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公开(公告)号：DE602004003347D1
公开(公告)日：2007-01-04
申请号：DE602004003347
申请日：2004-02-26
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI
Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.
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公开(公告)号：AT280993T
公开(公告)日：2004-11-15
申请号：AT00952405
申请日：2000-08-01
Applicant: OSMIC INC
Inventor： JIANG LICAI , VERMAN BORIS
Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
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公开(公告)号：DE69909599T2
公开(公告)日：2004-04-15
申请号：DE69909599
申请日：1999-02-18
Applicant: OSMIC INC
Inventor： GUTMAN GEORGE , JIANG LICAI , VERMAN BORIS
Abstract: An x-ray reflecting system comprising a Kirkpatrick-Baez side-by-side optic in a single corner configuration having multi-layer Bragg x-ray reflective surfaces.
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公开(公告)号：CA2380922A1
公开(公告)日：2001-02-08
申请号：CA2380922
申请日：2000-08-01
Applicant: OSMIC INC
Inventor： JIANG LICAI , VERMAN BORIS
Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
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公开(公告)号：AU4076600A
公开(公告)日：2000-11-14
申请号：AU4076600
申请日：2000-04-07
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI , BONGLEA KIM , JOENSEN KARSTEN DAN
Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
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Patent Agency Ranking
公开(公告)号：EP1464061A4
公开(公告)日：2008-02-20
申请号：EP02784361
申请日：2002-10-31
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JOENSEN KARSTEN , PLATONOV YURIY , SESHADRI SRIVATSAN
IPC: G21K1/06
Abstract: An optical element for diffracting x-rays that includes a substrate (4), a diffraction structure (6) applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer (14) applied to the exterior surface.
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公开(公告)号：CA2321005C
公开(公告)日：2008-12-02
申请号：CA2321005
申请日：1999-02-18
Applicant: OSMIC INC
Inventor： JIANG LICAI , GUTMAN GEORGE , VERMAN BORIS
IPC: G21K1/06
Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, where in said x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include mul ti- layer or graded-d multi-layer Bragg x-ray reflective surfaces.
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公开(公告)号：DE60025341D1
公开(公告)日：2006-03-30
申请号：DE60025341
申请日：2000-04-07
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI , BONGLEA KIM , JOENSEN DAN
Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
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公开(公告)号：AT315271T
公开(公告)日：2006-02-15
申请号：AT00920188
申请日：2000-04-07
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI , BONGLEA KIM , JOENSEN KARSTEN DAN
Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
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公开(公告)号：DE69923182T2
公开(公告)日：2005-12-29
申请号：DE69923182
申请日：1999-03-17
Applicant: OSMIC INC
Inventor： VERMAN BORIS , JIANG LICAI
IPC: G01N23/20 , G01N23/207
Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.
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