characteristics such as heat and pressure resistance, acid resistance, alkali resistance, sputtering resistance, and etching resistance. SOLUTION: The resin composition includes a copolymer containing a polymerization unit derived from a polymerizable unsaturated compound having an oxiranyl or oxetanyl group, and at least one kind of polymerization unit derived from at least one kind of polymerizable unsaturated compound selected from the group consisting of polymerizable unsaturated compounds having an alkoxy thiocarbonyl or alkoxyalkyl thiocarbonyl group, and a solvent. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种组合物，其可以在具有低表面平整度的基材上形成具有高平坦度的固化膜，并且用于形成具有高透明度和表面硬度的光学装置保护膜，以及各种优异的 电阻特性如耐热压性，耐酸性，耐碱性，耐溅射性和耐蚀刻性。 解决方案：树脂组合物包括含有衍生自具有环氧乙烷基或氧杂环丁烷基的可聚合不饱和化合物的聚合单元的共聚物和至少一种衍生自选自下组的可聚合不饱和化合物的聚合单元 由具有烷氧基硫代羰基或烷氧基烷基硫代羰基的可聚合不饱和化合物和溶剂组成。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009075283A

公开(公告)日：2009-04-09

申请号：JP2007243285

申请日：2007-09-20

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/031 ,  C08F2/44 ,  C08F2/46 ,  G02F1/1339 ,  G03F7/038 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition obtaining an adequate spacer shape even under ≤600 J/m 2 of exposure energy, and capable of forming a spacer for a liquid crystal display device excellent in rubbing resistance, adhesion to a transparent substrate, heat resistance and flexibility can be formed. SOLUTION: The radiation-sensitive resin composition comprises [A] a copolymer of (a1) at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) an unsaturated compound other than the component (a1), [B] a polymerizable unsaturated compound, and [C] an o-acyloxime-based radiation-sensitive polymerization initiator having a carbazole group. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供即使在≤600J/ m 2的曝光能量下获得足够的间隔物形状的辐射敏感性树脂组合物，并且能够形成用于液晶的间隔物 可以形成耐摩擦性优异，对透明基板的粘附性，耐热性和柔软性的显示装置。 解决方案：辐射敏感性树脂组合物包含[A]（a1）选自不饱和羧酸和不饱和羧酸酐中的至少一种的共聚物和（a2）不同于组分（ a1），[B]可聚合不饱和化合物和[C]具有咔唑基团的邻酰基肟基辐射敏感聚合引发剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009073871A

公开(公告)日：2009-04-09

申请号：JP2007241609

申请日：2007-09-18

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: C08G59/68 ,  C08K5/00 ,  C08L33/14 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a thermosetting resin composition suitably used for forming a protective film of a color filter, the protective film showing high transparency and surface hardness and excellent in various kinds of durability such as heat resistance and alkali resistance even at a temperature of at most 200°C in a heat calcination step. SOLUTION: The composition comprises: [A] a copolymer of (a1) at least one kind of polymerizable unsaturated compound selected from a group consisting of polymerizable unsaturated compounds having an oxiranyl group and polymerizable unsaturated compounds having an oxetanyl group, and (a2) another polymerizable unsaturated compound excluding the compound of (a1); [B] a curing agent; and [C] a specified onium fluorinated alkyl fluorophosphate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供适合用于形成滤色器保护膜的热固性树脂组合物，该保护膜显示出高透明度和表面硬度，并且具有优异的各种耐久性，例如耐热性和耐碱性，甚至 在热煅烧步骤中在至多200℃的温度下进行。 组合物包含：[a]（a1）选自由具有环氧乙烷基的可聚合不饱和化合物和具有氧杂环丁烷基的可聚合不饱和化合物组成的组中的至少一种可聚合不饱和化合物的共聚物和（ a2）不包括（a1）化合物的另一种可聚合不饱和化合物; [B]固化剂; 和[C]指定的氟化氟化烷基氟磷酸酯。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008260909A

公开(公告)日：2008-10-30

申请号：JP2007329512

申请日：2007-12-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ITOU YUKIKO ,  ICHINOHE DAIGO ,  KAJITA TORU

IPC: C08F265/00 ,  G02B5/20 ,  G02F1/1333 ,  G02F1/1335 ,  G03F7/033 ,  G03F7/40

CPC classification number: C09D201/08

Abstract: PROBLEM TO BE SOLVED: To provide a composition that may form a cured film with high flatness and is suitably used to form a liquid crystal display element and a protective film for solid state image sensors excellent in developability and heat-resistance, to provide a composition having excellent storage stability, to provide a method of forming a protective film using the composition, and to provide a protective film formed from the following composition. SOLUTION: The resin composition for forming a radiation sensitive protective film comprises [A] (a1) an unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride, (a2) an epoxy group-containing unsaturated compound, and (a3) a copolymer consisting of another unsaturated compound, [B] a monofunctional polymerizable unsaturated compound having carboxyl groups with molecular weight of ≥180, [C] a multifunctional polymerizable unsaturated compound, and [D] a photoinitiator. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以形成具有高平坦度的固化膜的组合物，并且适合用于形成液晶显示元件和用于显影性和耐热性优异的固态图像传感器的保护膜， 提供具有优异储存稳定性的组合物，提供使用该组合物形成保护膜的方法，并提供由以下组成形成的保护膜。 解决方案：用于形成辐射敏感保护膜的树脂组合物包含[A]（a1）不饱和羧酸和/或不饱和羧酸酐，（a2）含环氧基的不饱和化合物，和（a3）a 由另一不饱和化合物组成的共聚物，[B]具有分子量≥180的羧基的单官能可聚合不饱和化合物，[C]多官能可聚合不饱和化合物和[D]光引发剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007086565A

