公开(公告)号：DE60235663D1

公开(公告)日：2010-04-29

申请号：DE60235663

申请日：2002-01-17

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  YAMAMOTO MASAFUMI ,  KATAOKA ATSUKO ,  KAJITA TORU

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive resin composition comprising: (A) an acid-dissociable group-containing resin, insoluble or scarcely soluble in alkali but becoming soluble in alkali when the acid-dissociable group dissociates, and containing recurring units with specific structures and (B) a photoacid generator of the formula (3), wherein R represents a monovalent aromatic hydrocarbon group, m is 1-8, and n is 0-5. The resin composition is suitable as a chemically-amplified resist responsive to deep ultraviolet rays such as a KrF excimer laser and ArF excimer laser, exhibits high transparency, excellent resolution, dry etching resistance, and sensitivity, produces good pattern shapes, and well adheres to substrates.

公开(公告)号：JP2003322971A

公开(公告)日：2003-11-14

申请号：JP2002127446

申请日：2002-04-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SOYANO AKIMASA ,  KATAOKA ATSUKO ,  KUROKAWA MITSUO

IPC: G03F7/039 ,  C08F20/18 ,  C08F32/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition as a chemically amplifying resist which is sensitive to active radiation, for example, far UV rays represented by KrF excimer laser or ArF excimer laser and which can form a resist pattern with excellent uniformity in film thickness, excellent adhesion property with a substrate, accuracy, sensitivity, resolution and so on.
SOLUTION: The radiation sensitive resin composition contains: (A) an alkali insoluble or alkali hardly soluble resin containing an acid-dissociable group which changes into alkali soluble when the acid dissociable group is dissociated; (B) a radiation sensitive acid producing agent; and (C) a compound expressed by general formula (1) as a solvent.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种对活性辐射敏感的化学放大抗蚀剂的辐射敏感性树脂组合物，例如由KrF准分子激光或ArF准分子激光器表示的远紫外线，并且可以形成具有 优异的膜厚均匀性，与基材的附着性优异，精度高，灵敏度高，分辨率高等特点。 解决方案：辐射敏感性树脂组合物包含：（A）当酸解离基解离时，含有可溶解酸碱解的基团的碱不溶性或碱难溶性树脂变为碱溶性; （B）辐射敏感性产酸剂; 和（C）由通式（1）表示的化合物作为溶剂。 版权所有（C）2004，JPO

公开(公告)号：JP2002128831A

公开(公告)日：2002-05-09

申请号：JP2000329503

申请日：2000-10-27

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  KATAOKA ATSUKO ,  YAMAMOTO MASASHI ,  KAJITA TORU

IPC: C07C69/753 ,  C08F32/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a novel norbornene-based compound having high transpar ency to radiation and excellent in sensitivity, resolution, pattern shape or the like and also having small variation in line width to temperature change when heated after exposure and is usable as a raw material or the like of a resin component in a chemical amplification type resist, provide a polymer of the compound, and also provide a radiation-sensitive resin composition containing a copolymer of the compound and a maleic anhydride. SOLUTION: The norbornene compound is represented by 5-[(2-norbornyl) methoxycarbonyl]norbornene, 5-[1-(2-methyl-2-norbornyl) ethoxycarbonyl]norbornene, 8-[(2-norbornyl) methoxycarbonyl]tetracyclo[4.4.1.12,5.17,10]dodecane or the like. The polymer is represented by the polymer of the norbornene-based compound or the like. The radiation-sensitive resin composition contains the copolymer of the norbornene-based compound or the like and the meleic anhydride and a radiation-sensitive acid generating agent.

