Abstract:
The invention relates to an edge-emitting semiconductor laser diode (1) comprising an epitactic semiconductor layer stack (2) and a planarization layer (3). The semiconductor layer stack (2) comprises a main body (2a) and a ridge waveguide (2b), wherein the main body (2a) comprises an active layer (2c) for generating electromagnetic radiation. The planarization layer (3) embeds the ridge waveguide (2b) such that a surface (21) of the ridge waveguide (2b) and a surface (22) of the planarization layer (3) form a flat main surface (4). The invention further relates to a method for producing such a semiconductor laser diode (1).
Abstract:
The invention relates to an opto-electronic semiconductor chip, which has a radiation-emitting semiconductor layer sequence (1) with an active zone (120). The active zone comprises a first quantum well layer (3), a second quantum well layer (4), and two end barrier layers (51). The first quantum well layer and the second quantum well layer are disposed between the two end barrier layers. The active zone has a semiconductor material, which comprises at least one first and a second component. The fraction of the first component in the semiconductor material of the two end barrier layers is lower than in the first and second quantum well layers. Compared to the first quantum well layer, the second quantum well layer has either a lower layer thickness and a larger fraction of the first component of the semiconductor material, or a higher or the same layer thickness and a lower fraction of the first component of the semiconductor material.