公开(公告)日：2007-04-05

申请号：JP2005277172

申请日：2005-09-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/033 ,  G02F1/1333 ,  G02F1/1337 ,  G02F1/1339 ,  G03F7/027 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having a sufficient process margin, capable of suppressing contamination of a kiln, a photomask, etc., due to sublimation of a photoinitiator component, and having adhesion, transparency and heat resistance required for a protective film material, and resolution and compression property required for a spacer material. SOLUTION: The photosensitive resin composition contains [A] a copolymer of (a1) an ethylenically unsaturated carboxylic acid and/or an ethylenically unsaturated carboxylic acid anhydride and (a2) another ethylenically unsaturated compound, [B] a polymerizable compound having an ethylenically unsaturated bond, and [C] a photopolymerization initiator comprising a compound represented by formula (1). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决的问题：提供具有足够的加工余量的能够抑制由于光引发剂组分的升华而导致的窑，光掩模等的污染并且具有粘合性，透明性和耐热性的光敏树脂组合物 保护膜材料所需的，隔离材料所需的分辨率和压缩性能。 解决方案：感光性树脂组合物含有[a1]烯键式不饱和羧酸和/或烯属不饱和羧酸酐的共聚物和（a2）另一种烯属不饱和化合物，[B]具有 烯键式不饱和键，[C]含有式（1）表示的化合物的光聚合引发剂。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007056252A

公开(公告)日：2007-03-08

申请号：JP2006201610

申请日：2006-07-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEKURA ISAMU ,  ICHINOHE DAIGO ,  NISHIO HISAHIRO ,  SHIHO KOUJI ,  KAJITA TORU

IPC: C08F8/30 ,  C08F220/28 ,  C08F290/12 ,  G02F1/1339 ,  G03F7/027 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition which can acquire a sufficient spacer configuration even in low the exposure with high sensitivity and high resolution and also can form a spacer for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesiveness with a transparent substrate, heat resistance, resistance to release liquid, etc. SOLUTION: The radiation sensitive resin composition comprises a polymer which is obtained by reacting a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride with (a2) a two or more hydroxyl groups-containing unsaturated compound expressed by formula (1) (wherein R 1 represents hydrogen atom or methyl group; p is an integer of 0-3 and q is an integer of 1-12) and (a3) another unsaturated compound with a methacryloyloxyalkyl isocyanate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题为了获得即使以高灵敏度和高分辨率的曝光也能获得足够的间隔物构型的辐射敏感性树脂组合物，并且还可以形成用于弹性恢复性优异的液晶显示元件的间隔物， 耐摩擦性，与透明基材的粘合性，耐热性，耐剥离液等。解决方案：辐射敏感性树脂组合物包含通过使（a1）不饱和羧酸和/或 不饱和羧酸酐与（a2）由式（1）表示的两个或多个含羟基的不饱和化合物（其中R 1 表示氢原子或甲基; p为0〜 3和q是1-12的整数）和（a3）具有甲基丙烯酰氧基烷基异氰酸酯的另一种不饱和化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006301365A

公开(公告)日：2006-11-02

申请号：JP2005124035

申请日：2005-04-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HAMADA KENICHI ,  MINOWA TAKAKI ,  KAJITA TORU

IPC: G03F7/023 ,  G02B3/00 ,  G03F7/004 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having no problem with safety, excellent in sensitivity, resolution and storage stability, having good development margin, capable of forming an interlayer insulation film having excellent solvent resistance, heat resistance, light transmittance and adhesion, and capable of forming microlenses having excellent solvent resistance, heat resistance, light transmittance and adhesion, and also having a good melt shape. SOLUTION: The radiation sensitive resin composition contains [A] an alkali-soluble copolymer obtained by copolymerizing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an unsaturated compound having an oxetane ring structure and (a3) an olefinically unsaturated compound other than the above components, [B] a 1,2-quinonediazido compound and [C] an antimony-free thermosensitive acid generating compound. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决问题的方案为了提供一种不具有安全性，灵敏度，分辨率和储存稳定性优异，显影余量优异的能够形成耐溶剂性，耐热性优异的层间绝缘膜的辐射敏感性树脂组合物， 透光性和粘合性，并且能够形成具有优异的耐溶剂性，耐热性，透光性和粘合性的微透镜，并且还具有良好的熔体形状。 解决方案：辐射敏感性树脂组合物含有[A]通过使（a1）不饱和羧酸和/或不饱和羧酸酐共聚得到的碱溶性共聚物，（a2）具有氧杂环丁烷环结构的不饱和化合物和 （a3）不同于上述成分的烯属不饱和化合物，[B] 1,2-醌二叠氮化合物和[C]无锑热敏酸产生化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006184841A