公开(公告)号：JP2003248313A

公开(公告)日：2003-09-05

申请号：JP2002046974

申请日：2002-02-22

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  KATAOKA ATSUKO ,  TOMAS I WOROU ,  ALLEN ROBERT D ,  VARANASI PUSHKARA RAO

IPC: G03F7/039 ,  C08F222/06 ,  C08F232/08 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation-sensitive resin composition having high transparency to a radiation, excellent in basic physical properties as a resist, such as sensitivity, resolution, pattern shape and adhesion to a substrate, causing no development defect in microfabrication and capable of producing semiconductor devices in a high yield. SOLUTION: The radiation-sensitive resin composition comprises (A) an acid-dissociable group-containing resin having a repeating unit represented by formula (I) and a repeating unit represented by formula (II) and (B) a radiation-sensitive acid generator. In the formula (I), X is methylene or carbonyl; R 1 and R 2 are each H, a 1-4C alkyl, a monovalent O-containing polar group or a monovalent N-containing polar group; R 3 is H, a 1-6C alkyl, a 1-6C alkoxyl or a 2-7C alkoxycarbonyl; and n is an integer of 0-2. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2002229192A

公开(公告)日：2002-08-14

申请号：JP2001027408

申请日：2001-02-02

Applicant: JSR CORP

Inventor： EHATA SATOSHI ,  USUI NOBUSHI ,  ISHII HIROYUKI ,  KATAOKA ATSUKO ,  KAJITA TORU

IPC: G03F7/004 ,  C07D333/16 ,  C08K5/45 ,  C08L101/00 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation sensitive acid generating agent capable of giving positive and negative radiation sensitive resin compositions having high transparency particularly to far UV typified by ArF excimer laser light (193 nm wavelength) and excellent in sensitivity, resolution, pattern shape, etc., and to provide positive and negative radiation sensitive resin compositions containing the radiation sensitive acid generating agent. SOLUTION: The radiation sensitive acid generating agent is typified, e.g. by a compound having a sulfonium cation of formula (1), (2) or (3) and C4F9SO3- as a counter anion. The positive radiation sensitive resin composition contains the radiation sensitive acid generating agent and an acid dissociable group- containing resin. The negative radiation sensitive resin composition contains the radiation sensitive acid generating agent, an alkali-soluble resin and a crosslinker.

公开(公告)号：JP2003173026A

公开(公告)日：2003-06-20

申请号：JP2002009054

申请日：2002-01-17

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  YAMAMOTO MASASHI ,  KATAOKA ATSUKO ,  KAJITA TORU

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to radiation and excellent in basic physical properties as a resist such as sensitivity, resolution, dry etching resistance and pattern shape. SOLUTION: The radiation-sensitive resin composition comprises (A) a resin comprising a copolymer of (meth)acrylic esters having lactone-containing heterocyclic structures typified by compounds of formula (1) and acid-dissociable group-containing (meth)acrylic esters typified by t-tubyl (meth)acrylate, 2- methyl-2-adamantyl (meth)acrylate and 2-norbornyl-2-n-propyl (meth)acrylate and (B) a radiation-sensitive acid generator typified by 1-(3,5-dimethyl-4- hydroxyphenyl)tetrahydrothiophenium nonafluoro-n-butanesulfonate and 1-(4-n- butoxy-1-naphtyl)tetrahydrothiophenium perfluoro-n-octanesulfonate. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2002244295A

公开(公告)日：2002-08-30

申请号：JP2001039066

申请日：2001-02-15

Applicant: JSR CORP

Inventor： KATAOKA ATSUKO ,  YAMAMOTO SHIGEHIRO ,  NISHIMURA YUKIO ,  KAJITA TORU

IPC: G03F7/039 ,  C08K5/00 ,  C08L101/02 ,  G03F7/38

Abstract: PROBLEM TO BE SOLVED: To provide a solution of a radiation sensitive resin composition having a controlled low water content, not causing the hydrolysis of a carboxylic anhydride structure in the resin and excellent in long-term shelf stability and to provide a method for improving the shelf stability of a solution of a radiation sensitive resin composition containing a resin having a carboxylic anhydride structure. SOLUTION: The solution of a radiation sensitive resin composition contains (A) an acid dissociable group-containing resin having a carboxylic anhydride structure and made alkali-soluble when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent and has

