公开(公告)号：AU6052100A

公开(公告)日：2001-01-31

申请号：AU6052100

申请日：2000-06-14

Applicant: LAM RES CORP

Inventor： HAO FANGLI ,  DHINDSA RAJINDER ,  POURHASHEMI JAVAD

IPC: H05H1/46 ,  C23C16/44 ,  C23C16/455 ,  H01J37/32 ,  H01L21/00 ,  H01L21/302 ,  H01L21/3065 ,  H01J37/34

Abstract: A component useful for a plasma reaction chamber includes a heat sink such as a temperature-controlled support member and a heated member such as an electrically powered showerhead electrode. The showerhead electrode is peripherally secured to the support member to enclose a gas distribution chamber between a top surface of the electrode and a bottom surface of the support member. A heat transfer member extends between the electrode and the support member and transfers heat from an area of temperature buildup on the top surface of the showerhead electrode to the bottom surface of the support member in order to control the temperature distribution across the showerhead electrode.