公开(公告)日：2006-07-13

申请号：JP2005073765

申请日：2005-03-15

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MANO HIROYUKI ,  ICHINOHE DAIGO ,  NISHIO HISAHIRO ,  KAJITA TORU

IPC: G03F7/032 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition solution for spacer formation giving an even film uniform in thickness and suitable for a slit die coater method in which a reduced-pressure drying step is carried out in a short time. SOLUTION: The photosensitive resin composition comprises (A) a copolymer of at least one selected from the group consisting of ethylenically unsaturated carboxylic acids and ethylenically unsaturated carboxylic acid anhydrides, an epoxy group-containing ethylenically unsaturated compound, and another ethylenically unsaturated compound different from those, (B) a polymerizable compound having an ethylenically unsaturated bond, and (C) a photopolymerization initiator, wherein a solid concentration X (wt.%) and a viscosity Y (mPa s) at 25°C satisfy relationships of LogY≤0.04X-0.08 (1), LogY≥0.04X-0.50 (2), LogY≥0.30 (3) and LogY≤1.08 (4). COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于间隔物形成的感光性树脂组合物溶液，其赋予均匀的厚度均匀的膜并且适合于在短时间内进行减压干燥步骤的狭缝模涂法。 光敏树脂组合物包含（A）选自烯键式不饱和羧酸和烯属不饱和羧酸酐中的至少一种的共聚物，含环氧基的烯键式不饱和化合物和另一种烯属不饱和化合物 不同于（B）具有烯键式不饱和键的聚合性化合物和（C）光聚合引发剂，其中25℃下的固体浓度X（wt。％）和粘度Y（mPa·s）满足LogY ≤0.04X-0.08（1），LogY≥0.04X-0.50（2），LogY≥0.30（3）和LogY≤1.08（4）。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006176746A

公开(公告)日：2006-07-06

申请号：JP2005123104

申请日：2005-04-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YOSHIZAWA JUNJI ,  KAJITA TORU ,  KATO YOSHIFUMI ,  YAMAUCHI HIDEKI ,  UEDA JIRO

IPC: C08F220/26 ,  C08G59/40 ,  C08L33/14 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a resin composition which can form highly flat cured films, is suitably be used for forming optical device-protecting films having high transparency, surface hardness and various kinds of excellent resistance such as heat and pressure resistance, acid resistance, alkali resistance, spattering resistance, and etching resistance, and has excellent storage stability, to provide a method for forming a protecting film from the composition, and to provide a protecting film formed from the composition. SOLUTION: This composition comprises a copolymer comprising (a1) polymerization units originated from a polymerizable unsaturated compound having an oxiranyl group or oxetanyl group, (a2) polymerization units originated from a polymerizable unsaturated compound having a specific structure and represented by 1-diethylpropyl methacrylate, and (a3) polymerization units different from the polymerization units (a1) and (a2). The protecting film is formed from the composition. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供可形成高度平坦的固化膜的树脂组合物，适合用于形成具有高透明度，表面硬度和各种优异的耐热耐压性的光学器件保护膜 ，耐酸性，耐碱性，耐溅射性和耐蚀刻性，并且具有优异的储存稳定性，提供从组合物形成保护膜的方法，并提供由该组合物形成的保护膜。 解决方案：该组合物包含共聚物，其包含（a1）源自具有环氧乙烷基或氧杂环丁烷基的可聚合不饱和化合物的聚合单元，（a2）源自具有特定结构的可聚合不饱和化合物的聚合单元， （a3）与聚合单元（a1）和（a2）不同的聚合单元。 保护膜由组合物形成。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2002128831A

公开(公告)日：2002-05-09

申请号：JP2000329503

申请日：2000-10-27

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  KATAOKA ATSUKO ,  YAMAMOTO MASASHI ,  KAJITA TORU

IPC: C07C69/753 ,  C08F32/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a novel norbornene-based compound having high transpar ency to radiation and excellent in sensitivity, resolution, pattern shape or the like and also having small variation in line width to temperature change when heated after exposure and is usable as a raw material or the like of a resin component in a chemical amplification type resist, provide a polymer of the compound, and also provide a radiation-sensitive resin composition containing a copolymer of the compound and a maleic anhydride. SOLUTION: The norbornene compound is represented by 5-[(2-norbornyl) methoxycarbonyl]norbornene, 5-[1-(2-methyl-2-norbornyl) ethoxycarbonyl]norbornene, 8-[(2-norbornyl) methoxycarbonyl]tetracyclo[4.4.1.12,5.17,10]dodecane or the like. The polymer is represented by the polymer of the norbornene-based compound or the like. The radiation-sensitive resin composition contains the copolymer of the norbornene-based compound or the like and the meleic anhydride and a radiation-sensitive acid generating agent.