公开(公告)号：JP2006278617A

公开(公告)日：2006-10-12

申请号：JP2005093961

申请日：2005-03-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KOBAYASHI HIDEKAZU ,  MASUKO HIDEAKI ,  KATAOKA ATSUKO

IPC: H05K9/00 ,  B32B5/02 ,  B32B27/00 ,  G09F9/00

Abstract: PROBLEM TO BE SOLVED: To provide an electromagnetic wave shielding film which may be easily formed at a lower cost to have fine metal mesh patterns of higher size accuracy, not to allow generation of Moire, and assure excellent electromanetic wave shielding property and light transmissivity.
SOLUTION: The film has lattice type metal mesh patterns are formed by filling the recessed areas formed to the front surface of a film base material constituted with norbornen system resin, polyethylene-telephthalate or polycarbonate with a conductive substance including silver and/or copper and this film is characterized in the loading manner, when it is loaded to the front surface of a display, that an angle formed by the scanning line direction of the relevant display and a side of the lattice is set to 10 to 60°.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决问题：为了提供可以以较低的成本容易地形成具有高精度的精细金属网格图案的电磁波屏蔽膜，不允许产生莫尔，并且确保优异的电磁波屏蔽性能， 透光率。 解决方案：通过填充形成在由降冰片烯系树脂，聚对苯二甲酸乙二醇酯或聚碳酸酯构成的薄膜基材的前表面的凹陷区域，所述薄膜具有格子状金属网格图案，所述导电物质包括银和/或 铜和该膜的特征在于，当其被加载到显示器的前表面时，由相关显示器的扫描线方向和格子侧形成的角度被设定为10°至60°。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2003215805A

公开(公告)日：2003-07-30

申请号：JP2002009936

申请日：2002-01-18

Applicant: JSR CORP

Inventor： MIYAMATSU TAKASHI ,  ISHII HIROYUKI ,  KATAOKA ATSUKO

IPC: G03F7/039 ,  C08F220/12 ,  C08F220/18 ,  C08F220/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency for radiation and excellent basic physical properties as a resist such as sensitivity, resolution, dry etching durability and pattern profile. SOLUTION: The radiation sensitive resin composition contains the following resin (A) and (B) a radiation sensitive acid generator. The resin (A) is an alkali insoluble or alkali hardly soluble resin and changed into alkali-soluble by the action of an acid and the resin is, for example, a mevalonic lactone methacrylate/3-hydroxy-1-adamantyl methacrylate/1-methylcyclopentyl alkali methacrylate copolymer, a mevalonolactone methacrylate/3-hydroxyl-1-adamantyl methacrylate/[1-(2-methyl-2-norbornyl)ethoxycarbonyl]methacrylate copolymer. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2002357904A

公开(公告)日：2002-12-13

申请号：JP2001303870

申请日：2001-09-28

Applicant: JSR CORP

Inventor： KATAOKA ATSUKO ,  NISHIMURA YUKIO

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation, having excellent basic solid state properties as a resist such as sensitivity, resolution and pattern shape, and being useful as a chemical amplification type resist. SOLUTION: The radiation sensitive resin composition contains (A) a resin which is made alkali-soluble by the action of an acid and is typified by a copolymer of β-(meth)acryloyloxy-γ-butyrolactone and 2-methyl-2-adamantyl (meth) acrylate and (B) a radiation sensitive acid generator typified by 2,5-hexylene-(1- n-butoxynaphth-4-yl)sulfonium nonafluoro-n-butanesulfonate, 1-[4-(2- norbornylmethoxy)-1-naphthyl]tetrahydrothiophenium nonafluoro-n- butanesulfonate or 2,5-hexylene-(1-hydroxy-2,6-dimethylphen-4-yl)sulfonium nonafluoro-n-butanesulfonate.